公开(公告)号：JPH10307401A

公开(公告)日：1998-11-17

申请号：JP5722198

申请日：1998-03-09

Applicant: LUCENT TECHNOLOGIES INC

Inventor： CHANDROSS EDWIN A ,  FRANCIS MICHAEL FUHRIHAN ,  OMKARAM NALAMASU ,  ERUZA REICHIMANIS ,  THOMAS INGOLF WALOW

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a new resist material which can be used for a lithographic process by the exposure of the radiation of specified wavelengths by using an energy-sensitive resist material containing a photoacid producing agent and a polymer. SOLUTION: This energy-sensitive resist material consists of a photoacid producing agent, polymer and dissolution inhibitor. The dissolution inhibitor is a condensation product of a satd. polycyclic hydrocarbon compd. having one hydroxy substituent and a bifunctional hydrocarbon compd. selected from linear hydrocarbons and cyclic hydrocarbons. The functional groups are carboxylic acid groups or carboxylic acid halide compds. The condensation product has substituents comprising two polyfunctional parts and one carboxyl group, and hydrogen atoms in the carboxyl group are substituted by acid- unstable groups. The energy-sensitive resist material layer formed on a substrate is exposed to pattern-forming radiation selected from UV rays and the like to form the pattern.