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    Method of analyzing binding efficiency of adhesive nanoparticles
    2.
    发明授权
    Method of analyzing binding efficiency of adhesive nanoparticles 有权
    分析粘合剂纳米粒子结合效率的方法

    公开(公告)号：US09442115B2

    公开(公告)日：2016-09-13

    申请号：US13895708

    申请日：2013-05-16

    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Young Min Jhon ,  Chi Woong Jang ,  Myung Suk Chun ,  Seok Lee ,  Jae Hun Kim ,  Chul Ki Kim ,  Deok Ha Woo ,  Taik Jin Lee ,  Young Tae Byun ,  Sun Ho Kim

    IPC: G01N33/551 ,  G01N33/574 ,  G01N33/58

    CPC classification number: G01N33/574 ,  G01N33/587

    Abstract: Provided is a method of analyzing binding efficiency of adhesive nanoparticles. The method includes (a) injecting a solution containing nanoparticles into a first chamber slide, (b) evaporating only the solution from the first chamber slide into which the solution containing the nanoparticles is injected, and measuring a saturation temperature using a thermal imager while radiating light from a light source, (c) injecting cells into a second chamber slide, (d) injecting a solution containing nanoparticles into the second chamber slide in which the cells are cultured, (e) removing nanoparticles which are not bound to the cells from the second chamber slide into which the cells and the nanoparticles are injected, and (f) evaporating only the solution from the second chamber slide from which the nanoparticles are removed, and measuring a saturation temperature using a thermal image while radiating light from the light source.

    Abstract translation: 提供了分析粘合剂纳米粒子的结合效率的方法。 该方法包括：（a）将含有纳米颗粒的溶液注入到第一室载玻片中，（b）仅蒸发来自注入含有纳米颗粒的溶液的第一室载玻片的溶液，并且使用热成像仪测量饱和温度，同时辐射 来自光源的光，（c）将细胞注射到第二室载玻片中，（d）将含有纳米颗粒的溶液注入培养细胞的第二室载玻片中，（e）除去未结合细胞的纳米颗粒 注入细胞和纳米颗粒的第二室滑动，和（f）仅从去除了纳米颗粒的第二室载玻片蒸发溶液，并且使用热图像测量饱和温度，同时辐射来自光源的光 。

    Apparatus and method for extreme ultraviolet spectrometer calibration
    3.
    发明授权
    Apparatus and method for extreme ultraviolet spectrometer calibration 有权
    用于极紫外光谱仪校准的仪器和方法

    公开(公告)号：US09188485B1

    公开(公告)日：2015-11-17

    申请号：US14490948

    申请日：2014-09-19

    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Sun Ho Kim ,  Yong Soo Kim ,  Jae Hun Kim ,  Min-Chul Park ,  Young Tae Byun ,  Min Ah Seo ,  Joon Mo Ahn ,  Deok Ha Woo ,  Seok Lee ,  Taik Jin Lee ,  Young Min Jhon

    IPC: G01D18/00 ,  G01J3/02 ,  G01J3/10 ,  G01J3/28

    CPC classification number: G01J3/0297 ,  G01J3/10 ,  G01J3/28 ,  G01J3/2803 ,  G01J2003/282

    Abstract: Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.

    Abstract translation: 本文公开了用于极紫外（EUV）分光仪校准的装置和方法。 用于EUV分光仪校准的装置包括EUV生成模块，Al滤光片，衍射光栅，CCD照相机，光谱转换模块和控制模块，该模块将与频谱峰值中的最大峰值对应的波长值与 根据高次谐波的顺序，从频谱转换模块转换成具有预定参考波长值的EUV光的顺序，以计算具有最接近参考波长值的差值，并根据EUV的顺序来控制光谱 从光谱转换模块转换为沿波长轴方向移动计算出的差值的光。 因此，可以精确地测量在EUV曝光技术和掩模检查技术中使用的EUV光的光谱的波长。

    Pulse laser apparatus
    6.
    发明授权
    Pulse laser apparatus 有权
    脉冲激光装置

    公开(公告)号：US09124067B2

    公开(公告)日：2015-09-01

    申请号：US14448227

    申请日：2014-07-31

    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Young Min Jhon ,  Joon Mo Ahn ,  Jae Hun Kim ,  Seok Lee ,  Min Chul Park ,  Deok Ha Woo ,  Young Tae Byun ,  Taik Jin Lee ,  Sun Ho Kim

    IPC: H01S3/11 ,  H01S3/117 ,  H01S3/106

    CPC classification number: H01S3/117 ,  H01S3/08027 ,  H01S3/1062 ,  H01S3/1068 ,  H01S3/11 ,  H01S3/1103 ,  H01S3/1106 ,  H01S3/1109 ,  H01S3/1112 ,  H01S3/1623

    Abstract: Provided is a pulse laser apparatus for generating laser light. The apparatus includes a first mirror and a second mirror which are disposed at both ends of a resonator and configured to reflect the laser light, a gain medium disposed between the first and second mirrors and configured to amplify and output light incident from an outside, an etalon configured to adjust a pulse width of the laser light, and an acousto-optic modulator disposed between the first and second mirrors and configured to form a mode-locked and Q-switched signal from the laser light, in which some of the laser light is output through either the first or second mirror to outside the resonator.

    Abstract translation: 提供了一种用于产生激光的脉冲激光装置。 该装置包括：第一反射镜和第二反射镜，其设置在谐振器的两端并被配置为反射激光;增益介质，设置在第一和第二反射镜之间并且被配置为放大并输出从外部入射的光， 标准准则被配置为调整激光的脉冲宽度，以及声光调制器，其布置在第一和第二反射镜之间并被配置为从激光形成锁模和Q开关信号，其中一些激光 通过第一或第二反射镜输出到谐振器外部。

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