-
公开(公告)号：JP2004295145A
公开(公告)日：2004-10-21
申请号：JP2004168501
申请日：2004-06-07
Inventor： DANNER LAMBERT , EISENKRAEMER FRANK , VEITH MICHAEL , VOLLRATH WOLFGANG , OSTERFELD MARTIN
CPC classification number: G02B21/16
Abstract: PROBLEM TO BE SOLVED: To constitute an illuminating device for a DUV microscope so that it can supply a DUV wavelength band having the maximum transmittance and a small half value width.
SOLUTION: The illuminating device for the DUV microscope (1) is provided with an illuminating beam path (6) emitted from a DUV light source (5), and a collector (7) and a reflection filter system (9) are arranged on the illuminating beam path, the DUV wavelength band is formed by the reflection filter system, and the reflection filter system is constituted of four reflection filters (8), and also, a transmission filter is not installed between the reflection filters. The illumination beam path (6) is separately reflected by each reflection filter at the same reflection angle α, and the illumination beam path (6) coaxially extends before and behind the reflection filter system (9). According to this invention, incident angle α≤30° is established, the DUV wavelength band is provided with the half value width of 20nm maximum and a peak having a peak value S of ≥90% of the incident light intensity. A DUV objective lens for the DUV microscope (1) can be very satisfactorily corrected by the attained very narrow half value width of the DUV wavelength band.
COPYRIGHT: (C)2005,JPO&NCIPI-
公开(公告)号：JP2001042226A
公开(公告)日：2001-02-16
申请号：JP2000208838
申请日：2000-07-10
Applicant: LEICA MICROSYSTEMS
Inventor： DANNER LAMBERT , EISENKRAEMER FRANK , VEITH MICHAEL , VOLLRATH WOLFGANG , OSTERFELD MARTIN
Abstract: PROBLEM TO BE SOLVED: To enable an illuminator for a DUV microscope to supply a DUV wavelength band having maximum transmissivity and small half value width. SOLUTION: This illuminator for the DUV microscope 1 is equipped with an illumination beam path 6 emitted from a DUV light source 5, and a collector 7 and a reflection filter system 9 are arranged in the beam path 6. The system 9 forms the DUV wavelength band and is composed of four reflection filters 8. The beam path 6 is reflected by the filter 8 by the same reflection angle α, and the beam path 6 is coaxially extended ahead and astern of the system 9. Thus, an incident angle α =90% of the intensity of the light made incident. The DUV objective lens of the DUV microscope 1 is very excellently corrected according to the half value width of the very small attained DUV wavelength band.
-
公开(公告)号：DE102012206796B4
公开(公告)日：2013-12-05
申请号：DE102012206796
申请日：2012-04-25
Applicant: LEICA MICROSYSTEMS
Inventor： UNGER RALF , EISENKRAEMER FRANK
Abstract: Schnittstrecker-Glasplatte (2) zur Verwendung in einer Einrichtung (1) zum Strecken von Probenschnitten mit einem Schneidmesser, wobei die Schnittstrecker-Glasplatte (2) am Rücken (3) des Schneidmessers derart angeordnet ist, dass zwischen dem Rücken (3) des Schneidmessers und der Platte (2) ein definierter Spalt (4) zur Aufnahme der geschnittenen Probe gebildet wird, dadurch gekennzeichnet, dass die Schnittstrecker-Glasplatte (2) zumindest an einer ihrer Längsseiten (21, 22) über planoptisch geschliffene und polierte Kanten (211, 212; 221, 222) mit einer optischen Planität besser λ/2 und/oder einer Rauheit
-
公开(公告)号：DE102010060558B3
公开(公告)日：2012-03-29
申请号：DE102010060558
申请日：2010-11-15
Applicant: LEICA MICROSYSTEMS
Inventor： EISENKRAEMER FRANK , GUENTHER STEFFEN , HEUCK HANS-MARTIN
Abstract: Optisches Element (10, 50, 60) zum Verteilen von Licht, das in einem vorbestimmten Arbeitswellenlängenbereich eine vorgegebene spektrale Energieverteilung aufweist, mit: einem transparenten Körper (12), in den das Licht eintritt, und einer innerhalb des transparenten Körpers (12) ausgebildeten Strahlteilerschicht (18), die in dem Arbeitswellenlängenbereich einen vorgegebenen wellenlängenabhängigen Reflexionsgrad, mit dem sie das in den transparenten Körper (12) eintretende Licht zur Erzeugung eines reflektierten Austrittslichtbündels reflektiert, und einen wellenlängenabhängigen Transmissionsgrad hat, mit dem sie das in den transparenten Körper (12) eintretende Licht zur Erzeugung eines transmittierten Austrittslichtbündels transmittiert, gekennzeichnet durch eine an dem transparenten Körper (12) separat von der Strahlteilerschicht (18) ausgebildete Kompensationsschichtanordnung (28, 30, 52, 54), deren Transmissionsgrad bezüglich des durch die Kompensationsschichtanordnung (28, 30, 52, 54) tretenden Lichts in Abhängigkeit des Reflexionsgrads und des Transmissionsgrads der Strahlteilerschicht (18) so festgelegt ist, dass das reflektierte Austrittslichtbündel und das transmittierte Austrittslichtbündel innerhalb des Arbeitswellenlängenbereichs übereinstimmende spektrale Energieverteilungen aufweisen,...
-
公开(公告)号：DE59810631D1
公开(公告)日：2004-02-26
申请号：DE59810631
申请日：1998-03-20
Applicant: LEICA MICROSYSTEMS
Inventor： EISENKRAEMER FRANK
Abstract: The invention relates to an absorbent thin-film system made up of alternate metal and dielectric layers. With this system, color-neutral absorption results in the visual spectral region are obtained, as are a defined phase shift and a defined transmission. This film system is used for contrasting methods or contrasting systems in microscopy.
-
Patent Agency Ranking
公开(公告)号：DE102004033967B3
公开(公告)日：2005-12-15
申请号：DE102004033967
申请日：2004-07-14
Applicant: LEICA MICROSYSTEMS
Inventor： EISENKRAEMER FRANK , SCHULZ CHRISTIAN , KRUEGER RALF
-
公开(公告)号：DE10119909A1
公开(公告)日：2002-10-31
申请号：DE10119909
申请日：2001-04-23
Applicant: LEICA MICROSYSTEMS
Inventor： EISENKRAEMER FRANK
Abstract: An inspection microscope for several wavelength ranges with at least one illuminating beam path and at least one imaging beam path is disclosed. Those optical elements in the illuminating beam path and in the imaging beam path, through which beams of all wavelengths pass, are provided with a reflection reducing layer, by means of which the wavelength ranges with reduced reflection are the visible VIS-wavelength range up to 650 nm, the i-lines at lambda =365 nm and the ultraviolet DUV- wavelength range from 240 nm to 270 nm. The reflection reducing layer is a sandwich structure, comprising various material combinations, such as for example, M2/MgF2 or M2/MgF2/SiO2 or M2/MgF2/Al2O3, where M2 is a mixed substance from the company Merck, comprising La2O3.3,3 Al2O3. The optical components with reduced reflectance preferably comprise quartz glass or CaF2.
-
公开(公告)号：DE102012206796A1
公开(公告)日：2013-10-31
申请号：DE102012206796
申请日：2012-04-25
Applicant: LEICA MICROSYSTEMS
Inventor： UNGER RALF , EISENKRAEMER FRANK
Abstract: Die vorliegende Erfindung betrifft eine Glasplatte (2) zur Verwendung in einer Einrichtung (1) zum Strecken von Probenschnitten mit einem Schneidmesser, wobei die Glasplatte (2) am Rücken (3) des Schneidmessers derart angeordnet ist, dass zwischen dem Rücken (3) des Schneidmessers und der Platte (2) ein definierter Spalt (4) zur Aufnahme der geschnittenen Probe gebildet wird, wobei die Glasplatte (2) zumindest an einer ihrer Längsseiten (21, 22) über planoptisch geschliffene und polierte Kanten (211, 212; 221, 222) verfügt.
-
公开(公告)号：DE50011735D1
公开(公告)日：2006-01-05
申请号：DE50011735
申请日：2000-05-27
Applicant: LEICA MICROSYSTEMS
Inventor： DANNER LAMBERT , VOLLRATH WOLFGANG , EISENKRAEMER FRANK , OSTERFELD MARTIN , VEITH MICHAEL
Abstract: A lighting device for a DUV microscope (1) has a lighting beam path (6) going out from a DUV light source (5) in which a collector (7) and a reflection filter system (9) are located. The latter generates a DUV wavelength band and consists of four reflection filters (8) at which the lighting beam path is reflected at the same angle of reflection alpha. In front of and behind the reflection filter system, the lighting beam path runs coaxially. The angle of reflection alpha is no greater than 30 degrees. The DUV wavelength band, lambda plus delta lambda, has a half value width of 20 nano-meters maximum and a peak with a crest value of over 90% of the radiated light intensity.
-
公开(公告)号：DE10119909B4
公开(公告)日：2005-04-21
申请号：DE10119909
申请日：2001-04-23
Applicant: LEICA MICROSYSTEMS
Inventor： EISENKRAEMER FRANK
Abstract: An inspection microscope for several wavelength ranges with at least one illuminating beam path and at least one imaging beam path. Those optical elements in the illuminating beam path and in the imaging beam path, through which beams of all wavelengths pass, are provided with a reflection-reducing layer, by means of which the wavelength ranges with reduced reflection are the visible VIS-wavelength range up to 650 nm, the i-lines at lambda=365 nm and the ultraviolet DUV-wavelength range from 240 nm to 270 nm. The reflection-reducing layer is a sandwich structure, comprising various material combinations, such as for example, M2/MgF 2 or M2/MgF 2 /SiO 2 or M2/MgF 2 /Al 2 O 3 , where M2 is a mixed substance from the company Merck, comprising Al 2 O 3 . The optical components with reduced reflectance preferably comprise quartz glass or CaF 2 .
-
-
-
-
-
-
-
-
-
Search Results
11
records
(took 0.02 seconds)
