Abstract:
A TFT(Thin Film Transistor) array substrate and its manufacturing method are provided to improve the stability of a substrate manufacturing process and to prevent the failure of contact between upper and lower electrodes due to undercut by preventing the generation of the undercut at a predetermined portion between a gate insulating layer and an inorganic protection layer using an improved contact hole structure composed of a contact hole lower portion and a contact hole upper portion with a large width compared to that of the contact hole lower portion. A gate line is formed on a lower substrate. An organic gate insulating layer(146) is formed on the resultant structure to cover the gate line. An inorganic protection layer(152) is formed on the organic gate insulating layer. A gate pad lower electrode(126) is formed on the resultant structure to be connected with the gate line. A first contact hole for exposing the gate pad lower electrode is formed through the inorganic protection layer and the organic gate insulating layer. A gate pad upper electrode(128) is connected to the gate pad lower electrode through the first contact hole. The first contact hole is composed of a lower portion and an upper portion. The width of the upper portion is larger than that of the lower portion in the first contact hole.
Abstract:
An LCD and a manufacturing method thereof are provided to form PR patterns with different heights by using an exposure device including a DMD(Digital Micro mirror Device) chip, thereby reducing the number of masks by not using a diffraction photo mask or a semitransparent mask and accordingly, manufacturing a TFT(Thin Film Transistor) substrate without using the exposure device with the DMD in all manufacturing processes. A method for manufacturing an LCD(Liquid Crystal Display) comprises the following steps of: providing an exposure device(100) where a light source and plural minute mirrors are arranged, wherein the plural minute mirrors are separately and electrically controlled to reflect light from the light source toward a position of a target selectively; forming at least one thin film(221,223) on a substrate(201) for the LCD; forming PR(PhotoResist) on the thin film; arranging the substrate on the position of the target; and driving the light source, controlling each of the minute mirrors of the exposure device, radiating light to the first position of the PR with first light intensity, and radiating light to the second position of the PR with second light intensity; developing the PR and remaining PR patterns(225a,225b) with different heights on the thin film; and patterning the thin film by using the PR patterns as a mask.
Abstract:
PROBLEM TO BE SOLVED: To provide an array substrate for a liquid crystal display device with improved productivity by reducing the number of mask processes. SOLUTION: The array substrate includes: a gate line 221 and a gate electrode 222 extending from the gate line 221 formed on a substrate; a data line 261 intersected with the gate line 221 and configured with a gate insulating layer 230, a semiconductor layer 240 and a data metal layer 260; a pixel electrode 281 formed of a first transparent metal layer 281a at a pixel which is defined by the gate line 221 and data line 261; a source electrode 262 extending from the data line 261, and a drain electrode 263 spaced apart from the source electrode 262 to expose a channel; a pattern of a second transparent metal layer 291 formed on the data line 261, the source electrode 262 and the drain electrode 263, and the gate line 221, connecting the drain electrode 263 to the pixel electrode 281m, and having a cut portion over the gate line 221; and a partition wall 293 formed near the second transparent metal layer 291 on the pixel electrode 281. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an etching tape and a method of manufacturing an array substrate for a liquid crystal display device using the same. SOLUTION: The etching tape includes a base sheet, and an etching material layer which a gel type etching material is applied and formed on the base sheet. The method of manufacturing the array substrate for the liquid crystal display device includes: a step of forming a gate electrode, a first electrode of storage capacitor and a gate interconnect line on a transparent insulating substrate; a step of forming a gate insulating film, an active layer, an ohmic wetting layer, a source electrode and a drain electrode, forming a dielectric layer and a second electrode of a storage capacitor, and forming data interconnect line; a step of forming a pixel electrode, forming a gate pad electrode and forming a data pad electrode; a step of forming a protective layer; and a step of forming a contact hole by etching a protective layer formed on the gate pad electrode and a protective layer formed on the data pad electrode by using the etching tape. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
A flat panel display includes a substrate, an array on the substrate, and a glass film formed by depositing glass powder over the substrate, including the array, melting the deposited glass powder over the array and hardening the deposited glass powder over the array.
Abstract:
Un substrat de réseau de transistors en couches minces et un procédé de fabrication du substrat de réseau de transistors en couches minces sont décrits.Le substrat de réseau de transistors en couches minces comprend des lignes de grille (101) et des lignes de données (102) se croisant pour définir des régions de pixel : une pluralité de transistors en couches minces chaque transistor en couches minces comportant une électrode de grille (101a), une électrode source (102a), et une électrode drain (102b) située adjacente à l'électrode source (102a) ; une pluralité d'électrodes de pixel (103) sur les régions de pixel, et une pluralité de motifs d'électrodes transparentes (103b) situés adjacents à une des lignes de données (102), dans lequel les électrodes source (102a) font saillie à partir de la ligne de données (102).Le réseau de transistors en couches minces peut être formé en utilisant un nombre de masques réduit.
Abstract:
A flat panel display includes a substrate (100), an array (150) on the substrate (100), and a glass film (200) formed by depositing glass powder over the substrate (100), including the array (150), melting the deposited glass powder over the array and hardening the deposited glass powder over the array. The glass film may also be form by coating glass paste over the substrate and array. The glass powder may consist of ZnO, SiO2, and BaO particles and a binder.
Abstract:
Thin film transistor (TFT) array substrate comprises gate lines (101) and data lines (102) crossing each other to define pixel regions on substrate; TFTs adjacent to each crossing point of one of gate lines and one of data lines, and each having gate electrode (101a) protruded from gate line, source electrode (102a) protruded from data line, and drain electrode (102b) adjacent the source electrode; pixel electrodes (103) on pixel regions, being adjacent the drain electrode; and transparent electrode patterns located adjacent one of data lines, where source electrodes protrude from data line. The TFTs further comprise a semiconductor layer and a gate insulating layer. The substrate further comprises a passivation layer, common lines on the pixel regions, common electrode, gate pad pattern (121), and gate pad terminal (123). An independent claim is included for a method for manufacturing a TFT array substrate.