公开(公告)号：MY159175A

公开(公告)日：2016-12-30

申请号：MYPI20062784

申请日：2006-06-13

Applicant: LAM RES CORP

Inventor： JOHN M DE LARIOS ,  MIKE RAVKIN ,  JEFFREY FARBER ,  MIKHAIL KOROLIK ,  FRED C REDEKER

IPC: B08B3/00

Abstract: A METHOD FOR CLEANING A SUBSTRATE (702) IS PROVIDED. IN THIS METHOD, A FLOW OF NON-NEWTONIAN FLUID IS PROVIDED WHERE AT LEAST A PORTION OF THE FLOW EXHIBITS PLUG FLOW. TO REMOVE PARTICLES FROM A SURFACE OF THE SUBSTRATE (702), THE SURFACE OF THE SUBSTRATE IS PLACED IN CONTACT WITH THE PORTION OF THE FLOW THAT EXHIBITS PLUG FLOW SUCH THAT THE PORTION OF THE FLOW EXHIBITING PLUG FLOW MOVES OVER THE SURFACE OF THE SUBSTRATE. ADDITIONAL METHODS AN APPARATUSES FOR CLEANING A SUBSTRATE (702) ALSO ARE DESCRIBED. FIG. 5

公开(公告)号：SG115836A1

公开(公告)日：2005-10-28

申请号：SG200502519

申请日：2005-03-23

Applicant: LAM RES CORP

Inventor： MIKHAIL KOROLIK ,  JOHN M DE LARIOS ,  MIKE RAVKIN ,  JEFFREY FARBER

IPC: H01L21/304 ,  B08B3/04 ,  H01L21/00

Abstract: A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substrate processing environment.