公开(公告)号：EP0871795A4

公开(公告)日：2001-11-14

申请号：EP96923578

申请日：1996-06-28

Applicant: LAM RES CORP

Inventor： BENJAMIN NEIL ,  MANGANO STEFANO ,  JEWETT RUSSELL

IPC: H05H1/46 ,  C03C15/00 ,  C03C17/245 ,  C23C16/50 ,  C23C16/507 ,  H01J37/32 ,  C23C16/00 ,  C23F1/02

CPC classification number: H01J37/321 ,  C03C15/00 ,  C03C17/245 ,  C23C16/507

Abstract: A plasma processing device (25) including a vacuum chamber (27) for processing a substrate (29) and a source chamber (26) for generating a plasma is disclosed where the source chamber (26) has a non-cylindrical geometry. Helicon waves of plasma are propagated from the source chamber into the vacuum chamber by a magnetic field having substantially parallel magnetic field lines extending from the source chamber into the vacuum chamber. A RF antenna (31 and 32) of a novel serpentine configuration is used to couple electromagnetic energy into the source chamber to create helicon plasma waves in the source chamber (26). The non-cylindrical geometry of the source chamber allows the processing of large area substrates due to the ability to scale the source chamber to the desired application while maintaining throughput efficiency and the ability to propagate helicon waves along the magnetic field lines present in the source chamber. In one embodiment a linear source chamber having the shape of an elongated rectangular box is disclosed wherein a slot opening (28) connects the source chamber to the vacuum chamber. Due to the ability of the helicon waves from a linear source chamber to propagate in a vacuum chamber without interference from a helicon wave from a similar source chamber, a plasma processing device is disclosed wherein multiple extended non-cylindrical source chambers are arranged to propagate nonparallel helicon plasma waves in a vacuum chamber.

Abstract translation: 公开了一种等离子体处理装置（25），其包括用于处理基板（29）的真空室（27）和用于产生等离子体的源室（26），其中源室（26）具有非圆柱形几何形状。 等离子体的螺旋波通过具有从源室延伸到真空室中的基本上平行的磁场线的磁场从源室传播到真空室中。 使用新型蛇形结构的RF天线（31和32）将电磁能耦合到源室中，以在源室（26）中产生螺旋形等离子体波。 源室的非圆柱形几何形状允许对大面积衬底进行处理，这是由于能够将源室缩放到期望的应用，同时保持生产效率和沿存在于源室中的磁场线传播螺旋形波的能力 。 在一个实施例中，公开了具有细长矩形盒的形状的线性源室，其中槽开口（28）将源室连接到真空室。 由于来自线性源室的螺旋形波的能力在真空室中传播而没有来自类似源室的螺旋波的干扰，公开了一种等离子体处理装置，其中多个扩展的非圆柱形源室被布置成传播不平行 螺旋形等离子体波在真空室中。

公开(公告)号：EP1831807A4

公开(公告)日：2009-12-02

申请号：EP05789224

申请日：2005-08-19

Applicant: LAM RES CORP

Inventor： BENJAMIN NEIL ,  GOTTSCHO RICHARD A ,  BRIGHT NICOLAS ,  STEGER ROBERT

IPC: G06F19/00 ,  G05B19/418

CPC classification number: G01R31/3187 ,  G05B19/4184 ,  G05B2219/31362 ,  G05B2219/31463 ,  Y02P90/14 ,  Y02P90/86

公开(公告)号：EP1391140A4

公开(公告)日：2006-02-22

申请号：EP02723949

申请日：2002-04-23

Applicant: LAM RES CORP

Inventor： BENJAMIN NEIL ,  STEGER ROBERT

IPC: C23F4/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/3065 ,  H01L21/683 ,  H05B3/16 ,  C23C16/00 ,  H05B3/44 ,  H05B3/68

CPC classification number: H01J37/20 ,  H01J2237/2001 ,  H01L21/67103 ,  H01L21/67248

Abstract: A chuck for a plasma processor comprises a temperature-controlled base (302), a thermal insulator (304), a flat support (306), and a heater (308). The temperature-controlled base (302) has a temperature below the desired temperature of a workpiece (310). The thermal insulator (304) is disposed over the temperature-controlled base (302). The flat support (306) holds a workpiece (310) and is disposed over the thermal insulator (304). A heater (308) is embedded within the flat support and/or disposed on an underside of the flat support. The heater includes a plurality of heating elements that heat a plurality of corresponding heating zones. The power supplied and/or temperature of each heating element is controlled independently.

公开(公告)号：WO2009006151A3

公开(公告)日：2009-03-05

申请号：PCT/US2008068154

申请日：2008-06-25

Applicant: LAM RES CORP ,  BENJAMIN NEIL

Inventor： BENJAMIN NEIL

IPC: H01L21/3065

CPC classification number: H01J37/321

Abstract: An arrangement for enabling local control of power delivery within a plasma processing system having a plasma processing chamber during processing of a substrate is provided. The arrangement includes a dielectric window and an inductive arrangement. The inductive arrangement is disposed above the dielectric window to enable power to couple with a plasma in the plasma processing system. The inductive arrangement includes a set of inductive elements, which provides the local control of power delivery to create a substantially uniform plasma in the plasma processing chamber.

Abstract translation: 提供了一种用于在处理衬底期间能够在具有等离子体处理室的等离子体处理系统内对功率输送进行局部控制的装置。 该布置包括电介质窗口和电感布置。 感应装置设置在介电窗口上方以使功率能够与等离子体处理系统中的等离子体耦合。 感应装置包括一组感应元件，其提供功率输送的局部控制以在等离子体处理室中产生基本均匀的等离子体。

公开(公告)号：WO2008017050A3

公开(公告)日：2008-10-30

申请号：PCT/US2007075113

申请日：2007-08-02

Applicant: LAM RES CORP ,  BENJAMIN NEIL ,  GOTTSCHO RICHARD ALAN ,  BRIGHT NICOLAS ,  STEGER ROBERT

Inventor： BENJAMIN NEIL ,  GOTTSCHO RICHARD ALAN ,  BRIGHT NICOLAS ,  STEGER ROBERT

IPC: G06F19/00

CPC classification number: G06Q10/06 ,  G05B2219/31291 ,  G05B2219/31421 ,  G05B2219/45031 ,  Y02P90/10

Abstract: A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.

Abstract translation: 公开了一种基板处理系统中的部件管理方法。 衬底处理系统具有一组组件，该组组件中的至少多个组件被指定为智能组件，多个组件的每个组件具有智能组件增强（ICE）。 该方法包括查询多个组件以从它们各自的ICE请求它们各自的唯一标识数据。 该方法还包括如果多个组件中的任何组件响应于查询，则从多个组件接收唯一的标识数据。 该方法另外包括：如果在预期第一组件识别数据时多个组件的第一组件不能提供第一组件唯一标识数据，则标记第一组件以用于校正动作。

公开(公告)号：WO2005028994A3

公开(公告)日：2005-05-19

申请号：PCT/US2004025517

申请日：2004-08-05

Applicant: LAM RES CORP ,  PERRY ANDREW ,  STEGER ROBERT ,  BENJAMIN NEIL

Inventor： PERRY ANDREW ,  STEGER ROBERT ,  BENJAMIN NEIL

IPC: G01C1/00 ,  H01L21/68 ,  H01L21/00

CPC classification number: G01C1/00 ,  H01J2237/30438 ,  H01L21/681

Abstract: An optical alignment system for use in a semiconductor processing system is provided. The optical alignment system includes a wafer chuck that has an alignment feature integrated into the top surface of the wafer chuck. In addition, a beam-forming system, which is capable of emitting an optical signal onto the alignment feature, is disposed above the wafer chuck. Also, a detector in included that can detect an amplitude of the optical signal emitted onto the alignment feature. In one aspect, the alignment feature can be a reflective alignment feature that reflects a portion of the optical signal back to the beam detector. In additional aspect, the alignment feature can be a transmittance alignment feature capable of allowing a portion of the optical signal to pass through the wafer chuck to the detector. In this aspect, the detector can be disposed below the wafer chuck.

Abstract translation: 提供了一种用于半导体处理系统的光学对准系统。 该光学对准系统包括晶片卡盘，该晶片卡盘具有集成在晶片卡盘的顶表面中的对准特征。 另外，能够将光信号发射到对准特征上的光束形成系统设置在晶片卡盘上方。 另外，包括的检测器可以检测发射到对准特征上的光信号的幅度。 在一个方面，对准特征可以是将光信号的一部分反射回光束检测器的反射对准特征。 在另外的方面中，对准特征可以是能够允许一部分光信号通过晶片卡盘到达检测器的透射比对特征。 在这方面，检测器可以设置在晶片卡盘下方。

公开(公告)号：WO03026364A8

公开(公告)日：2004-01-15

申请号：PCT/US0229223

申请日：2002-09-16

Applicant: LAM RES CORP

Inventor： BENJAMIN NEIL ,  COOPERBERG DAVID

IPC: H05H1/46 ,  H01J37/32

CPC classification number: H05H1/46 ,  H01J37/321

Abstract: A plasma processor coil can include a shorting turn ohmically or only reactively coupled to plural multi-turn, co-planar, interleaved spiral, parallel connected windings. A separate capacitor can be associated with each winding to shunt current from one portion of that winding to another portion of the winding. The spacing between adjacent turns of peripheral portions of each winding can differ from the spacing between adjacent turns of interior portions of each winding. The coil can have a length that is short relative to the wavelength of RF excitation for the coil.

Abstract translation: 等离子体处理器线圈可以包括欧姆地或仅反应地耦合到多个多匝，共面，交错的螺旋，并联的绕组的短路匝。 单独的电容器可以与每个绕组相关联以将电流从该绕组的一部分分流到绕组的另一部分。 每个绕组的周边部分的相邻匝之间的间隔可以不同于每个绕组的内部部分的相邻匝间的间隔。 线圈可以具有相对于线圈的RF激励波长短的长度。

公开(公告)号：WO2008017050A9

公开(公告)日：2008-03-20

申请号：PCT/US2007075113

申请日：2007-08-02

Applicant: LAM RES CORP ,  BENJAMIN NEIL ,  GOTTSCHO RICHARD ALAN ,  BRIGHT NICOLAS ,  STEGER ROBERT

Inventor： BENJAMIN NEIL ,  GOTTSCHO RICHARD ALAN ,  BRIGHT NICOLAS ,  STEGER ROBERT

IPC: G06F19/00

CPC classification number: G06Q10/06 ,  G05B2219/31291 ,  G05B2219/31421 ,  G05B2219/45031 ,  Y02P90/10

Abstract: A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.

Abstract translation: 公开了一种衬底处理系统中的部件管理方法。 衬底处理系统具有一组组件，该组组件中的至少多个组件被指定为智能组件，该多个组件中的每个组件具有智能组件增强（ICE）。 该方法包括查询多个组件以从它们各自的ICE请求它们各自的唯一标识数据。 该方法还包括如果多个组件中的任何组件响应于查询，则从多个组件接收唯一标识数据。 该方法还包括如果多个部件中的第一部件在预期第一部件识别数据时未能提供第一部件唯一识别数据，则标记第一部件以进行纠正动作。

公开(公告)号：WO03026364B1

公开(公告)日：2003-12-04

申请号：PCT/US0229223

申请日：2002-09-16

Applicant: LAM RES CORP

Inventor： BENJAMIN NEIL ,  COOPERBERG DAVID

IPC: H05H1/46 ,  H01J37/32

CPC classification number: H05H1/46 ,  H01J37/321

Abstract: A plasma processor coil can include a shorting turn ohmically or only reactively coupled to plural multi-turn, co-planar, interleaved spiral, parallel connected windings. A separate capacitor can be associated with each winding to shunt current from one portion of that winding to another portion of the winding. The spacing between adjacent turns of peripheral portions of each winding can differ from the spacing between adjacent turns of interior portions of each winding. The coil can have a length that is short relative to the wavelength of RF excitation for the coil.

Abstract translation: 等离子体处理器线圈可以包括欧姆地或仅反应地耦合到多个多匝，共面，交错的螺旋，并联的绕组的短路匝。 单独的电容器可以与每个绕组相关联以将电流从该绕组的一部分分流到绕组的另一部分。 每个绕组的周边部分的相邻匝之间的间隔可以不同于每个绕组的内部部分的相邻匝间的间隔。 线圈可以具有相对于线圈的RF激励波长短的长度。

公开(公告)号：JP2008277847A

公开(公告)日：2008-11-13

申请号：JP2008152184

申请日：2008-06-10

Applicant: Lam Res Corp ,  ラム リサーチ コーポレーションLam Research Corporation

Inventor： NAKAJIMA SHU ,  BENJAMIN NEIL

IPC: H01L21/3065 ,  H01L21/683 ,  H02N13/00

CPC classification number: H01L21/6833

Abstract: PROBLEM TO BE SOLVED: To provide a sintered ceramic electrostatic chucking device (ESC) which includes a patterned electrostatic clamping electrode embedded in a ceramic body. SOLUTION: The clamping electrode includes at least one strip made of an electrically conductive material arranged in a fine pattern. Due to the fineness of the electrode pattern employed, stresses induced during manufacture of the ESC are reduced such that the electrostatic clamping electrode remains substantially planar after the sintering operation. The resulting ESC allows for improved clamping uniformity. Another ESC includes an insulating or semi-conducting body and a clamping electrode having a high resistivity or a high lateral impedance. The electrostatic chucking device provides improved RF coupling uniformity when RF energy is coupled through the clamping electrode from an underlying RF electrode. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种烧结陶瓷静电夹持装置（ESC），其包括嵌入在陶瓷体中的图案化静电夹持电极。 解决方案：夹持电极包括由精细图案布置的导电材料制成的至少一个条带。 由于使用的电极图案的细度，ESC制造期间引起的应力减小，使得静电夹持电极在烧结操作之后保持基本平坦。 所得的ESC允许改进的夹紧均匀性。 另一个ESC包括绝缘或半导电体和具有高电阻率或高横向阻抗的夹持电极。 当RF能量通过夹持电极从下面的RF电极耦合时，静电吸盘装置提供改进的RF耦合均匀性。 版权所有（C）2009，JPO＆INPIT