公开(公告)号：EP2701178A2

公开(公告)日：2014-02-26

申请号：EP13179104.8

申请日：2003-10-30

Applicant: Mapper Lithography IP B.V.

Inventor： Van Veen, Alexander ,  Wieland, Marco ,  Kruit, Pieter ,  Kampherbeek, Bert Jan

IPC: H01J3/02 ,  H01J37/06 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J3/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/3045

Abstract: The invention relates to an electron optical system for receiving a plurality of beamlets, comprising a first electrostatic lens array for focusing a plurality of beamlets; a modulation array comprising a plurality of modulators for modulating the intensity of the beamlets; a scan deflector array comprising a plurality of electrostatic scan deflectors for deflecting a portion of the beamlets in a predetermined direction; and a second electrostatic lens array for focusing the deflected beamlets.

Abstract translation: 本发明涉及一种用于接收多个子束的电子光学系统，包括用于聚焦多个子束的第一静电透镜阵列; 调制阵列，包括用于调制子束强度的多个调制器; 扫描偏转器阵列，包括用于沿预定方向偏转所述子束的一部分的多个静电扫描偏转器; 以及用于聚焦偏转的子束的第二静电透镜阵列。

公开(公告)号：EP2701178A3

公开(公告)日：2017-06-28

申请号：EP13179104.8

申请日：2003-10-30

Applicant: Mapper Lithography IP B.V.

Inventor： Van Veen, Alexander ,  Wieland, Marco ,  Kruit, Pieter ,  Kampherbeek, Bert Jan

IPC: H01J3/02 ,  H01J37/06 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J3/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/3045

Abstract: The invention relates to an electron optical system for receiving a plurality of beamlets, comprising a first electrostatic lens array for focusing a plurality of beamlets; a modulation array comprising a plurality of modulators for modulating the intensity of the beamlets; a scan deflector array comprising a plurality of electrostatic scan deflectors for deflecting a portion of the beamlets in a predetermined direction; and a second electrostatic lens array for focusing the deflected beamlets.

Abstract translation: 本发明涉及一种用于接收多个小射束的电子光学系统，包括用于聚焦多个小射束的第一静电透镜阵列; 调制阵列，其包括用于调制子束的强度的多个调制器; 扫描偏转器阵列，其包括多个静电扫描偏转器，用于沿预定方向偏转一部分小射束; 以及用于聚焦偏转子束的第二静电透镜阵列。