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公开(公告)号:SG10201606450VA
公开(公告)日:2017-03-30
申请号:SG10201606450V
申请日:2016-08-04
Applicant: LAM RES CORP
Inventor: LAI CHIUKIN STEVEN , KANARIK KEREN JACOBS , TAN SAMANTHA , CHANDRASHEKAR ANAND , SU TEH‐TIEN , YANG WENBING , WOOD MICHAEL , DANEK MICHAL
Abstract: Methods of depositing tungsten into high aspect ratio features using a dep-etch-dep process integrating various deposition techniques with alternating pulses of surface modification and removal during etch are provided herein.