公开(公告)号：JPH11133612A

公开(公告)日：1999-05-21

申请号：JP23788298

申请日：1998-08-25

Applicant: LUCENT TECHNOLOGIES INC

Inventor： MARIE ELLEN GALVIN-DONOGUYUU ,  HOULIHAN FRANCIS MICHAEL ,  JANET MIHOKO KOMETANI ,  OMKARAM NALAMASU ,  THOMAS XAVIER NEENAN

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic process and an energy susceptible material to be used in this process. SOLUTION: This energy susceptible resist material contains a polymer or a polymer mixture in combination with an energy susceptible material such as a photo-acid producing material. At least three substituents are dispersed in the polymer blend. The first substituent is a hydroxyl group (OH). The second substituent is an acid susceptible or acid complex group which is released in the presence of an acid and replaced by an OH group. The third substituent produces a hydrogen bond with the first substituent. After an energy susceptible resist material layer is formed on a substrate, the layer is exposed to radiation according to a pattern. Thus, the pattern image is introduced into the energy susceptible material. Then the image is developed and transferred to the substrate under the layer.