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    MULTIBEAM DIFFRACTION GRATING-BASED BACKLIGHTING
    1.
    发明申请
    MULTIBEAM DIFFRACTION GRATING-BASED BACKLIGHTING 审中-公开
    MULTIBEAM DIFFRACTION GRATING-BED背光

    公开(公告)号：WO2015016844A1

    公开(公告)日：2015-02-05

    申请号：PCT/US2013/052774

    申请日：2013-07-30

    Applicant: LEIA INC.

    Inventor： FATTAL, David A. ,  PENG, Zhen ,  SANTORI, Charles M.

    IPC: F21S2/00 ,  G02F1/33 ,  F21V8/00

    CPC classification number: G02B6/0038 ,  G02B5/1861 ,  G02B5/1866 ,  G02B6/0036 ,  G02B6/005 ,  G02B6/0068 ,  G02B27/2214 ,  G02F1/133615

    Abstract: Multibeam diffraction grating-based backlighting includes a light guide and a multibeam diffraction grating at a surface of the light guide. The light guide is to guide light from a light source. The multibeam diffraction grating is to couple out a portion of the guided light using diffractive coupling and to direct the coupled out portion away from the light guide as a plurality of light beams with different principal angular directions.

    Abstract translation: 基于多波束衍射光栅的背光包括在光导表面上的光导和多波束衍射光栅。 导光体是引导来自光源的光。 多光束衍射光栅是使用衍射耦合来耦合出导引光的一部分，并将耦合的外部部分远离光导引导为具有不同主角方向的多个光束。

    WAFER TILING METHOD TO FORM LARGE-AREA MOLD MASTER HAVING SUB-MICROMETER FEATURES
    2.
    发明申请
    WAFER TILING METHOD TO FORM LARGE-AREA MOLD MASTER HAVING SUB-MICROMETER FEATURES 审中-公开

    公开(公告)号：WO2019236136A1

    公开(公告)日：2019-12-12

    申请号：PCT/US2018/067187

    申请日：2018-12-21

    Applicant: LEIA INC.

    Inventor： PENG, Zhen ,  VO, Sonny ,  SOICHI, Emeline

    IPC: G03F9/00 ,  G03F7/00

    Abstract: A method of forming a large-area nanoimprint mold master is provided. The method comprises positioning a plurality of sub-master tiles on a rigid planar substrate. Each sub-master tile of the sub-master tile plurality has a nanoscale pattern and represents a subsection of the large-area nanoimprint mold master. The method further comprises adhering the plurality of sub-master tiles to the rigid planar substrate. The positioning determines a distance between a nanoscale feature of the nanoscale pattern on each sub-master tile of a pair of adjacent sub-master tiles. The distance has microscale positioning tolerance. Also provided are a large-area nanoimprint mold master and a method of large-area nanoimprint lithography.

    DIRECTIONAL BACKLIGHT WITH A MODULATION LAYER
    10.
    发明公开
    DIRECTIONAL BACKLIGHT WITH A MODULATION LAYER 审中-公开
    带调制层的方向背光

    公开(公告)号：EP3301504A1

    公开(公告)日：2018-04-04

    申请号：EP17202907.6

    申请日：2012-06-01

    Applicant: LEIA Inc.

    Inventor： FATTAL, David A. ,  BRUG, James A. ,  SANTORI, Charles M. ,  FLORENTINO, Marco ,  PENG, Zhen

    IPC: G02B27/22 ,  F21V8/00 ,  G02B27/10

    CPC classification number: G02B27/22 ,  G02B6/0036 ,  G02B6/0043 ,  G02B6/0058 ,  G02B6/0068 ,  G02B6/0078 ,  G02B27/1086 ,  H04N13/32

    Abstract: A directional backlight is disclosed. The directional backlight has a directional backplane that has a plurality of directional pixels to scatter a plurality of input planar lightbeams into a plurality of directional lightbeams. Each directional lightbeam has a direction and angular spread controlled by characteristics of a directional pixel in the plurality of directional pixels. A modulation layer having a plurality of modulators modulates the plurality of directional lightbeams. The directional backlight can be used to generate a 3D image with multiple views by specifying the characteristics of the directional pixels in the directional backplane.

    Abstract translation: 公开了一种定向背光源。 定向背光具有定向背板，其具有多个定向像素以将多个输入平面光束散射到多个定向光束中。 每个定向光束具有由多个定向像素中的定向像素的特性控制的方向和角展度。 具有多个调制器的调制层调制多个定向光束。 通过指定定向背板中的方向性像素的特性，定向背光源可用于生成具有多个视图的3D图像。

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