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    A SCALABLE HELICON WAVE PLASMA PROCESSING DEVICE WITH A NON-CYLINDRICAL SOURCE CHAMBER
    1.
    发明公开
    A SCALABLE HELICON WAVE PLASMA PROCESSING DEVICE WITH A NON-CYLINDRICAL SOURCE CHAMBER 失效
    SKALIERBARE HELICON WELLENPLASMAVORRICHTUNG MIT NICHTZYLINDISCHER QUELLENKAMMER

    公开(公告)号：EP0871795A4

    公开(公告)日：2001-11-14

    申请号：EP96923578

    申请日：1996-06-28

    Applicant: LAM RES CORP

    Inventor： BENJAMIN NEIL ,  MANGANO STEFANO ,  JEWETT RUSSELL

    IPC: H05H1/46 ,  C03C15/00 ,  C03C17/245 ,  C23C16/50 ,  C23C16/507 ,  H01J37/32 ,  C23C16/00 ,  C23F1/02

    CPC classification number: H01J37/321 ,  C03C15/00 ,  C03C17/245 ,  C23C16/507

    Abstract: A plasma processing device (25) including a vacuum chamber (27) for processing a substrate (29) and a source chamber (26) for generating a plasma is disclosed where the source chamber (26) has a non-cylindrical geometry. Helicon waves of plasma are propagated from the source chamber into the vacuum chamber by a magnetic field having substantially parallel magnetic field lines extending from the source chamber into the vacuum chamber. A RF antenna (31 and 32) of a novel serpentine configuration is used to couple electromagnetic energy into the source chamber to create helicon plasma waves in the source chamber (26). The non-cylindrical geometry of the source chamber allows the processing of large area substrates due to the ability to scale the source chamber to the desired application while maintaining throughput efficiency and the ability to propagate helicon waves along the magnetic field lines present in the source chamber. In one embodiment a linear source chamber having the shape of an elongated rectangular box is disclosed wherein a slot opening (28) connects the source chamber to the vacuum chamber. Due to the ability of the helicon waves from a linear source chamber to propagate in a vacuum chamber without interference from a helicon wave from a similar source chamber, a plasma processing device is disclosed wherein multiple extended non-cylindrical source chambers are arranged to propagate nonparallel helicon plasma waves in a vacuum chamber.

    Abstract translation: 公开了一种等离子体处理装置（25），其包括用于处理基板（29）的真空室（27）和用于产生等离子体的源室（26），其中源室（26）具有非圆柱形几何形状。 等离子体的螺旋波通过具有从源室延伸到真空室中的基本上平行的磁场线的磁场从源室传播到真空室中。 使用新型蛇形结构的RF天线（31和32）将电磁能耦合到源室中，以在源室（26）中产生螺旋形等离子体波。 源室的非圆柱形几何形状允许对大面积衬底进行处理，这是由于能够将源室缩放到期望的应用，同时保持生产效率和沿存在于源室中的磁场线传播螺旋形波的能力 。 在一个实施例中，公开了具有细长矩形盒的形状的线性源室，其中槽开口（28）将源室连接到真空室。 由于来自线性源室的螺旋形波的能力在真空室中传播而没有来自类似源室的螺旋波的干扰，公开了一种等离子体处理装置，其中多个扩展的非圆柱形源室被布置成传播不平行 螺旋形等离子体波在真空室中。

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