Patent search ap:("Micron Technology Page Inc.") AND inv:"WESTMORELAND

1.

发明申请
GRAPHOEPITAXIAL SELF-ASSEMBLY OF ARRAYS OF HALF-CYLINDERS FORMED ON A SUBSTRATE 审中-公开

公开(公告)号：WO2009134635A3

公开(公告)日：2009-11-05

申请号：PCT/US2009/041125

申请日：2009-04-20

Applicant: MICRON TECHNOLOGY, INC. , MILLWARD, Dan, B. , WESTMORELAND, Donald

Inventor： MILLWARD, Dan, B. , WESTMORELAND, Donald

IPC: B81C1/00

Abstract: Methods for fabricating sublithographic, nanoscale microslructures in line arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

2.

发明申请
METHODS OF FABRICATING NANOSTRUCTURES BY USE OF THIN FILMS OF SELF-ASSEMBLING OF DIBLOCK COPOLYMERS, AND DEVICES RESULTING FROM THOSE METHODS 审中-公开

公开(公告)号：WO2008156977A3

公开(公告)日：2008-12-24

申请号：PCT/US2008/064973

申请日：2008-05-28

Applicant: MICRON TECHNOLOGY, INC. , MILLWARD, Dan, B. , WESTMORELAND, Donald , SANDHU, Gurtej

Inventor： MILLWARD, Dan, B. , WESTMORELAND, Donald , SANDHU, Gurtej

IPC: C08J9/28 , G03F7/00

Abstract: Methods for fabricating sublithographic, nanoscale microstructures arrays Including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films ean be used as a template or mask to etch openings in an underlying material layer.

3.

发明授权
GRAPHOEPITAXIAL SELF-ASSEMBLY OF ARRAYS OF HALF-CYLINDERS FORMED ON A SUBSTRATE 有权
Title translation: 在基质制备半割筒GRAPHOEPITAKTISCHE自行安排

公开(公告)号：EP2276690B1

公开(公告)日：2012-09-19

申请号：EP09739437.3

申请日：2009-04-20

Applicant: Micron Technology, Inc.

Inventor： MILLWARD, Dan, B. , WESTMORELAND, Donald

IPC: B81C1/00

CPC classification number: H01L29/0657 , B81C1/00031 , B81C2201/0149 , B81C2201/0198 , B82Y30/00 , G03F7/0002 , H01L21/02118 , H01L21/0223 , H01L29/06 , Y10S438/947 , Y10S977/888 , Y10S977/895 , Y10S977/90 , Y10T428/24182 , Y10T428/24521 , Y10T428/2462 , Y10T428/249921

4.

发明公开
GRAPHOEPITAXIAL SELF-ASSEMBLY OF ARRAYS OF HALF-CYLINDERS FORMED ON A SUBSTRATE 有权
Title translation: 在基质制备半割筒GRAPHOEPITAKTISCHE自行安排

公开(公告)号：EP2276690A2

公开(公告)日：2011-01-26

申请号：EP09739437.3

申请日：2009-04-20

Applicant: Micron Technology, Inc.

Inventor： MILLWARD, Dan, B. , WESTMORELAND, Donald

IPC: B81C1/00

CPC classification number: H01L29/0657 , B81C1/00031 , B81C2201/0149 , B81C2201/0198 , B82Y30/00 , G03F7/0002 , H01L21/02118 , H01L21/0223 , H01L29/06 , Y10S438/947 , Y10S977/888 , Y10S977/895 , Y10S977/90 , Y10T428/24182 , Y10T428/24521 , Y10T428/2462 , Y10T428/249921

Abstract: Methods for fabricating sublithographic, nanoscale microslructures in line arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

Patent Agency Ranking