公开(公告)号：DE60044167D1

公开(公告)日：2010-05-27

申请号：DE60044167

申请日：2000-06-13

Applicant: LUCENT TECHNOLOGIES INC

Inventor： SUNGHO JIN ,  KATSAP VICTOR ,  WASKIEWICZ WARREN K ,  ZHU WEI

IPC: G03F7/20 ,  H01J1/15 ,  H01J1/18 ,  H01J9/02 ,  H01J9/04 ,  H01J37/06 ,  H01L21/027

Abstract: A cathode (110) with an improved work function, for use in a lithographic system, such as the SCALPEL„¢ system, which includes a buffer (114) between a substrate (112) and an emissive layer (116), where the buffer alters, randomizes, miniaturizes, and/or isolates the grain structure at a surface of the substrate to reduce the grain size, randomize crystal orientation and reduce the rate of crystal growth. The buffer layer may be a solid solution or a multiphase alloy. A method of making the cathode by depositing a buffer between a surface of the substrate and an emissive layer, where the deposited buffer alters, randomizes, miniaturizes, and/or isolates the grain structure at a surface of the substrate to reduce the grain size, randomize crystal orientation and reduce the rate of crystal growth.