公开(公告)号：EP3706159A1

公开(公告)日：2020-09-09

申请号：EP18874845.3

申请日：2018-11-01

Applicant: Korea Basic Science Institute

Inventor： CHOI, Yong Sup ,  LEE, Kang Il ,  SEOK, Dong Chan ,  JANG, Soo Ouk ,  KIM, Jong Sik ,  YOO, Seung Ryul

IPC: H01L21/3105 ,  H01L21/311 ,  H01L21/02 ,  H01L21/67

Abstract: The present invention relates to an atomic layer polishing method comprising: the steps of: scanning the surface of a specimen to measure a peak site on the specimen surface; spraying toward the measured peak site a gas containing an element capable of binding to a first atom, which is an ingredient of the material of the specimen to form a first reaction gas layer in which the first reaction gas binds to the first atom on the surface of the peak; and projecting ions of inert gas to the peak site on which the first reaction gas layer is deposited to separate the first atom bound to the first reaction gas from the specimen.

公开(公告)号：EP3255960A1

公开(公告)日：2017-12-13

申请号：EP16746881.8

申请日：2016-02-05

Applicant: Korea Basic Science Institute

Inventor： SEOK, Dong Chan ,  JUNG, Yong Ho ,  CHOI, Yong Sup ,  LHO, Taihyeop ,  LEE, Kang Il ,  JEONG, Hyun Young

IPC: H05H1/24 ,  H05H1/34

CPC classification number: H05H1/24 ,  H05H1/34

Abstract: The present invention is to provide a plasma-generating source including a porous dielectric member partially immersed in liquid into a plasma generation region between two opposite electrodes for generating dielectric barrier discharge plasma, such that generation of ozone and nitrogen oxides is suppressed while generation of hydroxy radicals is promoted.

Abstract translation: 本发明提供一种等离子体发生源，其包括部分浸入液体中的多孔电介质构件，进入两个相对电极之间的等离子体产生区，用于产生电介质阻挡放电等离子体，从而抑制臭氧和氮氧化物的产生，同时产生羟基 自由基得到促进。