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公开(公告)号：JP2004295145A
公开(公告)日：2004-10-21
申请号：JP2004168501
申请日：2004-06-07
Inventor： DANNER LAMBERT , EISENKRAEMER FRANK , VEITH MICHAEL , VOLLRATH WOLFGANG , OSTERFELD MARTIN
CPC classification number: G02B21/16
Abstract: PROBLEM TO BE SOLVED: To constitute an illuminating device for a DUV microscope so that it can supply a DUV wavelength band having the maximum transmittance and a small half value width.
SOLUTION: The illuminating device for the DUV microscope (1) is provided with an illuminating beam path (6) emitted from a DUV light source (5), and a collector (7) and a reflection filter system (9) are arranged on the illuminating beam path, the DUV wavelength band is formed by the reflection filter system, and the reflection filter system is constituted of four reflection filters (8), and also, a transmission filter is not installed between the reflection filters. The illumination beam path (6) is separately reflected by each reflection filter at the same reflection angle α, and the illumination beam path (6) coaxially extends before and behind the reflection filter system (9). According to this invention, incident angle α≤30° is established, the DUV wavelength band is provided with the half value width of 20nm maximum and a peak having a peak value S of ≥90% of the incident light intensity. A DUV objective lens for the DUV microscope (1) can be very satisfactorily corrected by the attained very narrow half value width of the DUV wavelength band.
COPYRIGHT: (C)2005,JPO&NCIPI-
公开(公告)号：JP2003121751A
公开(公告)日：2003-04-23
申请号：JP2002202984
申请日：2002-07-11
Applicant: LEICA MICROSYSTEMS
Inventor： VEITH MICHAEL , GRAF UWE , WIENECKE JOACHIM
IPC: G01N21/84 , G01J1/32 , G01N21/956 , G02B21/06
Abstract: PROBLEM TO BE SOLVED: To achieve reproducible illumination of a specimen field by making illumination quality to a specified illuminated subject consistently constant as an arrangement and method for illuminating the specimen field of an optical instrument. SOLUTION: The arrangement comprises an illumination device (41) having a light source (42) and an illuminating optical system (43); a setting device (44) having at least one motorized drive system (45, 46) for automatic positional adjustment of the light source (42) and/or the illuminating optical system (43); at least one measurement device (55) for sensing parameters of the light generated by the illumination device (41); and a control device (56) that, from a comparison of the measured parameters with predefined reference parameters, generates positioning commands for the motorized drive systems (45, 46) for positional adjustment of the light source (42) and/or the illuminating optical system (43).
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公开(公告)号：JP2003232989A
公开(公告)日：2003-08-22
申请号：JP2003025554
申请日：2003-02-03
Applicant: LEICA MICROSYSTEMS
Inventor： CEMIC FRANZ , DANNER LAMBERT , MAINBERGER ROBERT , VEITH MICHAEL , OSTERFELD MARTIN , GRAF UWE
Abstract: PROBLEM TO BE SOLVED: To constitute an automatic focusing module in such a manner that sharpness adjustment to an object to be examined can be surely made without depending upon an edge effect. SOLUTION: The module is provided with at least two light sources and each of the two light sources forms a light beam for focusing. The light sources are respectively provided with optical means for guiding portions of the respective light beams to input coupling means. The input coupling means input and couple the respective light beams to an illumination light beam of the system of the microscopic base and are provided with at least first and second detectors toward the object in such a manner that the light beams from the first and second light sources respectively reflected from the surface of the object are made incident on the first and second detectors through the optical means. COPYRIGHT: (C)2003,JPO
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公开(公告)号：JP2001042226A
公开(公告)日：2001-02-16
申请号：JP2000208838
申请日：2000-07-10
Applicant: LEICA MICROSYSTEMS
Inventor： DANNER LAMBERT , EISENKRAEMER FRANK , VEITH MICHAEL , VOLLRATH WOLFGANG , OSTERFELD MARTIN
Abstract: PROBLEM TO BE SOLVED: To enable an illuminator for a DUV microscope to supply a DUV wavelength band having maximum transmissivity and small half value width. SOLUTION: This illuminator for the DUV microscope 1 is equipped with an illumination beam path 6 emitted from a DUV light source 5, and a collector 7 and a reflection filter system 9 are arranged in the beam path 6. The system 9 forms the DUV wavelength band and is composed of four reflection filters 8. The beam path 6 is reflected by the filter 8 by the same reflection angle α, and the beam path 6 is coaxially extended ahead and astern of the system 9. Thus, an incident angle α =90% of the intensity of the light made incident. The DUV objective lens of the DUV microscope 1 is very excellently corrected according to the half value width of the very small attained DUV wavelength band.
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公开(公告)号：WO02086580A3
公开(公告)日：2003-05-01
申请号：PCT/EP0203974
申请日：2002-04-10
Applicant: LEICA MICROSYSTEMS , VEITH MICHAEL , DANNER LAMBERT
Inventor： VEITH MICHAEL , DANNER LAMBERT
CPC classification number: G02B21/16
Abstract: The invention relates to an illuminating device (1), preferably for a microscope, particularly for a UV microscope (2), comprising a light source (3) and a reflecting filter system (4, 14). The beam of light from the light source (3) passes through a number of reflections in the reflecting filter system (4, 14). In order to minimize the spatial dimensions of the inventive illuminating device (1), the entering beam (11) of the reflecting filter system (4, 14) has an optical beam offset (13) and/or a different direction with regard to the exit beam (12) of said filter system.
Abstract translation: 本发明涉及一种照明设备（1），优选用于显微镜，特别是UV-显微镜（2），包括：光源（3）和反射过滤器系统（4，14），光的，其中，所述光束（光源3 ）在反射过滤器系统（4，14）的多次反射穿过。 根据本发明的照明设备（1）的特征在于，以最小化空间维度特征在于，所述反射滤光器系统（4,14）到射出光束（12）的输入光束（11）具有的光束偏移（13）和/或方向的改变。
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Patent Agency Ranking6.发明申请
公开(公告)号：WO0045196A3
公开(公告)日：2000-11-30
申请号：PCT/DE0000256
申请日：2000-01-27
Applicant: LEICA MICROSYSTEMS , IBM , VEITH MICHAEL , KNORZ VOLKER , MAEHRINGER KUNZ EDGAR
Inventor： VEITH MICHAEL , KNORZ VOLKER , MAEHRINGER-KUNZ EDGAR
CPC classification number: G02B21/125 , G01N21/9501 , H01L22/12
Abstract: The invention relates to a method and a device for optically examining the structured surfaces of objects, notably of wafers and/or masks. Said optical device comprises an observation beam path (6) whose central axis (42) is directed perpendicularly on to the surface of the object (16), an illuminating beam (2) whose central beam (40) strikes the object (16) surface perpendicular thereto and an illuminating beam (3) whose central beam (41) strikes the object (16) surface obliquely. The image of the surface of the object (16) is observed and/or detected in the observation beam path (6). To this end a filter device (38) and/or detection device (18) is positioned in the observation beam path (6). The optical device further comprises an illuminating device (39) for simultaneously producing a bright field and a dark field illumination, a device for identifying (11) the illuminating beams (2, 3) being assigned to the bright-field (2) and/or dark-field illuminating beam (3).
Abstract translation: 描述了用于光学检查物体特别是晶片和/或掩模的结构化表面的方法和设备。 该光学装置包括：垂直于所述物体的表面的观察光束路径（6），其中心轴（42）（16）寻址，照明光束（2）中，中央电子束（40）垂直于所述物体的表面（16）下降和 照明光束（3），其中心光束（41）倾斜地照射在物体（16）的表面上。 在观察光束路径（6）中，观察和/或检测物体（16）表面的图像。 在观察光束路径（6）中，为此布置了过滤装置（38）和/或检测装置（18）。 该光学装置具有用于同时产生的亮场和暗场照明的照明装置（39），其中，所述明场（2）和/或所述照明光束2的暗场照明光束（3）（为标识（11的装置），3- ）被分配。
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公开(公告)号：DE50011735D1
公开(公告)日：2006-01-05
申请号：DE50011735
申请日：2000-05-27
Applicant: LEICA MICROSYSTEMS
Inventor： DANNER LAMBERT , VOLLRATH WOLFGANG , EISENKRAEMER FRANK , OSTERFELD MARTIN , VEITH MICHAEL
Abstract: A lighting device for a DUV microscope (1) has a lighting beam path (6) going out from a DUV light source (5) in which a collector (7) and a reflection filter system (9) are located. The latter generates a DUV wavelength band and consists of four reflection filters (8) at which the lighting beam path is reflected at the same angle of reflection alpha. In front of and behind the reflection filter system, the lighting beam path runs coaxially. The angle of reflection alpha is no greater than 30 degrees. The DUV wavelength band, lambda plus delta lambda, has a half value width of 20 nano-meters maximum and a peak with a crest value of over 90% of the radiated light intensity.
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公开(公告)号：DE19903486C2
公开(公告)日：2003-03-06
申请号：DE19903486
申请日：1999-01-29
Applicant: LEICA MICROSYSTEMS , IBM
Inventor： VEITH MICHAEL , KNORZ VOLKER , MAEHRINGER-KUNZ EDGAR
Abstract: A method and an apparatus are described for the optical examination of structured surfaces of objects, especially of wafers and/or masks. The optical apparatus has an observation beam path ( 6 ) whose central axis ( 42 ) is directed vertically against the surface of the object ( 16 ), an illumination beam ( 2 ) whose central ray ( 40 ) falls vertically on the surface of the object, and an illumination beam ( 3 ) whose central ray ( 41 ) falls obliquely onto the surface of the object ( 16 ). In the observation beam path ( 6 ) the image of the surface of the object ( 6 ) is observed and/or detected. In the observation beam path ( 6 ) a filter device ( 38 ) and/or detector device ( 18 ) is disposed. The optical system has an illumination device ( 39 ) for the simultaneous production of a dark field illumination, a device for the coding ( 11 ) of the illumination beams ( 2, 3 ) being associated with the bright field ( 2 ) and/or the dark field illumination beam ( 3 ).
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公开(公告)号：DE19931954A1
公开(公告)日：2001-01-11
申请号：DE19931954
申请日：1999-07-10
Applicant: LEICA MICROSYSTEMS
Inventor： DANNER LAMBERT , EISENKRAEMER FRANK , VEITH MICHAEL , VOLLRATH WOLFGANG , OSTERFELD MARTIN
Abstract: A lighting device for a DUV microscope (1) has a lighting beam path (6) going out from a DUV light source (5) in which a collector (7) and a reflection filter system (9) are located. The latter generates a DUV wavelength band and consists of four reflection filters (8) at which the lighting beam path is reflected at the same angle of reflection alpha. In front of and behind the reflection filter system, the lighting beam path runs coaxially. The angle of reflection alpha is no greater than 30 degrees. The DUV wavelength band, lambda plus delta lambda, has a half value width of 20 nano-meters maximum and a peak with a crest value of over 90% of the radiated light intensity.
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公开(公告)号：DE10204367A1
公开(公告)日：2003-09-18
申请号：DE10204367
申请日：2002-02-02
Applicant: LEICA MICROSYSTEMS
Inventor： CEMIC FRANZ , DANNER LAMBERT , MAINBERGER ROBERT , VEITH MICHAEL , OSTERFELD MARTIN , GRAF UWE
Abstract: Autofocus module for a microscope system (2) comprises: at least two light sources (20, 21) each of which generates a light beam (22) for focussing; optical deflector or prism (27, 32) for deflection of a part of each beam into an beam that is used to illuminate an object; and at least first and second detectors (35, 45) for detecting light originating from respective light sources reflected from the object. Independent claims are included for: (1) a corresponding microscope system; (2) autofocus method. According to the method the optimal focal position is determined using the measured intensities on the first and second detectors.
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