公开(公告)号：US11955312B2

公开(公告)日：2024-04-09

申请号：US17560460

申请日：2021-12-23

Applicant: Materials Analysis Technology Inc.

Inventor： Chien-Wei Wu ,  Keng-Chieh Chu ,  Yung-Sheng Fang ,  Chun-Wei Wu ,  Hung-Jen Chen

IPC: H01J37/317 ,  H01J37/20

CPC classification number: H01J37/3178 ,  H01J37/20

Abstract: A physical analysis method, a sample for physical analysis and a preparing method thereof are provided. The preparing method of the sample for physical analysis includes: providing a sample to be inspected; and forming a contrast enhancement layer on a surface of the sample to be inspected. The contrast enhancement layer includes a plurality of first material layers and a plurality of second material layers stacked upon one another. The first material layer and the second material layer are made of different materials. Each one of the first and second material layers has a thickness that does not exceed 0.1 nm. In an image captured by an electron microscope, a difference between an average grayscale value of a surface layer image of the sample to be inspected and an average grayscale value of an image of the contrast enhancement layer is at least 50.