PRODUCTION OF WATER-ABSORBENT RESIN

    公开(公告)号:JPH09169840A

    公开(公告)日:1997-06-30

    申请号:JP25167596

    申请日:1996-09-24

    Abstract: PROBLEM TO BE SOLVED: To obtain a water-absorbent resin which has an improved vol. efficiency and can be industrially produced by cross-linking polysuccinimide with a polyamine and hydrolyzing residual unreacted imide rings. SOLUTION: Polysuccinimide, usually prepd. by the condensation by dehydration of aspartic acid, is treated with a condensing agent (e.g. dicyclohexylcarbodiimide) to give higher-mol.-wt. polysuccinimide, which is reacted with 0.1-40mol% (based on the total amt. of monomer units constituting the polysuccinimide) polyamine (e.g. an aliph., alicyclic, or arom. polyamine or amino acid having amino groups at the side chains or its deriv.) in an org. solvent at 20-50 deg.C. The resultant partially cross-linked polymer is isolated from the reaction system by recrystallization, reprecipitation, and filtration and is then subjected to the hydrolysis of the imide rings remaining in the polymer. The hydrolysis is performed by adding an aq. alkali soln. to a suspension of the isolated cross-linked polymer in a homogeneous mixture of or a heterogeneous dispersion of water and an org. solvent.

    PRODUCTION OF QUINOPHTHALONEDICARBOXYLIC ACID HAVING HIGH PURITY

    公开(公告)号:JPH0748352A

    公开(公告)日:1995-02-21

    申请号:JP19593993

    申请日:1993-08-06

    Abstract: PURPOSE:To obtain quinophthalonedicarboxylic acid having high purity and useful as an intermediate for pigment, etc., by hydrolyzing and neutralizing a specific quinophthalonedicarboxylic acid anhydride with an alkaline compound to obtain a solubilized product, removing insoluble impurities by filtration and adding an acid to precipitate the free acid. CONSTITUTION:This quinophthalonedicarboxylic acid having high purity and expressed by the formula III can be produced by adding an aqueous solution of an alkaline compound (e.g. sodium hydroxide) to a quinophthalonedicarboxylic acid anhydride expressed by the formula I (X is H, halogen or alkyl), heating the liquid mixture to 50 deg.C after confirming the adjustment of pH to 12.9, stirring for 2hr at 50-52 deg.C to effect the hydrolysis and neutralization of the compound and form a solubilized quinophthalone compound salt expressed by the formula II (Y and Z are cation), removing insoluble impurities from the product by filtration, adding an acid (e.g. sulfuric acid) to adjust the pH to 1.95, heating at 90 deg.C, keeping at the temperature for 2hr, adding water to precipitate crystals, collecting the crystal by filtration and drying the product.

    SULFUR-CONTAINING URETHANE RESIN COMPOSITION, THE RESIN, AND OPTICAL ELEMENT AND LENS COMPRISING THE RESIN

    公开(公告)号:JPH0971625A

    公开(公告)日:1997-03-18

    申请号:JP15507596

    申请日:1996-06-17

    Abstract: PROBLEM TO BE SOLVED: To obtain the subject composition comprising a specific polythiol compound, a polyiso(thio)cyanate compound and a reactive unsaturated group- containing compound, large in a photopolymerization speed, giving a resin excellent in optical characteristics, impact resistance, heat resistance, etc., and useful for spectacle lens, etc. SOLUTION: A sulfur-containing urethane resin composition comprises (A) a compound of formula I(X1 , X2 , X3 are H, mercapto; (x), (y), (z) are 0-8; the compound has two or more mercapto groups) [e.g. 1-(1'-mercaptomethylthio)-2,3- dimercaptopropane], (B)a polyiso(thio)cyanate compound (e.g. xylylene diisocyanate, α, α, α', α'-tetramethylylxylene diisocyanate), and (C) a compound having two or more reactive unsaturated groups [e.g. (meth)acyl, vinyl or allyl groups] (e.g. ethylene glycol diacrylate in an amount of 30-70wt.% based on the whole amount.

    PHOTOPOLYMERIZED SULFUR-CONTAINING URETHANE PLASTIC LENS

    公开(公告)号:JPH0912663A

    公开(公告)日:1997-01-14

    申请号:JP16528395

    申请日:1995-06-30

    Abstract: PURPOSE: To obtain a resin compsn. which can give a lens having good optical properties and excellent resistances to heat, impact, and scratch by reacting a polyiso(thio)cyanate compd., a polythiol compd., and a reactive unsatd. compd. CONSTITUTION: A sulfur-contg. urethane resin compsn. is produced by reacting a polyiso(thio)cyanate compd. and a polythiol compd.. subject to the conditions that a compd. having at least two unsatd. groups is added in an amt. of 10-50wt.% of the total amt. of the reactants to the reaction mixture, that the molar ratio of SR group to the sum of NCO group and NCS group is 1.16-3.00, and that the refractive index of the resultant resin is 1.59 or higher. Thus, a sulfur-contg. urethane plastic lens having such good optical properties and excellent resistances to impact, heat, and scratch as required by optical lenses (e.g. an ophthalmic lens) is obtd. by a short-time photopolymn.

    PRODUCTION OF SULFUR-CONTAINING URETHANE PLASTIC LENS

    公开(公告)号:JPH08208794A

    公开(公告)日:1996-08-13

    申请号:JP1706595

    申请日:1995-02-03

    Abstract: PURPOSE: To obtain a sulfur-containing urethane plastic lens of low specific gravity with good optical properties and excellent impact resistance by using a mixture of a polyiso(thio)cyanate compound and a polythiol compound with a specified active hydrogen compound. CONSTITUTION: A process for producing a sulfur-containing urethane plastic lens from a polyiso(thio)cyanate compound [e.g. a compound of formula I (wherein X is H or CH ; R is Cl Br CH3 or C2 H5 ; Y is O or S; m is 0 to 4; and n is 2 to 4)] and a polythiol compound [e.g. a compound of formula II (wherein X1 , X2 and X3 are each H or SH; and x, y and z are each 0 to 8)], wherein an active hydrogen compound of formula III (wherein X and Y are each H, OH or SH; m is 1 to 2; and n is 0 to 3) is added in an amount of 1-36% to the above-mentioned compounds. This process can ensure sufficient pot life without using special equipment, and the obtained urethane resin is colorless and transparent, has high refractive index with low dispersion and is therefore suitable as a material for optical elements, such as a lens for glasses and a camera lens, and a material for adhesives.

    PHTHALOCYANINE COMPOUND
    6.
    发明专利

    公开(公告)号:JPH06287462A

    公开(公告)日:1994-10-11

    申请号:JP7423193

    申请日:1993-03-31

    Abstract: PURPOSE:To obtain a new compound, capable of absorbing light at a long wavelength, excellent in solubility in water, heat resistance and color fastness to light and useful as a near infrared ray absorber, etc. CONSTITUTION:This compound is expressed by formula I {R1 and R2 are H, lower alkyl, lower alkoxy, halogen, etc.; R3 and R4 are H, lower alkyl, lower alkoxy, halogen, hydroxyl group, etc.; X is H, halogen or hydroxyl group; (l) is 1-8; m is 0-16; n is 0-14; [2l+m+n] is 14-16; M is H, metallic atom or metallic oxide; Y is H, alkaline (earth) metal or alkylammonium; (q) is 1-10}, e.g. a compound expressed by formula II. Furthermore, the compound expressed by formula I is obtained by reacting perchlorocopper phthalocyanine with 2- aminothiophenol and further reacting the resultant compound expressed by formula III with fuming sulfuric acid.

    DICHROIC DYE FOR ADDITION TO LIQUID CRYSTAL

    公开(公告)号:JPH0539429A

    公开(公告)日:1993-02-19

    申请号:JP19781591

    申请日:1991-08-07

    Abstract: PURPOSE:To obtain a new compound having low dyeability to a resin film, exhibiting red color, having large dichroic ratio and high durability, and suitable for a high polymer dispersible type liquid crystal display, etc. CONSTITUTION:A compound expressed by formula I [R is (substituted)alkyl, (substituted)alkoxy, H or halogen; R and R are H, halogen, methyl, ethyl, methoxy or ethoxy] e.g. a compound expressed by formula II. Furthermore, the compound expressed by formula I is obtained by reacting a halogen- substituted 1-amino-4-hydroxyanthraquinone compound expressed by formula III (X is Cl, Br or I) with a 4-hydroxyazobenzene compound expressed by formula IV in a polar organic solvent such as DMF in the presence of a base such as potassium carbonate.

    PRODUCTION OF BIS(1,2-DIARYL-1,2-ETHYLENEDITHIOLATO)NICKEL-BASED COMPLEX

    公开(公告)号:JPH03197488A

    公开(公告)日:1991-08-28

    申请号:JP33660889

    申请日:1989-12-27

    Abstract: PURPOSE:To obtain the subject compound capable of absorbing near infrared rays in high yield by reacting a specific benzil compound with phosphorus pentasulfide in dimethylimidazolidinone and subsequently reacting the resultant compound with nickel chloride using a low toxic, thermally and chemically stable solvent. CONSTITUTION:A benzil compound expressed by formula I (R and R are phenyl or naphthyl which may be substituted or form a ring) is made to react with phosphorus pentasulfide in 1,3-dimehyl-2-imidazolidinone and subsequently allowed to react with nickel chloride to afford the objective compound expressed by formulas II and/or III. The resultant compound is useful as a near infrared ray cutting filter for electronic devices, photographic near infrared ray filter, safety goggles, sunglasses, goggles, heat ray cutting off film, agricultural film, optical disk, recording material for optical letter reading, solar heat storage, photographic sensitive material, etc.

    ELECTROPHOTOGRAPHIC TONER CONTAINING PYROMELLITIC ACID DERIVATIVE

    公开(公告)号:JPH07140719A

    公开(公告)日:1995-06-02

    申请号:JP28635193

    申请日:1993-11-16

    Abstract: PURPOSE:To obtain a toner contg. a colorless compd. free from a highly toxic metal, having satisfactory compatibility with a resin, dispersible uniformly in the resin and excellent in negative charge imparting property, negative charge kick-off property, aging stability and environmental stability as an electrostatic charge regulating agent having negative charge imparting property by incorporating a specified pyromellitic acid deriv. or its salt as an electrostatic charge regulating agent having negative charge imparting property. CONSTITUTION:This electrophotographic toner contains a pyromellitic acid deriv. represented by formula I and/or II or at least one kind of its salt such as metallic salt or ammonium salt as a charge regulating agent having negative charge imparting property. In the formulae I, II, each of R1 R2 R1 and R2 is optionally substd. alkyl such as methyl, ethyl or propyl or optionally substd. phenyl such as phenyl, 4-methylphenyl or 3-methylphenyl.

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