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    FLUORESCENT HIGH-PRESSURE MERCURY-VAPOR LAMP
    5.
    发明专利
    FLUORESCENT HIGH-PRESSURE MERCURY-VAPOR LAMP 未知

    公开(公告)号：CA1049085A

    公开(公告)日：1979-02-20

    申请号：CA246052

    申请日：1976-02-18

    Applicant: MATSUSHITA ELECTRONICS CORP

    Inventor： KOBAYASHI YOSHICHIKA ,  AKUTSU HIDEZOH ,  IWAMA KATSUAKI ,  YAMAGUCHI MASAYUKI

    IPC: C09K11/77 ,  H01J61/44 ,  H01J1/63

    Abstract: The present invention discloses the phosphor coating for fluorescent high-pressure mercury-vapor lamps, consisting of a red light emitting phosphor with the following composition YVO4:Eu, or Y(PV)O4:Eu and a blue-green light emitting phosphor with the following composition Ba1-xMg2-yA?zO3 + ? z : Eux, Mny where 0.03?x?0.4, 0.01?y?0.6, and 12?z?20. A highly satisfactory color rendition may be attained, and the color temperature may be arbitrarily changed so that the mercuryvapor lamps in accordance with the present invention are best adapted for use in interior lighting in offices, lobbies, shops and so on.

    METHOD OF FORMING RECESSED OXIDE ISOLATION
    7.
    发明专利
    METHOD OF FORMING RECESSED OXIDE ISOLATION 未知

    公开(公告)号：CA1065497A

    公开(公告)日：1979-10-30

    申请号：CA237865

    申请日：1975-10-17

    Applicant: MATSUSHITA ELECTRONICS CORP

    Inventor： OHKUBO YOSHIO ,  KOBAYASHI YOSHICHIKA

    IPC: H01L21/033 ,  H01L21/311 ,  H01L21/312 ,  H01L27/146 ,  H01L29/808 ,  H01L21/22

    Abstract: Disclosed is a method of manufacturing semiconductor devices, which method comprises the processes of: forming at least one recess and at least one projecting portion on a surface of a semiconductor substrate; applying coating material on the recess and on the projecting portion in such manner that the layer of the coating material in the recess is thicker than that on the projecting portion; providing a bared portion at the top of the projecting portion by removing an applied coated material on the silicon dioxide layer of the semiconductor substrate at a uniform removing rate; and diffusing impurities to form different conductivity regions through the bared top portion. The advantages achieved by the use of this newly developed method are (1) the elimination of a process for the self alignment of a mask, (2) the production of highly reliable semiconductor devices, and (3) increased productivity of semiconductor devices.

    PRODUCING PHOSPHOR SCREEN
    8.
    发明专利
    PRODUCING PHOSPHOR SCREEN 未知

    公开(公告)号：AU3698271A

    公开(公告)日：1973-06-21

    申请号：AU3698271

    申请日：1971-12-16

    Applicant: MATSUSHITA ELECTRONICS CORP

    Inventor： KOBAYASHI YOSHICHIKA ,  YAKENO KOUZI

    IPC: H01J9/227 ,  H01J29/22 ,  H01J29/30 ,  C09K1/00

    Abstract: A phosphor screen for color picture tube is usually produced by the first step which comprises suspending a blue emission phosphor in an aqueous solution of photo-setting photosensitive material comprising polyvinyl alcohol and ammonium dichromate, applying thus obtained suspension to inner surface of face panel to form a photosensitive film, exposing said film through apertures of shadow mask and developing the exposed film to form dotty phosphor film and the second and the third steps of forming the dotty phosphor films of green and red emissions in this order by substantially the same procedure as that of the first step. According to the present invention, the dotty phosphor films formed at said first and second steps are treated with chromic acid solution to harden said films, whereby color mixing, namely, so-called color fogging caused by a phosphor of other color emission used at the subsequent step is reduced and color purity of emission from phosphor screen face is improved.

    9.
    发明专利
    未知

    公开(公告)号：DE1592923A1

    公开(公告)日：1970-06-04

    申请号：DE1592923

    申请日：1967-10-27

    Applicant: MATSUSHITA ELECTRONICS CORP

    Inventor： KOBAYASHI YOSHICHIKA ,  YAKENO KOJI ,  TAKAGAWA MSANORI

    IPC: C09K11/77 ,  G03F7/04 ,  H01J9/227 ,  H01J29/22

    Abstract: 1,197,772. Luminescent materials. MATSUSHITA ELECTRONICS CORP. 23 Oct., 1967 [1 Nov., 1966; 11 April, 1967], No. 48010/67. Heading C4S. [Also in Division G2] A photo-sensitive slurry comprises polyvinyl alcohol, 1 to 30% by wt. of ammonium dicliromate phosphor particles and a quantity of Ge dioxide, tetra-chloride, disulphide or an orthogermanate ester, which gives 0À001 to 1À25 gm. of GeO 2 per 100 c.c. of P.V.A. solution. The Ge compound maintains photosensitivity by preventing an increase of the pH value and also prevents a reduction in phosphor emission due to adsorption of chromium on to the phosphor. Components of the slurry are blended together or the dichromate may be added during blending. The GeO 2 may be added as metagermanic acid, ethoxy germanium or ethanol containing GeCl 4 . Phosphors referred to are Eu actuated Y, Gd and Y-Gd oxides, Y and Gd oxysulphides and YVO 4 also ZnS and ZnCdS. A dot pattern on a colour T.V. tube is formed by applying the slurry and exposing to U.V. light through a shadow mask.

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