公开(公告)号：WO2012006071A3

公开(公告)日：2012-04-19

申请号：PCT/US2011042142

申请日：2011-06-28

Applicant: NANOGRAM CORP ,  CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

Inventor： CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

IPC: B01J13/00 ,  B01J19/08 ,  C01B33/02 ,  C01G17/00 ,  C09D11/00

CPC classification number: C09D11/38 ,  B01D21/262 ,  B01J19/121 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0875 ,  B82Y30/00 ,  C01B33/02 ,  C08K3/08 ,  C08K3/36 ,  C08K9/02 ,  C09D5/24 ,  C09D7/67 ,  C09D7/68 ,  C09D7/80 ,  C09D11/037 ,  C09D11/101 ,  C09D11/322 ,  C09D11/36 ,  C09D11/52 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/02579 ,  H01L21/02581 ,  H01L21/02601 ,  H01L21/02628 ,  H01L23/4828 ,  H01L23/53276 ,  H01L31/00 ,  H01L31/02363 ,  H01L31/03682 ,  H01L31/03762 ,  H01L31/0747 ,  H01L31/182 ,  H01L31/1864 ,  H01L2924/0002 ,  Y02E10/52 ,  Y02E10/546 ,  Y02E10/548 ,  Y02P70/521 ,  H01L2924/00

Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainnient flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.

Abstract translation: 描述了激光热解反应器设计和相应的反应物入口喷嘴以提供特别适用于元素硅颗粒的合成的期望的颗粒猝灭。 特别地，基于围绕反应物前体流的大量惰性气体以及有效围绕反应物前体和骤冷气体流的大的惰性夹带流，喷嘴可以具有鼓励用惰性气体进行成核和淬火的设计。 描述了改进的硅纳米粒子油墨，其具有硅纳米粒子而没有用有机化合物进行任何表面改性。 硅油墨特性可以针对特定的印刷应用进行设计，例如喷墨印刷，凹版印刷或丝网印刷。 描述了适当的处理方法，为墨水设计提供了灵活性，而没有表面修饰硅纳米颗粒。

公开(公告)号：WO2011035306A3

公开(公告)日：2011-10-06

申请号：PCT/US2010049661

申请日：2010-09-21

Applicant: NANOGRAM CORP ,  LIU GUOJUN ,  MORRIS CLIFFORD M ,  ALTMAN IGOR ,  SRINIVASAN UMA ,  CHIRUVOLU SHIVKUMAR

Inventor： LIU GUOJUN ,  MORRIS CLIFFORD M ,  ALTMAN IGOR ,  SRINIVASAN UMA ,  CHIRUVOLU SHIVKUMAR

IPC: H01L31/042 ,  H01L31/0216

CPC classification number: H01L31/068 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/02601 ,  H01L21/02628 ,  H01L31/03682 ,  H01L31/03762 ,  H01L31/075 ,  H01L31/076 ,  H01L31/182 ,  H01L31/202 ,  Y02E10/546 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

Abstract: High quality silicon inks are used to form polycrystalline layers within thin film solar cells having a p-n junction. The particles deposited with the inks can be sintered to form the silicon film, which can be intrinsic films or doped films. The silicon inks can have a z- average secondary particle size of no more than about 250 nm as determined by dynamic light scattering on an ink sample diluted to 0.4 weight percent if initially having a greater concentration. In some embodiments, an intrinsic layer can be a composite of an amorphous silicon portion and a crystalline silicon portion.

Abstract translation: 高质量的硅油墨用于在具有p-n结的薄膜太阳能电池内形成多晶硅层。 沉积有油墨的颗粒可以被烧结以形成硅膜，其可以是本征膜或掺杂膜。 如通过初始具有较高浓度稀释至0.4重量％的油墨样品上的动态光散射确定的，硅油墨可具有不超过约250nm的z-平均二次粒度。 在一些实施例中，本征层可以是非晶硅部分和晶体硅部分的复合物。

公开(公告)号：WO2012106137A3

公开(公告)日：2012-10-18

申请号：PCT/US2012022215

申请日：2012-01-23

Applicant: NANOGRAM CORP ,  LIU GUOJUN ,  SRINIVASAN UMA ,  CHIRUVOLU SHIVKUMAR

Inventor： LIU GUOJUN ,  SRINIVASAN UMA ,  CHIRUVOLU SHIVKUMAR

IPC: H01L31/042 ,  H01L31/0216 ,  H01L31/18

CPC classification number: H01L21/2252 ,  B82Y30/00 ,  H01L21/2225 ,  H01L21/228 ,  H01L31/068 ,  H01L31/0682 ,  H01L31/1804 ,  Y02E10/52 ,  Y02E10/547 ,  Y02P70/521

Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.

Abstract translation: 如果提供合适的帽，则使用掺杂硅纳米粒子墨水和其他液体掺杂剂源可以提供合适的掺杂剂源，用于使用热过程将掺杂剂元素驱动到晶体硅衬底中。 合适的盖子包括例如盖板，可以或不可以搁置在基底表面上的盖子和覆盖层。 可以实现期望的掺杂剂轮廓。 掺杂的纳米粒子可以使用硅油墨输送。 在掺杂剂推入之后或者至少部分致密化为结合到产品装置中的硅材料之后，可以去除残留的硅油墨。 硅掺杂适合于将掺杂剂引入晶体硅中以形成太阳能电池。

公开(公告)号：WO2013066669A3

公开(公告)日：2013-08-01

申请号：PCT/US2012061456

申请日：2012-10-23

Applicant: NANOGRAM CORP ,  LIU GUOJUN ,  CHIRUVOLU SHIVKUMAR ,  LI WEIDONG ,  SRINIVASAN UMA

Inventor： LIU GUOJUN ,  CHIRUVOLU SHIVKUMAR ,  LI WEIDONG ,  SRINIVASAN UMA

IPC: H01L21/20 ,  H01L21/205

CPC classification number: H01L29/04 ,  H01L21/02104 ,  H01L21/02532 ,  H01L21/0259 ,  H01L21/02601 ,  H01L21/0262 ,  H01L21/02628 ,  H01L21/2225 ,  H01L21/2257 ,  H01L21/67115 ,  H01L31/028 ,  H01L31/035218 ,  H01L31/068 ,  H01L31/0682 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: Silicon nanoparticle inks provide a basis for the formation of desirable materials. Specifically, composites have been formed in thin layers comprising silicon nanoparticles embedded in an amorphous silicon matrix, which can be formed at relatively low temperatures. The composite material can be heated to form a nanocrystalline material having crystals that are non-rod shaped. The nanocrystalline material can have desirable electrical conductive properties, and the materials can be formed with a high dopant level. Also, nanocrystalline silicon pellets can be formed from silicon nanoparticles deposited form an ink in which the pellets can be relatively dense although less dense than bulk silicon. The pellets can be formed from the application of pressure and heat to a silicon nanoparticle layer.

Abstract translation: 硅纳米颗粒油墨为形成所需材料提供了基础。 具体而言，复合材料已经形成在包含嵌入非晶硅基质中的硅纳米颗粒的薄层中，所述硅纳米颗粒可以在相对低的温度下形成。 可以加热复合材料以形成具有非棒形晶体的纳米晶体材料。 纳米晶体材料可以具有期望的导电性质，并且可以以高掺杂剂水平形成材料。 而且，纳米晶硅颗粒可以由沉积在墨水中的硅纳米颗粒形成，其中颗粒可以是相对致密的，但是比体硅的密度小。 可以通过将压力和热量施加到硅纳米颗粒层来形成颗粒。

公开(公告)号：EP2804912A4

公开(公告)日：2015-12-09

申请号：EP12865642

申请日：2012-12-28

Applicant: NANOGRAM CORP

Inventor： LI WEIDONG ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA ,  CHIRUVOLU SHIVKUMAR ,  SOEDA MASAYA ,  LIU GUOJUN

IPC: C09D11/00 ,  B82Y30/00 ,  C09D11/10 ,  H01L21/20 ,  H05K1/02

CPC classification number: H01L21/02381 ,  B82Y30/00 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02601 ,  H01L21/02628

公开(公告)号：EP2774174A4

公开(公告)日：2015-07-29

申请号：EP12846610

申请日：2012-10-23

Applicant: NANOGRAM CORP

Inventor： LIU GUOJUN ,  CHIRUVOLU SHIVKUMAR ,  LI WEIDONG ,  SRINIVASAN UMA

IPC: H01L21/20 ,  H01L21/208 ,  H01L21/225

CPC classification number: H01L29/04 ,  H01L21/02104 ,  H01L21/02532 ,  H01L21/0259 ,  H01L21/02601 ,  H01L21/0262 ,  H01L21/02628 ,  H01L21/2225 ,  H01L21/2257 ,  H01L21/67115 ,  H01L31/028 ,  H01L31/035218 ,  H01L31/068 ,  H01L31/0682 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

公开(公告)号：MY162622A

公开(公告)日：2017-06-30

申请号：MYPI2012701276

申请日：2011-06-28

Applicant: NANOGRAM CORP

Inventor： CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

IPC: H01L51/00 ,  C09D5/24 ,  C09D7/80

Abstract: LASER PYROLYSIS REACTOR DESIGNS AND CORRESPONDING REACTANT INLET NOZZLES ARE DESCRIBED TO PROVIDE DESIRABLE PARTICLE QUENCHING THAT IS PARTICULARLY SUITABLE FOR THE SYNTHESIS OF ELEMENTAL SILICON PARTICLES. IN PARTICULAR, THE NOZZLES CAN HAVE A DESIGN TO ENCOURAGE NUCLEATION AND QUENCHING WITH INERT GAS BASED ON A SIGNIFICANT FLOW OF INERT GAS SURROUNDING THE REACTANT PRECURSOR FLOW AND WITH A LARGE INERT ENTRAINMENT FLOW EFFECTIVELY SURROUNDING THE REACTANT PRECURSOR AND QUENCH GAS FLOWS. IMPROVED SILICON NANOPARTICLE INKS ARE DESCRIBED THAT HAS SILICON NANOPARTICLES WITHOUT ANY SURFACE MODIFICATION WITH ORGANIC COMPOUNDS. THE SILICON INK PROPERTIES CAN BE ENGINEERED FOR PARTICULAR PRINTING APPLICATIONS, SUCH AS INKJET PRINTING, GRAVURE PRINTING OR SCREEN PRINTING. APPROPRIATE PROCESSING METHODS ARE DESCRIBED TO PROVIDE FLEXIBILITY FOR INK DESIGNS WITHOUT SURFACE MODIFYING THE SILICON NANOPARTICLES.

公开(公告)号：MY160606A

公开(公告)日：2017-03-15

申请号：MYPI2013701297

申请日：2012-01-23

Applicant: NANOGRAM CORP

Inventor： LIU GUOJUN ,  SRINIVASAN UMA ,  CHIRUVOLU SHIVKUMAR

IPC: H01L21/22 ,  B82Y30/00 ,  H01L21/02 ,  H01L21/225 ,  H01L21/228 ,  H01L21/38 ,  H01L31/068 ,  H01L31/18

Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate (240) using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.

公开(公告)号：SG186489A1

公开(公告)日：2013-01-30

申请号：SG2012096665

申请日：2011-06-28

Applicant: NANOGRAM CORP

Inventor： CHIRUVOLU SHIVKUMAR ,  ALTMAN IGOR ,  FREY BERNARD M ,  LI WEIDONG ,  LIU GUOJUN ,  LYNCH ROBERT B ,  PENGRA-LEUNG GINA ELIZABETH ,  SRINIVASAN UMA

IPC: C09D7/80

Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.

公开(公告)号：EP2671261A4

公开(公告)日：2015-03-18

申请号：EP12742405

申请日：2012-01-23

Applicant: NANOGRAM CORP

Inventor： LIU GUOJUN ,  SRINIVASAN UMA ,  CHIRUVOLU SHIVKUMAR

IPC: H01L21/22 ,  H01L21/225 ,  H01L21/228 ,  H01L31/0216 ,  H01L31/042 ,  H01L31/18

CPC classification number: H01L21/2252 ,  B82Y30/00 ,  H01L21/2225 ,  H01L21/228 ,  H01L31/068 ,  H01L31/0682 ,  H01L31/1804 ,  Y02E10/52 ,  Y02E10/547 ,  Y02P70/521