公开(公告)号：US20150262874A1

公开(公告)日：2015-09-17

申请号：US14440814

申请日：2013-11-05

Applicant: MICRONIT MICROFLUIDICS B.V.

Inventor： Ronny Van'T Oever ,  Marko Theodoor Blom ,  Jeroen Haneveld ,  Johannes Oonk ,  Peter Tijssen

IPC: H01L21/768 ,  H01L23/498 ,  H01L21/48

CPC classification number: H01L21/76879 ,  B81C1/00095 ,  H01L21/486 ,  H01L21/6835 ,  H01L23/147 ,  H01L23/49827 ,  H01L2221/68345 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The invention relates to a method for forming an electrically conductive via in a substrate and such a substrate comprising an electrically conductive, said method comprising the steps, to be performed in suitable sequence, of: a) providing a first substrate as said substrate; b) forming a through hole in said first substrate; c) providing a second substrate; d) bringing a first surface of said second substrate into contact with said first surface of said first substrate, such that said through hole in said first substrate is covered by said first surface of said second substrate; e) filling said through hole in said first substrate with an electrically conductive material by means of electroplating for forming said electrically conductive via, and f) removing said second substrate, wherein said first surface of said first substrate and said first surface of said second substrate each have a surface roughness R a of less than 2 nm, preferably less than 1 nm, more preferably less than 0.5 nm, and in that in step (d) said first surface of said first substrate and said first surface of said second substrate are brought in direct contact with each other, such that a direct bond is formed there between.

Abstract translation: 本发明涉及一种用于在衬底中形成导电通孔的方法，并且这种衬底包括导电的所述方法，所述方法包括以适当顺序执行的以下步骤：a）提供作为所述衬底的第一衬底; b）在所述第一衬底中形成通孔; c）提供第二衬底; d）使所述第二基板的第一表面与所述第一基板的所述第一表面接触，使得所述第一基板中的所述通孔被所述第二基板的所述第一表面覆盖; e）通过用于形成所述导电通孔的电镀用导电材料填充所述第一衬底中的所述通孔，以及f）去除所述第二衬底，其中所述第一衬底的所述第一表面和所述第二衬底的所述第一表面 每个表面粗糙度R a小于2nm，优选小于1nm，更优选小于0.5nm，并且在步骤（d）中，所述第一衬底的所述第一表面和所述第二衬底的所述第一表面是 导致彼此直接接触，从而在其间形成直接粘结。