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公开(公告)号:JPH09169840A
公开(公告)日:1997-06-30
申请号:JP25167596
申请日:1996-09-24
Applicant: MITSUI TOATSU CHEMICALS
Inventor: IRISATO YOSHIHIRO , TAMAYA HIROAKI , NAGATOMO AKINORI
IPC: C08G69/00 , C08G69/10 , C08G73/10 , C08L101/16
Abstract: PROBLEM TO BE SOLVED: To obtain a water-absorbent resin which has an improved vol. efficiency and can be industrially produced by cross-linking polysuccinimide with a polyamine and hydrolyzing residual unreacted imide rings. SOLUTION: Polysuccinimide, usually prepd. by the condensation by dehydration of aspartic acid, is treated with a condensing agent (e.g. dicyclohexylcarbodiimide) to give higher-mol.-wt. polysuccinimide, which is reacted with 0.1-40mol% (based on the total amt. of monomer units constituting the polysuccinimide) polyamine (e.g. an aliph., alicyclic, or arom. polyamine or amino acid having amino groups at the side chains or its deriv.) in an org. solvent at 20-50 deg.C. The resultant partially cross-linked polymer is isolated from the reaction system by recrystallization, reprecipitation, and filtration and is then subjected to the hydrolysis of the imide rings remaining in the polymer. The hydrolysis is performed by adding an aq. alkali soln. to a suspension of the isolated cross-linked polymer in a homogeneous mixture of or a heterogeneous dispersion of water and an org. solvent.
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公开(公告)号:JPH0748352A
公开(公告)日:1995-02-21
申请号:JP19593993
申请日:1993-08-06
Applicant: MITSUI TOATSU CHEMICALS
Inventor: OGISO AKIRA , MISAWA TSUTAYOSHI , IMAI RIHOKO , ITO NAOTO , IRISATO YOSHIHIRO , TAKUMA HIROSUKE
IPC: C07D215/20 , C09B25/00
Abstract: PURPOSE:To obtain quinophthalonedicarboxylic acid having high purity and useful as an intermediate for pigment, etc., by hydrolyzing and neutralizing a specific quinophthalonedicarboxylic acid anhydride with an alkaline compound to obtain a solubilized product, removing insoluble impurities by filtration and adding an acid to precipitate the free acid. CONSTITUTION:This quinophthalonedicarboxylic acid having high purity and expressed by the formula III can be produced by adding an aqueous solution of an alkaline compound (e.g. sodium hydroxide) to a quinophthalonedicarboxylic acid anhydride expressed by the formula I (X is H, halogen or alkyl), heating the liquid mixture to 50 deg.C after confirming the adjustment of pH to 12.9, stirring for 2hr at 50-52 deg.C to effect the hydrolysis and neutralization of the compound and form a solubilized quinophthalone compound salt expressed by the formula II (Y and Z are cation), removing insoluble impurities from the product by filtration, adding an acid (e.g. sulfuric acid) to adjust the pH to 1.95, heating at 90 deg.C, keeping at the temperature for 2hr, adding water to precipitate crystals, collecting the crystal by filtration and drying the product.
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公开(公告)号:JPH0971625A
公开(公告)日:1997-03-18
申请号:JP15507596
申请日:1996-06-17
Applicant: MITSUI TOATSU CHEMICALS
Inventor: IRISATO YOSHIHIRO , UMEDA SHINICHI , KANEMURA YOSHINOBU , NAGATA TERUYUKI
Abstract: PROBLEM TO BE SOLVED: To obtain the subject composition comprising a specific polythiol compound, a polyiso(thio)cyanate compound and a reactive unsaturated group- containing compound, large in a photopolymerization speed, giving a resin excellent in optical characteristics, impact resistance, heat resistance, etc., and useful for spectacle lens, etc. SOLUTION: A sulfur-containing urethane resin composition comprises (A) a compound of formula I(X1 , X2 , X3 are H, mercapto; (x), (y), (z) are 0-8; the compound has two or more mercapto groups) [e.g. 1-(1'-mercaptomethylthio)-2,3- dimercaptopropane], (B)a polyiso(thio)cyanate compound (e.g. xylylene diisocyanate, α, α, α', α'-tetramethylylxylene diisocyanate), and (C) a compound having two or more reactive unsaturated groups [e.g. (meth)acyl, vinyl or allyl groups] (e.g. ethylene glycol diacrylate in an amount of 30-70wt.% based on the whole amount.
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公开(公告)号:JPH0912663A
公开(公告)日:1997-01-14
申请号:JP16528395
申请日:1995-06-30
Applicant: MITSUI TOATSU CHEMICALS
Inventor: IRISATO YOSHIHIRO , UMEDA SHINICHI , KANEMURA YOSHINOBU , NAGATA TERUYUKI
IPC: G02C7/02 , C08G18/30 , C08G18/38 , C08G18/67 , C08G18/77 , C08G75/02 , C08G75/0236 , C08G75/06 , G02B1/04
Abstract: PURPOSE: To obtain a resin compsn. which can give a lens having good optical properties and excellent resistances to heat, impact, and scratch by reacting a polyiso(thio)cyanate compd., a polythiol compd., and a reactive unsatd. compd. CONSTITUTION: A sulfur-contg. urethane resin compsn. is produced by reacting a polyiso(thio)cyanate compd. and a polythiol compd.. subject to the conditions that a compd. having at least two unsatd. groups is added in an amt. of 10-50wt.% of the total amt. of the reactants to the reaction mixture, that the molar ratio of SR group to the sum of NCO group and NCS group is 1.16-3.00, and that the refractive index of the resultant resin is 1.59 or higher. Thus, a sulfur-contg. urethane plastic lens having such good optical properties and excellent resistances to impact, heat, and scratch as required by optical lenses (e.g. an ophthalmic lens) is obtd. by a short-time photopolymn.
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公开(公告)号:JPH08208794A
公开(公告)日:1996-08-13
申请号:JP1706595
申请日:1995-02-03
Applicant: MITSUI TOATSU CHEMICALS
Inventor: IRISATO YOSHIHIRO , OKAZAKI MITSUKI , KANEMURA YOSHINOBU , NAGATA TERUYUKI
Abstract: PURPOSE: To obtain a sulfur-containing urethane plastic lens of low specific gravity with good optical properties and excellent impact resistance by using a mixture of a polyiso(thio)cyanate compound and a polythiol compound with a specified active hydrogen compound. CONSTITUTION: A process for producing a sulfur-containing urethane plastic lens from a polyiso(thio)cyanate compound [e.g. a compound of formula I (wherein X is H or CH ; R is Cl Br CH3 or C2 H5 ; Y is O or S; m is 0 to 4; and n is 2 to 4)] and a polythiol compound [e.g. a compound of formula II (wherein X1 , X2 and X3 are each H or SH; and x, y and z are each 0 to 8)], wherein an active hydrogen compound of formula III (wherein X and Y are each H, OH or SH; m is 1 to 2; and n is 0 to 3) is added in an amount of 1-36% to the above-mentioned compounds. This process can ensure sufficient pot life without using special equipment, and the obtained urethane resin is colorless and transparent, has high refractive index with low dispersion and is therefore suitable as a material for optical elements, such as a lens for glasses and a camera lens, and a material for adhesives.
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公开(公告)号:JPH06287462A
公开(公告)日:1994-10-11
申请号:JP7423193
申请日:1993-03-31
Applicant: MITSUI TOATSU CHEMICALS
Inventor: TAKUMA HIROSUKE , IRISATO YOSHIHIRO , KURODA SHIZUO
Abstract: PURPOSE:To obtain a new compound, capable of absorbing light at a long wavelength, excellent in solubility in water, heat resistance and color fastness to light and useful as a near infrared ray absorber, etc. CONSTITUTION:This compound is expressed by formula I {R1 and R2 are H, lower alkyl, lower alkoxy, halogen, etc.; R3 and R4 are H, lower alkyl, lower alkoxy, halogen, hydroxyl group, etc.; X is H, halogen or hydroxyl group; (l) is 1-8; m is 0-16; n is 0-14; [2l+m+n] is 14-16; M is H, metallic atom or metallic oxide; Y is H, alkaline (earth) metal or alkylammonium; (q) is 1-10}, e.g. a compound expressed by formula II. Furthermore, the compound expressed by formula I is obtained by reacting perchlorocopper phthalocyanine with 2- aminothiophenol and further reacting the resultant compound expressed by formula III with fuming sulfuric acid.
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公开(公告)号:JPH0539429A
公开(公告)日:1993-02-19
申请号:JP19781591
申请日:1991-08-07
Applicant: MITSUI TOATSU CHEMICALS
Inventor: TAKUMA HIROSUKE , YOSHITOMI HIDETAKE , IRISATO YOSHIHIRO
Abstract: PURPOSE:To obtain a new compound having low dyeability to a resin film, exhibiting red color, having large dichroic ratio and high durability, and suitable for a high polymer dispersible type liquid crystal display, etc. CONSTITUTION:A compound expressed by formula I [R is (substituted)alkyl, (substituted)alkoxy, H or halogen; R and R are H, halogen, methyl, ethyl, methoxy or ethoxy] e.g. a compound expressed by formula II. Furthermore, the compound expressed by formula I is obtained by reacting a halogen- substituted 1-amino-4-hydroxyanthraquinone compound expressed by formula III (X is Cl, Br or I) with a 4-hydroxyazobenzene compound expressed by formula IV in a polar organic solvent such as DMF in the presence of a base such as potassium carbonate.
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公开(公告)号:JPH03197488A
公开(公告)日:1991-08-28
申请号:JP33660889
申请日:1989-12-27
Applicant: MITSUI TOATSU CHEMICALS
Inventor: IRISATO YOSHIHIRO , TAKUMA HIROSUKE
Abstract: PURPOSE:To obtain the subject compound capable of absorbing near infrared rays in high yield by reacting a specific benzil compound with phosphorus pentasulfide in dimethylimidazolidinone and subsequently reacting the resultant compound with nickel chloride using a low toxic, thermally and chemically stable solvent. CONSTITUTION:A benzil compound expressed by formula I (R and R are phenyl or naphthyl which may be substituted or form a ring) is made to react with phosphorus pentasulfide in 1,3-dimehyl-2-imidazolidinone and subsequently allowed to react with nickel chloride to afford the objective compound expressed by formulas II and/or III. The resultant compound is useful as a near infrared ray cutting filter for electronic devices, photographic near infrared ray filter, safety goggles, sunglasses, goggles, heat ray cutting off film, agricultural film, optical disk, recording material for optical letter reading, solar heat storage, photographic sensitive material, etc.
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公开(公告)号:JPH09110983A
公开(公告)日:1997-04-28
申请号:JP11476996
申请日:1996-05-09
Applicant: MITSUI TOATSU CHEMICALS
Inventor: OKAZAKI MITSUKI , SHIMAKAWA CHITOSHI , TANAKA MAMORU , KANEMURA YOSHINOBU , NAGATA TERUYUKI , IRISATO YOSHIHIRO , UMEDA SHINICHI
IPC: G03F7/027 , C08G18/30 , C08G18/32 , C08G18/38 , C08G18/81 , C08G59/40 , C08G59/66 , C08G75/02 , C08G75/04 , C08G75/045 , G02B1/04
Abstract: PROBLEM TO BE SOLVED: To obtain a polysulfide resin composition having good optical properties and excellent impact resistance, heat resistance and scratch resistance and emits a very small amount of an odor of sulfur during handling by mixing a polythiol having four or more functional groups with a compound containing a specified group and like groups. SOLUTION: This polysulfide resin composition comprises a polythiol containing four or more functional groups of formula I (wherein R1 to R4 are each H, -CH2 SH, -CH2 SCH2 CH2 SH, a group of formula II or a group of formula III, provided that when one of them is H, another of them is a group of formula II or III, when two of them are H, the other two are groups of formulas II and III, and three or more of them can not be H simultaneously), formula IV (wherein (m) is 1-3) and formula V (wherein (n) is 0-3) and a compound containing (a) reactive unsaturated bonds and/or (b) epoxy groups and/or (c) iso(thio)cyanato groups in the molecule (wherein a+b+c>=2, not both of (a) and (b) can be 0 simultaneously) [e.g. compound of formula VI (wherein (p) is 1-4 and R5 and R6 are each H or CH3 )].
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公开(公告)号:JPH07140719A
公开(公告)日:1995-06-02
申请号:JP28635193
申请日:1993-11-16
Applicant: MITSUI TOATSU CHEMICALS
Inventor: TAKUMA HIROSUKE , IRISATO YOSHIHIRO , YOSHITOMI HIDETAKE
IPC: G03G9/097
Abstract: PURPOSE:To obtain a toner contg. a colorless compd. free from a highly toxic metal, having satisfactory compatibility with a resin, dispersible uniformly in the resin and excellent in negative charge imparting property, negative charge kick-off property, aging stability and environmental stability as an electrostatic charge regulating agent having negative charge imparting property by incorporating a specified pyromellitic acid deriv. or its salt as an electrostatic charge regulating agent having negative charge imparting property. CONSTITUTION:This electrophotographic toner contains a pyromellitic acid deriv. represented by formula I and/or II or at least one kind of its salt such as metallic salt or ammonium salt as a charge regulating agent having negative charge imparting property. In the formulae I, II, each of R1 R2 R1 and R2 is optionally substd. alkyl such as methyl, ethyl or propyl or optionally substd. phenyl such as phenyl, 4-methylphenyl or 3-methylphenyl.
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