公开(公告)号：JP2003262832A

公开(公告)日：2003-09-19

申请号：JP2002349923

申请日：2002-12-02

Applicant: MICROSCAN SYSTEMS INC

Inventor： SCHARF BRUCE R ,  DAIBER TROY D

IPC: G02B5/08 ,  B81B1/00 ,  G02B5/18 ,  G02B6/35 ,  G02B26/08 ,  G02B26/10 ,  G02B27/42

Abstract: PROBLEM TO BE SOLVED: To provide a device that overcomes the disadvantage of refractive and diffractive elements. SOLUTION: This micro-opto-electromechanical apparatus comprises: a silicon wafer comprising a plurality of layers; the reflector formed in one of the plurality of layers; and a pattern on the reflector to focus or collimate an incident beam of radiation into a reflected beam. COPYRIGHT: (C)2003,JPO