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公开(公告)号：JPS60125228A
公开(公告)日：1985-07-04
申请号：JP23058583
申请日：1983-12-08
Applicant: MITSUI TOATSU CHEMICALS
Inventor： SAITOU JIYUN , MITSUISHI TAKATOSHI , WAKI HIROSHI , MIYAGAWA HIROJI , AMITA HIROSHIGE
Abstract: PURPOSE:To almost perfectly remove silane gas, by bringing exhaust gas of silane gas used in preparation of a semiconductor into contact with an alkaline substance-containing alcohol solution. CONSTITUTION:Alkaline substances such as NaOH, NH3, amines and weak inorg. acid salts or weak org. acid salts thereof are contained in an alcohol solution such as methanol or ethanol to prepare a treating solution. Exhaust gas containing silane gas used in the preparation of a semiconductor, especially, monosilane, disilane or trisilane is brought into gas-liquid contact with the treating solution. By this method, the silane gas in exhaust gas is removed to an extent of 0.5ppm, furhter, 0.1ppm or less.
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公开(公告)号：JPH0417689B2
公开(公告)日：1992-03-26
申请号：JP23058583
申请日：1983-12-08
Applicant: MITSUI TOATSU CHEMICALS
Inventor： SAITO JUN , MITSUISHI TAKATOSHI , WAKI HIROSHI , MYAGAWA HIROJI , AMITA HIROSHIGE
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公开(公告)号：JPH0417690B2
公开(公告)日：1992-03-26
申请号：JP23058683
申请日：1983-12-08
Applicant: MITSUI TOATSU CHEMICALS
Inventor： SAITO JUN , MITSUISHI TAKATOSHI , WAKI HIROSHI , MYAGAWA HIROJI , AMITA HIROSHIGE
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公开(公告)号：JPS60125233A
公开(公告)日：1985-07-04
申请号：JP23058783
申请日：1983-12-08
Applicant: MITSUI TOATSU CHEMICALS
Inventor： SAITOU JIYUN , MITSUISHI TAKATOSHI , WAKI HIROSHI , MIYAGAWA HIROJI , AMITA HIROSHIGE
Abstract: PURPOSE:To almost perfectly remove silane gas in exhaust gas, by allowing the silane gas in the exhaust gas of a semiconductor preparing apparatus to pass a packed bed based on solid metal oxide to treat the same. CONSTITUTION:A quartz tube 1 is packed with solid metal oxide particles to form a packed bed 2. The part of the packed bed 2 is heated within a range of a room temp. -800 deg.C by an electric furnace 3. Silane gas is diluted with nitrogen gas while the diluted silane gas with predetermined concn. is stored in a gas reservoir 4 and subsequently passed through the packed bed 2 through a flow meter 5, a needle valve 6 and pump 7. The treated gas 8 from the outlet of the packing layer 2 is collected and the concn. of silane gas therein is analyzed. The concn. thereof is reduced at least to 0.5ppm or less, pref., 0.1ppm or less. In order to regenerate or exchange the packing material, a plurality parallel sytem is pref. employed.
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公开(公告)号：JPH0480850B2
公开(公告)日：1992-12-21
申请号：JP20974784
申请日：1984-10-08
Applicant: MITSUI TOATSU CHEMICALS
Inventor： ITO MASAYOSHI , MYAGAWA HIROJI , ABE TOSHIHIRO , INOE KAORU , AMITA HIROSHIGE , YANAGAWA NORYUKI
IPC: C01B33/04
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Patent Agency Ranking
公开(公告)号：JPH0724738B2
公开(公告)日：1995-03-22
申请号：JP1864693
申请日：1993-02-05
Applicant: MITSUI TOATSU CHEMICALS
Inventor： SAITO JUN , MITSUISHI TAKATOSHI , WAKI HIROSHI , MYAGAWA HIROJI , AMITA HIROSHIGE
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公开(公告)号：JPH0480849B2
公开(公告)日：1992-12-21
申请号：JP17566384
申请日：1984-08-23
Applicant: MITSUI TOATSU CHEMICALS
Inventor： ITO MASAYOSHI , MYAGAWA HIROJI , ABE TOSHIHIRO , AMITA HIROSHIGE , KOIZUMI KYOGO , MURAKAMI MASAMI
IPC: C01B33/04
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公开(公告)号：JPH0480847B2
公开(公告)日：1992-12-21
申请号：JP14133184
申请日：1984-07-10
Applicant: MITSUI TOATSU CHEMICALS
Inventor： ITO MASAYOSHI , MYAGAWA HIROJI , ABE TOSHIHIRO , INOE KAORU , AMITA HIROSHIGE , KOIZUMI KYOGO
IPC: C01B33/04
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公开(公告)号：JPH0419886B2
公开(公告)日：1992-03-31
申请号：JP23058783
申请日：1983-12-08
Applicant: MITSUI TOATSU CHEMICALS
Inventor： SAITO JUN , MITSUISHI TAKATOSHI , WAKI HIROSHI , MYAGAWA HIROJI , AMITA HIROSHIGE
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公开(公告)号：JPS60166214A
公开(公告)日：1985-08-29
申请号：JP2189084
申请日：1984-02-10
Applicant: MITSUI TOATSU CHEMICALS
Inventor： ITOU MASAYOSHI , MIYAGAWA HIROJI , ABE TOSHIHIRO , AMITA HIROSHIGE , TSUKAHARA TOSHIYUKI
IPC: C01B33/04
Abstract: PURPOSE:To improve remarkably the conversion into silico hydride in reacting an alloy containing Mg and S with an acid to produce the silicon hydride expressed by a specific formula, by coating particles of the alloy previously with a metal oxide. CONSTITUTION:Mg2Si, etc. is used as an alloy containing Mg and Si, and the atomic ratio Mg/Si thereof is about 1/3-3/1. The particle diameter is about =1).
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