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    WATER-SOLUBLE AZO DYE AND POLARIZING FILM USING THE SAME DYE
    3.
    发明专利
    WATER-SOLUBLE AZO DYE AND POLARIZING FILM USING THE SAME DYE 失效

    公开(公告)号：JPH06128498A

    公开(公告)日：1994-05-10

    申请号：JP28164092

    申请日：1992-10-20

    Applicant: MITSUI TOATSU CHEMICALS

    Inventor： IMAI RIHOKO ,  MISAWA TSUTAYOSHI ,  OGISO AKIRA ,  ITO NAOTO

    IPC: C09B29/16 ,  C09B29/28 ,  C09B31/00 ,  C09B31/057 ,  C09B31/072 ,  C09B31/18 ,  C09B31/20 ,  C09B31/30 ,  C09B56/04 ,  G02B5/30

    Abstract: PURPOSE:To obtain a water-soluble azo dye, having plural naphthalene and benzene rings containing sulfonic acid groups, containing a new compound suitable for high-performance polarizing films having polarizing and heat- resistant performances using a polymeric film as a substrate. CONSTITUTION:Amines expressed by the formula D-NH2 (D is diazonium residue) are diazotized and then coupled with anilines expressed by formula I (R1 is H, OH, alkyl, etc.; R2 is H, halogen, OH, alkyl, etc.) to provide a monoazo compound, which is subsequently diazotized and then coupled with anilines expressed by formula II (R3 is methyl or ethyl; R4 is the same species as that of R2) to afford a disazo compound expressed by formula III. The resultant compound is subsequently diazotized and coupled with 1-hydroxy-6- aminonaphthalene-3-sulfonic acid to provide a trisazo compound expressed by formula IV (X is H, Na, K, etc.), which is further diazotized and then coupled with naphthalenes expressed by formula V [R5 is OH or NH2; R6 is H, COOH or alkyl; R7 is H, OH, NH2 or alkyl; (q) is 0 or 1; (r) is 0, 1 or 2] to afford the objective water-soluble azo dye expressed by formula VI [(l) and (m) are 0 or l].

    CUMARIN COMPOUND AND VISIBLE LIGHT SENSITIVE RESIN COMPOSITION USING THE SAME
    4.
    发明专利
    CUMARIN COMPOUND AND VISIBLE LIGHT SENSITIVE RESIN COMPOSITION USING THE SAME 失效

    公开(公告)号：JPH09221486A

    公开(公告)日：1997-08-26

    申请号：JP2765296

    申请日：1996-02-15

    Applicant: MITSUI TOATSU CHEMICALS

    Inventor： MATSUZAKI YORIAKI ,  IMAI RIHOKO ,  TAKUMA HIROSUKE

    IPC: C07D491/052 ,  C07D405/14 ,  C07D491/16 ,  C08F2/50 ,  C08K5/3442 ,  C08K5/3462 ,  C09D11/033 ,  C09D11/10 ,  C09D11/101 ,  C09D11/106 ,  C09K3/00 ,  G11B7/26

    Abstract: PROBLEM TO BE SOLVED: To obtain the subject new compound as a specific cumarin compound, having a sufficient sensitivity to the second harmonic component of an argon laser and YAG laser, and capable of providing a fine image having a high resolution as a photosensitizing agent, etc., for a visible light sensitive resin composition. SOLUTION: This new cumarin compound is expressed by formula 1 R1 to R4 are each H, an alkyl, an alkoxyalkyl, an alkenyl, a hydroxyalkyl, an aralkyl or an aryl, and R1 with R2 and R3 with R4 arc each allowed to bind with each other or form each a ring by binding with an amino substituted benzene nucleus in skeleton thereof; R5 , R6 are each H, a halogen, an alkyl, OH, an alkoxy, etc.; R7 , R8 are H, a halogen, an alkoxy, cyano, carboxyl, a group of formula II [R11 is H, an alkyl, etc.; (m), (n) are each 1-5], etc.; R9 , R10 are each H, an alky, an aryl etc.; X is O or S} and useful as a photosensitizing agent, etc., for a visible light sensitive resin composition, etc.

    4-SUBSTITUTED CARBONYL COUMARIN DERIVATIVE, AND VISIBLE LIGHT-SENSITIVE COMPOSITION USING THE SAME
    5.
    发明专利
    4-SUBSTITUTED CARBONYL COUMARIN DERIVATIVE, AND VISIBLE LIGHT-SENSITIVE COMPOSITION USING THE SAME 失效

    公开(公告)号：JPH0892234A

    公开(公告)日：1996-04-09

    申请号：JP22794994

    申请日：1994-09-22

    Applicant: MITSUI TOATSU CHEMICALS

    Inventor： OI TATSU ,  IMAI RIHOKO ,  KIYONO KAZUHIRO ,  TAKUMA HIROSUKE

    IPC: C07D311/16 ,  C07D311/18 ,  C07D405/04 ,  C07D413/04 ,  C07D417/04 ,  C08F2/50

    Abstract: PURPOSE: To obtain a new 4-substituted carbonyl coumarin derivative extremely useful as a photosensitive agent and capable of giving photosensitive materials enabling to form extremely fine high resolution picture image by a high speed scan exposure method. CONSTITUTION: The compound of formula I (R , R are independently H, alkyl, etc.; R is H, halogen, etc.; X is H, alkyl, etc.; Y is H, alkylcarbonyl, etc.; Z , Z are independently O, S, wherein at least one is S), e.g. a compound of formula II. The compound is a coumarin derivative which is obtained by replacing the carbonyl oxygen of the coumarin skeleton with sulfur or replacing the carbonyl oxygen of the substituted carbonyl group at the 4-position of the coumarin skeleton with sulfur. The compound is highly sensitive to visible light laser, is good in compatibility with base resins, and can be dissolved in coating solvents for general uses. 0.1-10 pts.wt. of the compound is preferably generally dissolved in 100 pts.wt. of a photocurable resin component to produce the visible light-sensitive composition.

    ANTHRAQUINONE-BASED COLORING MATTER
    7.
    发明专利
    ANTHRAQUINONE-BASED COLORING MATTER 失效

    公开(公告)号：JPH0525398A

    公开(公告)日：1993-02-02

    申请号：JP18116091

    申请日：1991-07-22

    Applicant: MITSUI TOATSU CHEMICALS

    Inventor： ITO NAOTO ,  MISAWA TSUTAYOSHI ,  OGISO AKIRA ,  IMAI RIHOKO

    IPC: C09B5/62 ,  D06P1/20 ,  D06P3/42 ,  D06P3/54

    Abstract: PURPOSE:To obtain the subject new coloring matter having excellent light resistance fastness sublimation fastness and washing fastness, readily dyeing (semi) synthetic yarn, having excellent colorability to synthetic resins, having a clear blue-purple color tone. CONSTITUTION:The objective coloring matter shown by the formula [R is (substituted)alkyl or (substituted)phenyl]. The coloring matter is obtained by reacting 1-amino-4-hydroxy-anthraquinone-2,3-dicarboxylic acid anhydride with an amine shown by formula R-NH2 in an organic solvent, preferably a solvent such as an alcohol, a hydrocarbon, a phenol or a halogenated hydrocarbon at 50-200 deg.C for about 30 minutes to 10 hours under heating.

    BIS(3-COUMARYL)THIOKETONE COMPOUND AND ITS USE
    8.
    发明专利
    BIS(3-COUMARYL)THIOKETONE COMPOUND AND ITS USE 失效

    公开(公告)号：JPH0892235A

    公开(公告)日：1996-04-09

    申请号：JP23509994

    申请日：1994-09-29

    Applicant: MITSUI TOATSU CHEMICALS

    Inventor： IMAI RIHOKO ,  OI TATSU ,  KIYONO KAZUHIRO ,  TAKUMA HIROSUKE

    IPC: C07D311/18 ,  C09B57/02 ,  C09K3/00

    Abstract: PURPOSE: To obtain bis(3-coumaryl)thioketone having sufficient sensitivity to light in the visible light region, especially the second harmonics of argon laser and YAG laser, and excellent in solubility and storage stability in resins. CONSTITUTION: The compound of the formula (R1 , R7 are independently H, halogen, etc.; R2 , R3 , R6 , R8 , R9 , R12 are independently H, halogen, etc.; R4 , R5 , R10 , R11 are independently alkyl, etc.). The compound useful as a photosensitizer is obtained by reacting a 4-substituted aminosalicylaldehyde compound with acetonedicarboxylic acid diethyl ester in the presence of a weak base such as piperidine in a polar solvent such as methanol at 60-80 deg.C for 1-120hr, and further reacting the reaction product with phosphorus pentasulfide or Lawesson reagent in an organic solvent such as chloroform at 40-140 deg.C for 1-8hr. Further, the compound is mixed with a photocurable resin ((meth)acryloyl group-containing anionic photocurable resin), a photopolymerization initiator (e.g. benzophenone) to obtain a visible light-sensitive resin composition.

    PRODUCTION OF QUINOPHTHALONEDICARBOXYLIC ACID HAVING HIGH PURITY
    9.
    发明专利
    PRODUCTION OF QUINOPHTHALONEDICARBOXYLIC ACID HAVING HIGH PURITY 失效

    公开(公告)号：JPH0748352A

    公开(公告)日：1995-02-21

    申请号：JP19593993

    申请日：1993-08-06

    Applicant: MITSUI TOATSU CHEMICALS

    Inventor： OGISO AKIRA ,  MISAWA TSUTAYOSHI ,  IMAI RIHOKO ,  ITO NAOTO ,  IRISATO YOSHIHIRO ,  TAKUMA HIROSUKE

    IPC: C07D215/20 ,  C09B25/00

    Abstract: PURPOSE:To obtain quinophthalonedicarboxylic acid having high purity and useful as an intermediate for pigment, etc., by hydrolyzing and neutralizing a specific quinophthalonedicarboxylic acid anhydride with an alkaline compound to obtain a solubilized product, removing insoluble impurities by filtration and adding an acid to precipitate the free acid. CONSTITUTION:This quinophthalonedicarboxylic acid having high purity and expressed by the formula III can be produced by adding an aqueous solution of an alkaline compound (e.g. sodium hydroxide) to a quinophthalonedicarboxylic acid anhydride expressed by the formula I (X is H, halogen or alkyl), heating the liquid mixture to 50 deg.C after confirming the adjustment of pH to 12.9, stirring for 2hr at 50-52 deg.C to effect the hydrolysis and neutralization of the compound and form a solubilized quinophthalone compound salt expressed by the formula II (Y and Z are cation), removing insoluble impurities from the product by filtration, adding an acid (e.g. sulfuric acid) to adjust the pH to 1.95, heating at 90 deg.C, keeping at the temperature for 2hr, adding water to precipitate crystals, collecting the crystal by filtration and drying the product.

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