公开(公告)号：WO02080219B1

公开(公告)日：2002-12-05

申请号：PCT/US0209563

申请日：2002-03-29

Applicant: LAM RES CORP ,  CHEN JIAN J ,  VELTROP ROBERT G ,  WICKER THOMAS E

Inventor： CHEN JIAN J ,  VELTROP ROBERT G ,  WICKER THOMAS E

IPC: H05H1/46 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065

CPC classification number: H01J37/321

Abstract: A radio frequency excitation coil of an inductive plasma processor includes a planar turn (103) connected in series with a segment (115) of the coil stacked above a portion of the planar turn. The stacked segment is placed around a region having weak radio frequency coupling to plasma due to azimuthal asymmetries in the chamber and/or the excitation coil. In a single winding embodiment, the stacked segment is close to an interconnection gap between two adjacent planar turns and extends in both directions from the gap to compensate low radio frequency coupling to plasma in the gap region. In an embodiment including two electrically parallel spatially concentric windings, the stacked segment extends beyond one side of an interconnection gap of two adjacent turns, and is aligned with the planar turn such that one end of the stacked segment is directly connected to an end of the planar turn via a straight, short stub. Terminal (111) of the coil is connected to RF excitation circuitry (28) terminals in a housing above the coil by leads (128) extending smoothly and gradually without sharp bends between the coil terminals and the excitation circuitry terminals. Ends of the planar turn (113) and the stacked segment are connected by a lead (116) extending smoothly and gradually without sharp bends between its ends.

Abstract translation: 感应等离子体处理器的射频激励线圈包括与堆叠在平面转弯的一部分上方的线圈的区段（115）串联连接的平坦转弯（103）。 由于腔室和/或激励线圈中的方位角不对称，堆叠的节段被放置在具有与等离子体耦合的弱射频的区域周围。 在单绕组实施例中，堆叠段接近两个相邻平面线匝之间的互连间隙并且从间隙沿两个方向延伸以补偿间隙区域中与等离子体的低射频耦合。 在包括两个电并联的空间同心绕组的实施例中，堆叠节段延伸超过两个相邻匝的互连间隙的一侧，并且与平面匝对齐，使得堆叠节段的一端直接连接到 通过一个直的，短的平头转弯。 线圈的端子（111）通过在线圈端子和激励电路端子之间平滑且逐渐延伸而没有急剧弯曲的引线（128）连接到线圈上方壳体中的RF激励电路（28）端子。 平面转弯（113）和堆叠部分的端部通过在其端部之间没有急剧弯曲地平稳且逐渐延伸的引线（116）连接。

公开(公告)号：WO02080221B1

公开(公告)日：2002-11-28

申请号：PCT/US0209565

申请日：2002-03-29

Applicant: LAM RES CORP ,  CHEN JIAN J ,  VELTROP ROBERT G ,  WICKER THOMAS E

Inventor： CHEN JIAN J ,  VELTROP ROBERT G ,  WICKER THOMAS E

IPC: H01J37/32

CPC classification number: H01J37/32174 ,  H01J37/321

Abstract: An inductive plasma processor includes a multiple winding radio frequency coil having plural electrically parallel, spatially concentric windings (1) having different amounts of RF power supplied to them, and (2) arranged to produce electromagnetic fields having different couplings to different regions of plasma in the chamber to control plasma flux distribution incident on a processed workpiece. The coil is powered by a single radio frequency generator via a single matching network. Input and output ends of each winding are respectively connected to input and output tuning capacitors. In a first embodiment, the location of maximum inductive coupling of the radio frequency to the plasma and the current magnitude in each winding are respectively mainly determined by values of the output and input capacitors. By adjusting all the input and output capacitors simultaneously, the current to a winding can be varied while the current to the other winding can be maintained constant as if these windings were completely de-coupled andindependent. Therefore, the capacitors can control the plasma density in different radial and azimuthal regions. In another embodiment, a relatively low frequency drives the coil whereby each winding has a relatively short electrical length, causing substantially small standing wave current and voltage variations. The output capacitor for each winding adjusts current magnitude, to eliminate the need for the input capacitors and reduce operational complexity.

Abstract translation: 感应等离子体处理器包括具有多个并联的空间上同心的绕组（1）的多绕组射频线圈，其具有提供给它们的不同量的RF功率，以及（2）被布置成产生具有不同耦合到不同等离子体区域的电磁场 该室用于控制入射在加工工件上的等离子体通量分布。 线圈由单个射频发生器通过单个匹配网络供电。 每个绕组的输入和输出端分别连接到输入和输出调谐电容器。 在第一实施例中，射频与等离子体的最大电感耦合的位置和每个绕组中的电流大小分别主要由输出和输入电容器的值决定。 通过同时调节所有输入和输出电容器，可以改变绕组的电流，同时可以保持恒定的电流到同一绕组的电流，就好像这些绕组完全去耦合和独立的一样。 因此，电容器可以控制不同径向和方位区域的等离子体密度。 在另一个实施例中，较低频率驱动线圈，由此每个绕组具有相对较短的电长度，导致基本上较小的驻波电流和电压变化。 每个绕组的输出电容器调整电流幅值，以消除对输入电容器的需要，降低操作复杂度。

公开(公告)号：JP2010003699A

公开(公告)日：2010-01-07

申请号：JP2009181946

申请日：2009-08-04

Applicant: Lam Res Corp ,  ラム リサーチ コーポレーションLam Research Corporation

Inventor： CHEN JIAN J ,  VELTROP ROBERT G ,  WICKER THOMAS E

IPC: H05H1/46 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

CPC classification number: H01J37/321

Abstract: PROBLEM TO BE SOLVED: To provide a plasma generating device capable of controllable and uniform inductive coupling in a plasma reactor. SOLUTION: A double coil coupling system uses parallel antenna elements. Two coils (a coil 1 and a coil 2) are symmetrical, and each loop of the coils consists of a semicircle and parallel antenna elements. An RF is simultaneously supplied to a center of a parallel element of each coil (closer to a parallel axis), end parts of other coils are coupled to be terminated on the ground through a capacitor C T . COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够在等离子体反应器中具有可控和均匀的电感耦合的等离子体产生装置。

解决方案：双线圈耦合系统使用并联天线元件。 两个线圈（线圈1和线圈2）是对称的，并且线圈的每个环路由半圆形和平行的天线元件组成。 RF同时提供给每个线圈的平行元件的中心（更靠近平行的轴），其它线圈的端部通过电容器C连接到地面上。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：AU4954499A

公开(公告)日：2000-01-17

申请号：AU4954499

申请日：1999-06-18

Applicant: LAM RES CORP

Inventor： CHEN JIAN J ,  VELTROP ROBERT G ,  WICKER THOMAS E

IPC: H05H1/46 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A radio frequency plasma multiple-coil antenna allows for controllable, uniform inductive coupling within a plasma reactor. According to exemplary embodiments, multiple coils are positioned on a dielectric window of a plasma chamber, and are powered by a single radio frequency generator and tuned by a single matching network. Each coil is either planar or a combination of a planar coil and a vertically stacked helical coil. The input end of each coil is connected to an input tuning capacitor and the output end is terminated to the ground through an output tuning capacitor. The location of the maximum inductive coupling of the radio frequency to the plasma is mainly determined by the output capacitor, while the input capacitor is mainly used to adjust current magnitude into each coil. By adjusting the current magnitude and the location of the maximum inductive coupling within each coil, the plasma density in different radial and azimuthal regions can be varied and controlled, and therefore, radially and azimuthally uniform plasma can be achieved.

公开(公告)号：DE60220652T2

公开(公告)日：2007-10-25

申请号：DE60220652

申请日：2002-03-29

Applicant: LAM RES CORP

Inventor： VELTROP ROBERT G ,  CHEN JIAN J ,  WICKER THOMAS E

IPC: H01J37/32 ,  H05H1/46 ,  H01L21/205 ,  H01L21/3065

Abstract: An inductive plasma processor includes an RF plasma excitation coil having plural windings, each having a first end connected in parallel to be driven by a single RF source via a single matching network. Second ends of the windings are connected to ground by termination capacitors, in turn connected by a lead to ground. A current sensor including a winding around a toroidal core is coupled to the lead between each termination capacitor and ground. The current sensor is surrounded by a grounded shield. There is minimum electromagnetic interference from an ambient RF environment to the current sensor, to provide an accurate current sensor.

公开(公告)号：DE69939321D1

公开(公告)日：2008-09-25

申请号：DE69939321

申请日：1999-06-18

Applicant: LAM RES CORP

Inventor： CHEN JIAN J ,  VELTROP ROBERT G ,  WICKER THOMAS E

IPC: H01J37/32 ,  H05H1/46 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A radio frequency plasma multiple-coil antenna allows for controllable, uniform inductive coupling within a plasma reactor. According to exemplary embodiments, multiple coils are positioned on a dielectric window of a plasma chamber, and are powered by a single radio frequency generator and tuned by a single matching network. Each coil is either planar or a combination of a planar coil and a vertically stacked helical coil. The input end of each coil is connected to an input tuning capacitor and the output end is terminated to the ground through an output tuning capacitor. The location of the maximum inductive coupling of the radio frequency to the plasma is mainly determined by the output capacitor, while the input capacitor is mainly used to adjust current magnitude into each coil. By adjusting the current magnitude and the location of the maximum inductive coupling within each coil, the plasma density in different radial and azimuthal regions can be varied and controlled, and therefore, radially and azimuthally uniform plasma can be achieved.

公开(公告)号：DE60220652D1

公开(公告)日：2007-07-26

申请号：DE60220652

申请日：2002-03-29

Applicant: LAM RES CORP

Inventor： VELTROP ROBERT G ,  CHEN JIAN J ,  WICKER THOMAS E

IPC: H01J37/32 ,  H05H1/46 ,  H01L21/205 ,  H01L21/3065

Abstract: An inductive plasma processor includes an RF plasma excitation coil having plural windings, each having a first end connected in parallel to be driven by a single RF source via a single matching network. Second ends of the windings are connected to ground by termination capacitors, in turn connected by a lead to ground. A current sensor including a winding around a toroidal core is coupled to the lead between each termination capacitor and ground. The current sensor is surrounded by a grounded shield. There is minimum electromagnetic interference from an ambient RF environment to the current sensor, to provide an accurate current sensor.