Abstract:
The present invention relates to an atomic layer polishing method comprising: the steps of: scanning the surface of a specimen to measure a peak site on the specimen surface; spraying toward the measured peak site a gas containing an element capable of binding to a first atom, which is an ingredient of the material of the specimen to form a first reaction gas layer in which the first reaction gas binds to the first atom on the surface of the peak; and projecting ions of inert gas to the peak site on which the first reaction gas layer is deposited to separate the first atom bound to the first reaction gas from the specimen.
Abstract:
The present invention relates to a liquid medium plasma discharge generating apparatus, and has the aim of providing a microtube liquid medium plasma discharge generating apparatus, capable of applying a high electric field even with low wattage by minimizing conduction current, by filling a liquid medium in a gap between a power electrode and a ground electrode and arranging a dielectric diaphragm member, defining one or more holes or slits, in the middle of the gap. To achieve the above aim, the present invention provides a liquid medium plasma discharge generating apparatus comprising: a main body; a power electrode, provided at one side within the main body, for receiving electric power; a diaphragm member provided within the main body, and consisting of a dielectric defining one or more holes or slits; and a liquid medium charged inside the main body, wherein a ground electrode may be further provided in the main body, opposite the power electrode with the diaphragm member therebetween, whereupon the diaphragm member is arranged contacting the ground electrode.