2.
    发明专利
    未知

    公开(公告)号:DE69701944D1

    公开(公告)日:2000-06-15

    申请号:DE69701944

    申请日:1997-06-19

    Applicant: MACDERMID INC

    Abstract: A conductive metal layer is electroplated onto a substrate comprising both non-conductive and metallic surfaces by: (a) contacting the substrate with a solution of a compound which forms a sacrificial layer on the metallic surfaces only, the sacrificial layer being insoluble in alkaline and neutral media but soluble in acid media; (b) contacting the substrate with a liquid carbon dispersion to deposit a layer of carbon; (c) contacting the substrate with an acidic solution to dissolve the sacrificial layer; and (d) electroplating a conductive metal layer over at least the non-conductive surfaces.

    3.
    发明专利
    未知

    公开(公告)号:ES2057445T5

    公开(公告)日:1998-02-16

    申请号:ES90313187

    申请日:1990-12-05

    Applicant: MACDERMID INC

    Abstract: An electroless metal plating process, particularly for use in plating through-holes in printed circuit substrates, (14) and more particularly for additively depositing copper metal on through-hole surfaces, in which the substrate is at least intermittently subjected to vibrating motion in contact with the electroless depositing bath, (12) and an electroless metal depositing apparatus for carrying out the process.

    SYSTEM AND PROCESS FOR ETCHING WITH AND REGENERATING, ALKALINE AMMONIACAL ETCHANT SOLUTION

    公开(公告)号:CA2029444A1

    公开(公告)日:1991-09-22

    申请号:CA2029444

    申请日:1990-11-07

    Applicant: MACDERMID INC

    Abstract: A process and related system is disclosed for etching copper with, and regenerating, a working alkaline ammoniacal etchant solution, the regeneration involving withdrawal of a portion of the working solution as spent etchant solution and electrolytic removal therefrom of at least a portion of the etched copper therein so as to produce a fresh etchant solution which is returned to the working solution; accumulation vessels upstream and downstream of the electrolytic process; and supply to the working solution and/or the fresh etchant solution of sufficient oxygen and ammonia to maintain the desired cupric ion content and pH in the working solution.

    METHOD FOR APPLYING LIQUID PHOTORESIST TO PLANAR SUBSTRATE SURFACES

    公开(公告)号:CA2026794A1

    公开(公告)日:1991-08-14

    申请号:CA2026794

    申请日:1990-10-03

    Applicant: MACDERMID INC

    Abstract: Planar substrate surfaces used in the fabrication of printed circuit boards are provided with a substantially uniform and defect-free coating of liquid photoresist by roller coating in a process in which a first coating roller is used to provide a first layer of liquid photoresist on the substrate surface in less than the ultimately desired thickness, and the thus-treated substrate, without any change in planar orientation, is then provided with additional photoresist, to the ultimately desired thickness, using a distinct (i.e., separate) second coating roller.

    10.
    发明专利
    未知

    公开(公告)号:ES2147967T3

    公开(公告)日:2000-10-01

    申请号:ES97304322

    申请日:1997-06-19

    Applicant: MACDERMID INC

    Abstract: A conductive metal layer is electroplated onto a substrate comprising both non-conductive and metallic surfaces by: (a) contacting the substrate with a solution of a compound which forms a sacrificial layer on the metallic surfaces only, the sacrificial layer being insoluble in alkaline and neutral media but soluble in acid media; (b) contacting the substrate with a liquid carbon dispersion to deposit a layer of carbon; (c) contacting the substrate with an acidic solution to dissolve the sacrificial layer; and (d) electroplating a conductive metal layer over at least the non-conductive surfaces.

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