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公开(公告)号：JP2000260765A
公开(公告)日：2000-09-22
申请号：JP5819899
申请日：1999-03-05
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： KINOSHITA TAKASHI , YAMAZAKI HIROKANE
IPC: H01L21/312 , G03F7/095
Abstract: PROBLEM TO BE SOLVED: To readily form the pattern of a thick organic insulating film on a semiconductor substrate, without prolonging the exposure time of photosensitive resin or breaking a pattern. SOLUTION: In this pattern forming method, after a first photosensitive resin 7 is applied on a semiconductor substrate 1 and is exposed via a photomask 3, a second photosensitive resin 8 is applied on the first photosensitive resin 7 and exposed via the same photomask 3 to form a photosensitive resin of two-layer structure. Then, after unwanted places (photosensitive parts 9, 10) of the first and second photosensitive resins 7, 8 are etched together by an etchant, they are subjected to thermosetting. Thereby, an organic insulating film, which is about twice as thick as a conventional, one can be readily subjected to patterning without prolonging the exposure time of one operation.
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公开(公告)号：JP2000067748A
公开(公告)日：2000-03-03
申请号：JP24014998
申请日：1998-08-26
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： KIMURA MASAMICHI , UCHIUMI TSUTOMU , KINOSHITA TAKASHI
Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method for a color cathode-ray tube that can perform a smooth and certain welding at a constant position, reduce cost, and reuse resource without using a complex control, by welding it along an edge of a mask frame. SOLUTION: A smooth and certain welding at a constant position in a simple structure can be performed without using a complex control, by performing a welding while rolling a roller electrode 12 in a state that an electrode surface of the roller electrode 12 of a roller-type resistant welder 6 abuts on edge 11 outside a mask frame 2a via a shadow mask 1, In addition, by forming 1 welding nuggets on the edge 11 side, even when failure of the shadow mask occurs and the shadow mask 1 is broken away, a plane portion remains, re-welding to the plane portion securing its original height is allowed, and reuse of the mask frame is allowed without decreasing accuracy of a welding position.
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公开(公告)号：JPH05198687A
公开(公告)日：1993-08-06
申请号：JP735892
申请日：1992-01-20
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： KINOSHITA TAKASHI
IPC: H01L21/302 , H01L21/3065 , H01L21/312 , H01L21/768
Abstract: PURPOSE:To enable formation of a fine and arbitrary tapered through-hole and to provide a formation method of a multilayer wiring which can simplify a process by forming a through-hole in a layer insulating film consisting of polyimide resin by using a resist pattern. CONSTITUTION:A resist pattern with an inverted taper is formed of a resist 4 in a through-hole part on a first wiring 2 and is covered with polyimide resin 3. Then, a second wiring 5 is formed after the resist is removed by etching until an uppermost part of the resist pattern is exposed or after etching is performed until the entire resist is removed by using an etching rate of the polyimide resin 3 and the photoresist 4.
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公开(公告)号：JPH05121561A
公开(公告)日：1993-05-18
申请号：JP28106191
申请日：1991-10-28
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： KINOSHITA TAKASHI
IPC: H01L21/306 , H01L21/3205 , H01L21/768
Abstract: PURPOSE:To easily detect an end point when an insulating film on a metal wiring is wet etched. CONSTITUTION:A metal wiring 2 is formed on a semiconductor substrate 1, and a metal film 6 is so formed on a scribing lane 5 as to become an area wider than that of the film 2. Parts of an insulating film 3 on parts of the wiring 2 and a metal film 11 become equal. Just etching time of the film 3 on the substrate 1 is made uniform, and a just etching point of a through hole 4 on the wiring 2 which has been heretofore difficult to detect due to its narrow area can be detected on the lane 5 having a wide area.
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公开(公告)号：JPS5897244A
公开(公告)日：1983-06-09
申请号：JP19585881
申请日：1981-12-04
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： ASHIZAKI SHIGEYA , HIRABAYASHI KAZUAKI , KINOSHITA TAKASHI
Abstract: PURPOSE:To achieve the high resolution and the energy saving, by employing 7-8% of light reflection factor viewed from the outer face of the bulb front face wall thereby achieving the easy-to-see data display with reduced operation beam current. CONSTITUTION:The drawing shows an enlarged partial cross-section of the bulb front face wall of a color picture tube, and when an external light is projected to a front face wall 1 a portion of it will be reflected at the outer face to produce a reflected light 6. The remaining portion will pass through said wall 1 then partially reflected at the inner face to produce a reflected light 7. The reflected light 6 at the outer face of said wall 1 is approximately 4% of the external light 5 and constant, but the reflected light 7 at the inner face is determined by the light permeability of said wall 1 and the condition of a phosphor face 2, and it will decrease as the ratio of a light absorption matrix layer 3 against the phosphor face 2 will increase. The optimal beam current is minimized at 7-8% of the reflection factor.
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Patent Agency Ranking
公开(公告)号：JP2000150502A
公开(公告)日：2000-05-30
申请号：JP32468898
申请日：1998-11-16
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： KINOSHITA TAKASHI
Abstract: PROBLEM TO BE SOLVED: To provide a method for forming a thick organic insulating film without causing collapse of pattern. SOLUTION: A first photosensitive resin layer 10 formed on a semiconductor substrate 1 is exposed and then a second photosensitive rein layer 13 is formed on the first photosensitive resin layer 10 and exposed. Non-photosensitive parts 12, 15 of the first and second laminated photosensitive resin layer 10, 13 are then etched together with developer liquid and the remaining photosensitive resin is thermally set to form an organic insulating film 17. According to the method, exposure time per step is shortened and a thick organic insulating film can be formed without causing collapse of pattern.
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公开(公告)号：JPH04330961A
公开(公告)日：1992-11-18
申请号：JP10008691
申请日：1991-05-01
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： KINOSHITA TAKASHI
IPC: B05C11/08 , B05C11/10 , G03F7/30 , H01L21/027 , H01L21/30
Abstract: PURPOSE:To obtain a development processing equipment capable of discharging a liquid chemical with specified temp. and of efficiency using developer even when stopping and resumption for discharge of the liquid chemical are repeated in the case of causing difference between the temp. of the liquid chemical and the temp. of the atmosphere. CONSTITUTION:A development processing equipment is provided with a liquid chemical supplying line 7 for supplying the liquid chemical held in a liquid chemical tank 1 to a nozzle 4, a temp. controlling means 11 for controlling the temp. of the liquid chemical passed through the line 7 and a recovery line 9 which is connected to the downstream end part of the line 7 and recovers the liquid chemical of the same to a recovery tank 5 at the time of stopping the liquid chemical discharge by the nozzle 4. The liquid chemical in the recovery tank 5 is returned to the tank 1 via a calculation line 12 and thereby reused.
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公开(公告)号：JPH0125184B2
公开(公告)日：1989-05-16
申请号：JP15847482
申请日：1982-09-10
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： ASHIZAKI SHIGEYA , ENDO MORIO , KINOSHITA TAKASHI , NAKAMOTO MASAYUKI
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公开(公告)号：JPS5949143A
公开(公告)日：1984-03-21
申请号：JP15847482
申请日：1982-09-10
Applicant: Matsushita Electronics Corp
Inventor： ASHIZAKI SHIGEYA , ENDOU MORIO , KINOSHITA TAKASHI , NAKAMOTO MASAYUKI
CPC classification number: H01J29/707
Abstract: PURPOSE:To remove distortion in the sectional shape of an electron beam in a color cathode-ray tube having three electron gun in the delta arrangement, consequently the distortion of the beam spot, by preparing columnar auxiliary magnets rotatably around their central axis. CONSTITUTION:Columnar auxiliary magnets 19, 19'; 20, 20' and 21, 21' having central axes each orthogonally crossing length-wise to the legs and the central parts of the U-shaped cores 8-10 are prepared on the outside surfaces of the corner parts of the respective U-shaped cores 8-10, while said auxiliary magnets 19, 19'; 20, 20' and 21, 21' diametrally magnetized are so arranged as to be rotatable around the respective central axes. In said constitution, when the auxiliary magnets 19 and 19' are rotary-regulated, the magnetic field produced between a pair of magnet pole pieces 2a and 2b can be distorted into the right and left asymmetrical distribution thus enabling to correct the sectional shape of an electron beam passing there.
Abstract translation: 目的：为了在三角形排列中消除具有三个电子枪的彩色阴极射线管中的电子束截面形状的畸变，从而通过围绕其中心轴可旋转地制备柱状辅助磁体，从而导致束斑的变形。 构成：柱状辅助磁体19,19'; 20,20'和21,21'在各自的U形的角部分的外表面上制备具有垂直于腿部的中心轴线和U形芯子8-10的中心部分的中心轴线 芯8-10，而所述辅助磁体19,19'; 20,20'和21,21'被直径磁化地布置为能够围绕各个中心轴线旋转。 在所述结构中，当辅助磁体19和19'被旋转调节时，在一对磁极片2a和2b之间产生的磁场可以变形成左右不对称分布，从而能够校正辅助磁体19和19'的截面形状 电子束通过那里。
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公开(公告)号：JPS5846556A
公开(公告)日：1983-03-18
申请号：JP14452081
申请日：1981-09-11
Applicant: MATSUSHITA ELECTRONICS CORP
Inventor： ASHIZAKI SHIGEYA , HIRABAYASHI KAZUAKI , KINOSHITA TAKASHI
IPC: H01J29/50
Abstract: PURPOSE:To obtain a structural body of multiple electron guns, in which the electron guns are mechanically coupled mutually in a good condition, by constructing a connector with a ring-shaped metallic plate and interposing the connector mutually between the electron guns and cup-shaped body of convergence electrode. CONSTITUTION:End edges of the fourth grid electrodes G4, the point end electrodes of three electron guns, are welded to a flat part of a connector 8, and the end edge is not only previously reinforced by the connector 8, but the connector 8 is welded to a bottom part 6a under a condition inserted with peripheral edge tongue-shaped parts 9 of the connector 8 to slots 10 of the bottom part 6a of a cup-shaped body 6, even if a peripheral edge in a bottom part of the cup-shaped body 6 is in a curved surface, the cup-shaped body 6, that is, a convergence electrode 4 can be correctly secured without causing the generation of misalignment or deformation for the end parts of the three electron guns 1, 2, 3. Further an external shape of the connector 8 is formed to an almost triangle, and a security place of the connector 8 to the cup-shaped body 6 can be set to a flat position located toward the central part from the peripheral edge of the bottom part 6a, further with a merit a relatively large welding margin can be obtained.
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