公开(公告)号：JPH11133612A

公开(公告)日：1999-05-21

申请号：JP23788298

申请日：1998-08-25

Applicant: LUCENT TECHNOLOGIES INC

Inventor： MARIE ELLEN GALVIN-DONOGUYUU ,  HOULIHAN FRANCIS MICHAEL ,  JANET MIHOKO KOMETANI ,  OMKARAM NALAMASU ,  THOMAS XAVIER NEENAN

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic process and an energy susceptible material to be used in this process. SOLUTION: This energy susceptible resist material contains a polymer or a polymer mixture in combination with an energy susceptible material such as a photo-acid producing material. At least three substituents are dispersed in the polymer blend. The first substituent is a hydroxyl group (OH). The second substituent is an acid susceptible or acid complex group which is released in the presence of an acid and replaced by an OH group. The third substituent produces a hydrogen bond with the first substituent. After an energy susceptible resist material layer is formed on a substrate, the layer is exposed to radiation according to a pattern. Thus, the pattern image is introduced into the energy susceptible material. Then the image is developed and transferred to the substrate under the layer.

公开(公告)号：JPH1010739A

公开(公告)日：1998-01-16

申请号：JP4995697

申请日：1997-03-05

Applicant: LUCENT TECHNOLOGIES INC

Inventor： HOULIHAN FRANCIS MICHAEL ,  OMKARAM NALAMASU ,  ELSA REICHMANIS ,  WALLOW THOMAS INGOLF

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To make a resist material contg. a deriv. of a (meth)acrylate copolymer fit for a lithographic process using light of 193nm by using an energy sensitive resist material contg. a polymer having satd. alicyclic parts. SOLUTION: An energy sensitive resist material contg. a polymer having satd. alicyclic parts incorporated into the backbone of the polymer or attached to the backbone through satd. hydrocarbon combining groups is utilized. About 25-50mol% of the polymer is made from a monomer contg. such an alicyclic part. The polymer is a copolymer of the monomer with at least one other monomer. The alicyclic part of the monomer is one or more hydrocarbon rings each having one or more ethylenic unsatd. bonds. The 2nd monomer is copolymerizable with the alicyclic monomer by free radical polymn.

公开(公告)号：JPH11160861A

公开(公告)日：1999-06-18

申请号：JP28039498

申请日：1998-10-02

Applicant: LUCENT TECHNOLOGIES INC

Inventor： HOULIHAN FRANCIS MICHAEL ,  OMKARAM NALAMASU ,  WALLOW THOMAS INGOLF

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To reduce a form erosion extent from imaging to developing by incorporating a polymer having substituent pendants instable to acid and a compound having a specified substituted amino group in the resist material. SOLUTION: The energy sensitive resist layer formed on a substrate contains the polymer and the substituted amino compound represented by the formula in which Y is an N-containing group; X is a chromophore or a positively charged onium cation. The substituted amino compound is a photoacid generator(PAG) and generates a photoacid having a pKa of 0-6, preferably, 0-4, by irradiation with light specified in wavelength.

公开(公告)号：JPH10307401A

公开(公告)日：1998-11-17

申请号：JP5722198

申请日：1998-03-09

Applicant: LUCENT TECHNOLOGIES INC

Inventor： CHANDROSS EDWIN A ,  FRANCIS MICHAEL FUHRIHAN ,  OMKARAM NALAMASU ,  ERUZA REICHIMANIS ,  THOMAS INGOLF WALOW

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a new resist material which can be used for a lithographic process by the exposure of the radiation of specified wavelengths by using an energy-sensitive resist material containing a photoacid producing agent and a polymer. SOLUTION: This energy-sensitive resist material consists of a photoacid producing agent, polymer and dissolution inhibitor. The dissolution inhibitor is a condensation product of a satd. polycyclic hydrocarbon compd. having one hydroxy substituent and a bifunctional hydrocarbon compd. selected from linear hydrocarbons and cyclic hydrocarbons. The functional groups are carboxylic acid groups or carboxylic acid halide compds. The condensation product has substituents comprising two polyfunctional parts and one carboxyl group, and hydrogen atoms in the carboxyl group are substituted by acid- unstable groups. The energy-sensitive resist material layer formed on a substrate is exposed to pattern-forming radiation selected from UV rays and the like to form the pattern.