公开(公告)号：WO2009042075A3

公开(公告)日：2009-07-23

申请号：PCT/US2008010906

申请日：2008-09-19

Applicant: NANOGRAM CORP ,  FREY BERNARD M ,  BUERKI PETER S ,  LYNCH ROBERT B ,  WANG JANET L ,  TRAN GABRIEL ,  HORNE CRAIG R ,  HOLUNGA DEAN M ,  ALTMAN IGOR

Inventor： FREY BERNARD M ,  BUERKI PETER S ,  LYNCH ROBERT B ,  WANG JANET L ,  TRAN GABRIEL ,  HORNE CRAIG R ,  HOLUNGA DEAN M ,  ALTMAN IGOR

IPC: B01J19/08

CPC classification number: B82Y30/00 ,  B01J19/121 ,  B01J2219/0869 ,  B01J2219/0884 ,  B22F2999/00 ,  B82Y40/00 ,  C22B4/08 ,  B22F9/30 ,  B22F3/003

Abstract: Light-driven flow reactors are configured with an aerosol delivery apparatus that is designed to improve the reactive process with respect to forming uniform product compositions at higher rates. In particular, the reactant delivery system can deliver an aerosol having an average droplet size of no more than about 50 microns, and in some embodiments 20 microns, and with less than 1 droplet in 10,000 having a diameter greater than 5 times the average droplet size. In some embodiments, the edge of the aerosol generator can be placed within about 6 centimeters of the edge of the light beam passing through the reaction chamber. The average aerosol velocity can be no more than about 5 meters per second. In some embodiments, the aerosol generator can comprise a non-circular opening and a gas permeable structure that is used to generate a mist that is delivered from the apparatus as an aerosol.

Abstract translation: 光驱流反应器配置有气溶胶输送装置，其被设计成改进相对于以较高速率形成均匀产品组合物的反应过程。 特别地，反应物输送系统可以输送平均液滴尺寸不超过约50微米，并且在一些实施例中为20微米，并且在10,000中具有小于1个液滴的直径大于平均液滴尺寸的5倍的气溶胶 。 在一些实施例中，气溶胶发生器的边缘可以放置在通过反应室的光束的边缘的约6厘米内。 平均气溶胶速度可以不超过约5米/秒。 在一些实施例中，气溶胶发生器可以包括非圆形开口和气体可透过结构，其用于产生作为气溶胶从装置输送的雾。

公开(公告)号：WO2012006071A3

公开(公告)日：2012-04-19

申请号：PCT/US2011042142

申请日：2011-06-28

Applicant: NANOGRAM CORP ,  CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

Inventor： CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

IPC: B01J13/00 ,  B01J19/08 ,  C01B33/02 ,  C01G17/00 ,  C09D11/00

CPC classification number: C09D11/38 ,  B01D21/262 ,  B01J19/121 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0875 ,  B82Y30/00 ,  C01B33/02 ,  C08K3/08 ,  C08K3/36 ,  C08K9/02 ,  C09D5/24 ,  C09D7/67 ,  C09D7/68 ,  C09D7/80 ,  C09D11/037 ,  C09D11/101 ,  C09D11/322 ,  C09D11/36 ,  C09D11/52 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/02579 ,  H01L21/02581 ,  H01L21/02601 ,  H01L21/02628 ,  H01L23/4828 ,  H01L23/53276 ,  H01L31/00 ,  H01L31/02363 ,  H01L31/03682 ,  H01L31/03762 ,  H01L31/0747 ,  H01L31/182 ,  H01L31/1864 ,  H01L2924/0002 ,  Y02E10/52 ,  Y02E10/546 ,  Y02E10/548 ,  Y02P70/521 ,  H01L2924/00

Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainnient flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.

Abstract translation: 描述了激光热解反应器设计和相应的反应物入口喷嘴以提供特别适用于元素硅颗粒的合成的期望的颗粒猝灭。 特别地，基于围绕反应物前体流的大量惰性气体以及有效围绕反应物前体和骤冷气体流的大的惰性夹带流，喷嘴可以具有鼓励用惰性气体进行成核和淬火的设计。 描述了改进的硅纳米粒子油墨，其具有硅纳米粒子而没有用有机化合物进行任何表面改性。 硅油墨特性可以针对特定的印刷应用进行设计，例如喷墨印刷，凹版印刷或丝网印刷。 描述了适当的处理方法，为墨水设计提供了灵活性，而没有表面修饰硅纳米颗粒。

公开(公告)号：MY162622A

公开(公告)日：2017-06-30

申请号：MYPI2012701276

申请日：2011-06-28

Applicant: NANOGRAM CORP

Inventor： CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

IPC: H01L51/00 ,  C09D5/24 ,  C09D7/80

Abstract: LASER PYROLYSIS REACTOR DESIGNS AND CORRESPONDING REACTANT INLET NOZZLES ARE DESCRIBED TO PROVIDE DESIRABLE PARTICLE QUENCHING THAT IS PARTICULARLY SUITABLE FOR THE SYNTHESIS OF ELEMENTAL SILICON PARTICLES. IN PARTICULAR, THE NOZZLES CAN HAVE A DESIGN TO ENCOURAGE NUCLEATION AND QUENCHING WITH INERT GAS BASED ON A SIGNIFICANT FLOW OF INERT GAS SURROUNDING THE REACTANT PRECURSOR FLOW AND WITH A LARGE INERT ENTRAINMENT FLOW EFFECTIVELY SURROUNDING THE REACTANT PRECURSOR AND QUENCH GAS FLOWS. IMPROVED SILICON NANOPARTICLE INKS ARE DESCRIBED THAT HAS SILICON NANOPARTICLES WITHOUT ANY SURFACE MODIFICATION WITH ORGANIC COMPOUNDS. THE SILICON INK PROPERTIES CAN BE ENGINEERED FOR PARTICULAR PRINTING APPLICATIONS, SUCH AS INKJET PRINTING, GRAVURE PRINTING OR SCREEN PRINTING. APPROPRIATE PROCESSING METHODS ARE DESCRIBED TO PROVIDE FLEXIBILITY FOR INK DESIGNS WITHOUT SURFACE MODIFYING THE SILICON NANOPARTICLES.

公开(公告)号：SG186489A1

公开(公告)日：2013-01-30

申请号：SG2012096665

申请日：2011-06-28

Applicant: NANOGRAM CORP

Inventor： CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

IPC: C09D7/80

Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.

公开(公告)号：EP2588227A4

公开(公告)日：2014-09-10

申请号：EP11804119

申请日：2011-06-28

Applicant: NANOGRAM CORP

Inventor： CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

IPC: B01J13/00 ,  B01J19/08 ,  C01B33/02 ,  C01G17/00 ,  C09D11/00 ,  H01L31/00

CPC classification number: C09D11/38 ,  B01D21/262 ,  B01J19/121 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0875 ,  B82Y30/00 ,  C01B33/02 ,  C08K3/08 ,  C08K3/36 ,  C08K9/02 ,  C09D5/24 ,  C09D7/67 ,  C09D7/68 ,  C09D7/80 ,  C09D11/037 ,  C09D11/101 ,  C09D11/322 ,  C09D11/36 ,  C09D11/52 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/02579 ,  H01L21/02581 ,  H01L21/02601 ,  H01L21/02628 ,  H01L23/4828 ,  H01L23/53276 ,  H01L31/00 ,  H01L31/02363 ,  H01L31/03682 ,  H01L31/03762 ,  H01L31/0747 ,  H01L31/182 ,  H01L31/1864 ,  H01L2924/0002 ,  Y02E10/52 ,  Y02E10/546 ,  Y02E10/548 ,  Y02P70/521 ,  H01L2924/00

Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.