1.
    发明专利
    未知

    公开(公告)号:DE19544514A1

    公开(公告)日:1996-06-05

    申请号:DE19544514

    申请日:1995-11-29

    Applicant: MOTOROLA INC

    Abstract: A method for metallizing selected areas of a two dielectric layered sequentially processed circuit board (100) involves exposing the resin A (204) by photo-definition. The resin A (204) contains 10% or less, by weight Cu2O particles (300) mixed uniformly throughout the resin. The circuit board (100) is sprayed with a reduction solution to form catalytic islands (301) predominately of Cu0 or CuH. The circuit board (100) is then electrolessly plated to form conductors, pads or vias, where the resin A (204) has been exposed. The reduction solution includes a primary reducing agent, a secondary reducing agent and a capturing agent. The reduction solution preferably has a pH of 10 or greater. The primary reducing agent is preferably a borohydride. The secondary reducing agent is preferably an iodide and the capturing agent is a chelating agent preferably EDTA.

    Process for metallizing substrates using starved-reaction metal-oxide reduction

    公开(公告)号:GB2264720B

    公开(公告)日:1994-11-23

    申请号:GB9305310

    申请日:1993-03-15

    Applicant: MOTOROLA INC

    Abstract: A unique process metallizes a substrate surface using a reducing agent including a borohydride to reduce, in a starved reaction, metal oxide particles (300) substantially uniformly distributed and at a controlled concentration in a particle-filled resin (204) to produce catalytic island areas (301). The catalytic island areas (301) formed have a surface resistivity greater than 106 ohms per square. These catalytic island areas (301) are then electrolessly metallized to a predetermined thickness, such that adjacent catalytic island areas (301) are interconnected and form metallic features, such as pads, vias (213), and conductors (210, 211 and 212). The starved reaction limits the reduction of metal oxide particles (300) to catalytic island areas (301) and prevents migration of reduced metal beyond each of the exposed surfaces of particle-filled resin (204) which are to be metallized.

    PROCESS FOR METALLIZING SUBSTRATES USING STARVED-REACTION METAL-OXIDE REDUCTION

    公开(公告)号:GB2264720A

    公开(公告)日:1993-09-08

    申请号:GB9305310

    申请日:1993-03-15

    Applicant: MOTOROLA INC

    Abstract: A unique process metallizes a substrate surface using a reducing agent including a borohydride to reduce, in a starved reaction, metal oxide particles (300) substantially uniformly distributed and at a controlled concentration in a particle-filled resin (204) to produce catalytic island areas (301). The catalytic island areas (301) formed have a surface resistivity greater than 10 ohms per square. These catalytic island areas (301) are then electrolessly metallized to a predetermined thickness, such that adjacent catalytic island areas (301) are interconnected and form metallic features, such as pads, vias (213), and conductors (210, 211 and 212). The starved reaction limits the reduction of metal oxide particles (300) to catalytic island areas (301) and prevents migration of reduced metal beyond each of the exposed surfaces of particle-filled resin (204) which are to be metallized.

    4.
    发明专利
    未知

    公开(公告)号:DE19540122C2

    公开(公告)日:1997-08-21

    申请号:DE19540122

    申请日:1995-10-27

    Applicant: MOTOROLA INC

    Abstract: PROBLEM TO BE SOLVED: To generate catalytic islands around a small granular metal oxide and to form a sufficient quantity of solid copper thereon by a method, wherein a conductor, a via or a pad exposes a resin and a small granular metal oxide on the surface thereof at a required part, before a circuit board is immersed into a reducing solution. SOLUTION: A two derivative continuous processing board is reduced for 5 min in a solution of 1.0 mol. hydrogenated boron and 0.25 mol. EDTA. The substrate is then cleaned with deionized water and immersed into ion palladium solution for 10 seconds. Subsequently, it is cleaned with deionized water and left as it is for 2 minutes in an electroless bath. According to the method, the deriving time is shortened, while increasing the density at the bonding part and the size of copper particle plating the conductors, pads and vias on a circuit board can be reduced.

    5.
    发明专利
    未知

    公开(公告)号:FR2727640A1

    公开(公告)日:1996-06-07

    申请号:FR9513954

    申请日:1995-11-23

    Applicant: MOTOROLA INC

    Abstract: A method for metallizing selected areas of a two dielectric layered sequentially processed circuit board (100) involves exposing the resin A (204) by photo-definition. The resin A (204) contains 10% or less, by weight Cu2O particles (300) mixed uniformly throughout the resin. The circuit board (100) is sprayed with a reduction solution to form catalytic islands (301) predominately of Cu0 or CuH. The circuit board (100) is then electrolessly plated to form conductors, pads or vias, where the resin A (204) has been exposed. The reduction solution includes a primary reducing agent, a secondary reducing agent and a capturing agent. The reduction solution preferably has a pH of 10 or greater. The primary reducing agent is preferably a borohydride. The secondary reducing agent is preferably an iodide and the capturing agent is a chelating agent preferably EDTA.

    Method and reduction solution for metallizing a surface

    公开(公告)号:SG73952A1

    公开(公告)日:2000-07-18

    申请号:SG1995001995

    申请日:1995-12-01

    Applicant: MOTOROLA INC

    Abstract: A method for metallizing selected areas of a two dielectric layered sequentially processed circuit board (100) involves exposing the resin A (204) by photo-definition. The resin A (204) contains 10% or less, by weight Cu2O particles (300) mixed uniformly throughout the resin. The circuit board (100) is sprayed with a reduction solution to form catalytic islands (301) predominately of Cu0 or CuH. The circuit board (100) is then electrolessly plated to form conductors, pads or vias, where the resin A (204) has been exposed. The reduction solution includes a primary reducing agent, a secondary reducing agent and a capturing agent. The reduction solution preferably has a pH of 10 or greater. The primary reducing agent is preferably a borohydride. The secondary reducing agent is preferably an iodide and the capturing agent is a chelating agent preferably EDTA.

    8.
    发明专利
    未知

    公开(公告)号:DE19540122A1

    公开(公告)日:1996-05-02

    申请号:DE19540122

    申请日:1995-10-27

    Applicant: MOTOROLA INC

    Abstract: A method for decreasing the initiation time of an electroless bath involves exposing a plurality of small metal oxide particles contained in a resin defining a surface. The surface is then treated with reducing solution which results in catalytic islands forming around the metal oxide particles and is then treated with a noble metal salt solution of a concentration less than 0.1 molar. This results in a fine layer of noble metal on top of the catalytic islands and protects the islands from oxidation. The surface is the placed in an electroless bath. It has been found that the initiation time in the electroless bath has been reduced from fifteen minutes to less than two minutes.

    PROCESS FOR METALLIZING SUBSTRATES USING STARVED-REACTION METAL-OXIDE REDUCTION

    公开(公告)号:CA2089479A1

    公开(公告)日:1993-02-02

    申请号:CA2089479

    申请日:1992-06-08

    Applicant: MOTOROLA INC

    Abstract: A unique process metallizes a substrate surface using a reducing agent including a borohydride to reduce, in a starved reaction, metal oxide particles (300) substantially uniformly distributed and at a controlled concentration in a particle-filled resin (204) to produce catalytic island areas (301). The catalytic island areas (301) formed have a surface resistivity greater than 106 ohms per square. These catalytic island areas (301) are then electrolessly metallized to a predetermined thickness, such that adjacent catalytic island areas (301) are interconnected and form metallic features, such as pads, vias (213), and conductors (210, 211 and 212). The starved reaction limits the reduction of metal oxide particles (300) to catalytic island areas (301) and prevents migration of reduced metal beyond each of the exposed surfaces of particle-filled resin (204) which are to be metallized.

    PROCESS FOR METALLIZING SUBSTRATES USING STARVED-REACTION METAL-OXIDE REDUCTION

    公开(公告)号:CA2089479C

    公开(公告)日:1998-01-20

    申请号:CA2089479

    申请日:1992-06-08

    Applicant: MOTOROLA INC

    Abstract: A unique process metallizes a substrate surface using a reducing agent including a borohydride to reduce, in a starved reaction, metal oxide particles (300) substantially uniformly distributed and at a controlled concentration in a particle filled resin (204) to produce catalytic island areas (301). The catalytic island areas (301) formed have a surface resistivity greater than 10 6 ohms per square. These catalytic island areas (301) are then electrolessly metallized to a predetermined thickness, such that adjacent catalytic island areas (301) are interconnected and form metallic features, such as pads, vias (213), and conductors (210, 211 and 212). The starved reaction limits the reduction of metal oxide particles (300) to catalytic island areas (301) and prevents migration of reduced metal beyond each of the exposed surfaces of particle-filled resin (204) which are to be metallized.

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