Abstract:
A method of manufacturing a target plate for a color television camera tube comprising a face plate including a fiber plate and a photoconductive target electrode having nonconductive portions of a stripe shape and provided on the inner surface of the face plate, comprising the steps of successively forming a transparent conductive film and a photoresist film on the inner surface of the face plate, setting an optical mask on the outer surface of the face plate, irradiating ultraviolet rays on the photoresist film through the photomask and the face plate to selectively expose the photoresist film to the ultraviolet rays and developing the photoresist film to obtain an apertured photoresist film to form the nonconductive portions.
Abstract:
In a color image pick-up tube using a silicon target plate as a photo-electric transducer, the main portion of the face plate is slightly elevated except at its peripheral annular portion to form a flat-topped convexity on which a color filter is formed and the peripheral protrusion of the silicon target plate is fastened to the peripheral annular portion of the face plate, so that the target area of the target plate is arranged in opposition to the color filter with a small gap left therebetween.
Abstract:
PURPOSE:To simplify the manufacturing process and to prevent the occurrence of defective elements due to mistake of the front and back identification, by forming the transparent conductive film inside the glass thin plate bonded on the inner surface of the color filter through the evaporation of the sintering body of In2O3 and SnO2 with low temperature sputtering method. CONSTITUTION:The transparent conductive film 4 of metallic oxide of In2O3 and SnO2 is formed with evaporation by low temperature sputtering method inside the glass thin plate 3 coating via the color separation color filter 2 on the inner surface of the face plate 1. Further, on he inside surface of the transparent conductive film 4, the photo conductive film 5 is placed, and the sealing indium ring 6, glass bulb 7 and the metal ring 8 are fixed. The specific gravity ratio of SnO2 in the metal oxide at this process is taken as 2 to 10%. Further, magnetron sputter method is used as low temperature sputter method.
Abstract:
PURPOSE:To improve the pickup characteristics, by mutually bonding a solid- state image pickup substrate and a color filter substrate at a region avoiding a photodetecting region and opposing them at the photodetection section via a minute space, in a solid-state image pickup substrate of MOS system. CONSTITUTION:A color filter substrate 10 is bonded with a solid-state image pickup substrate 1 with a rapid drying adhesives 17 coated on all or a part of the circumference. Further, a color filter substrate 10 is opposed to the photodetection section via a minute space 18. Through the constitution like this, since no mixture of air bubbles existing in the adhesives is mixed between the substrates 10 and 1, excellent pickup characteristics can be obtained.