公开(公告)号：WO9961244A8

公开(公告)日：2000-03-09

申请号：PCT/US9911257

申请日：1999-05-20

Applicant: NANOGRAM CORP

Inventor： KUMAR SUJEET ,  BI XIANGXIN ,  KAMBE NOBUYUKI

IPC: C01B33/113 ,  C01B33/12 ,  C01B33/18 ,  C09G1/02 ,  C09K3/14 ,  C11D3/14 ,  C11D7/14 ,  H01B1/06 ,  B32B19/00 ,  B32B5/16 ,  C01B15/14 ,  C01B17/00 ,  C01B33/00 ,  C11D9/00 ,  C11D9/02 ,  C11D9/04 ,  D02G3/00 ,  C11D3/58 ,  C11D65/06

CPC classification number: C11D3/124 ,  C01B33/113 ,  C01P2004/64 ,  C11D7/14 ,  Y10T428/2982

Abstract: A collection of silicon oxide nanoparticles have an average diameter from about 5 nm to about 100 nm. The collection of silicon oxide nanoparticles effectively include no particles with a diameter greater than about four times the average diameter. The particles generally have a spherical morphology. Methods for producing the nanoparticles involve laser pyrolysis. The silicon oxide nanoparticles are effective for the production of improved polishing compositions including compositions useful for chemical-mechanical polishing.

Abstract translation: 氧化硅纳米颗粒的集合具有约5nm至约100nm的平均直径。 氧化硅纳米颗粒的收集有效地包括直径大于平均直径的四倍的颗粒。 颗粒通常具有球形形态。 制备纳米颗粒的方法包括激光热解。 氧化硅纳米颗粒对于生产改进的抛光组合物是有效的，包括用于化学机械抛光的组合物。

公开(公告)号：WO2009117148A3

公开(公告)日：2009-12-23

申请号：PCT/US2009001771

申请日：2009-03-20

Applicant: NANOGRAM CORP ,  RAVILISETTY PADMANABHA R ,  CHIRUVOLU SHIVKUMAR ,  KAMBE NOBUYUKI ,  JAISWAL ABHISHEK

Inventor： RAVILISETTY PADMANABHA R ,  CHIRUVOLU SHIVKUMAR ,  KAMBE NOBUYUKI ,  JAISWAL ABHISHEK

IPC: C07F7/02 ,  C09K11/08 ,  C09K11/59 ,  C09K11/64 ,  C09K11/79

CPC classification number: C09K11/7734 ,  C04B35/584 ,  C04B35/597 ,  C04B35/6265 ,  C04B35/6268 ,  C04B35/62685 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3217 ,  C04B2235/3224 ,  C04B2235/3418 ,  C04B2235/3427 ,  C04B2235/3852 ,  C04B2235/3865 ,  C04B2235/3873 ,  C04B2235/442 ,  C04B2235/444 ,  C04B2235/445 ,  C04B2235/5445 ,  Y10T428/2982

Abstract: Submicron powders of metal silicon nitrides and metal silicon oxynitrides are synthesized using nanoscale particles of one or more precursor materials using a solid state reaction. For example, nanoscale powders of silicon nitride are useful precursor powders for the synthesis of metal silicon nitride and metal silicon oxynitride submicron powders. Due to the use of the nanoscale precursor materials for the synthesis of the submicron phosphor powders, the product phosphors can have very high internal quantum efficiencies. The phosphor powders can comprise a suitable dopant activator, such as a rare earth metal element dopant.

Abstract translation: 使用固态反应使用一种或多种前体材料的纳米级颗粒来合成金属氮化硅和金属氮氧化硅的亚微米粉末。 例如，氮化硅的纳米级粉末是用于合成金属氮化硅和金属氮氧化硅亚微米粉末的有用前体粉末。 由于使用纳米级前体材料来合成亚微米荧光粉，所以产品荧光粉可以具有非常高的内部量子效率。 荧光粉可以包含合适的掺杂剂活化剂，例如稀土金属元素掺杂剂。

公开(公告)号：CA2350201A1

公开(公告)日：2000-05-18

申请号：CA2350201

申请日：1999-11-08

Applicant: NANOGRAM CORP

Inventor： HARIKLIA DRIS REITZ ,  HORNE CRAIG R ,  BI XIANGXIN ,  MOSSO RONALD J ,  KAMBE NOBUYUKI ,  GARDNER JAMES T ,  KUMAR SUJEET

IPC: C01G45/00 ,  C01G45/02 ,  C01G45/12 ,  H01M4/02 ,  H01M4/50 ,  H01M4/505 ,  H01M10/052 ,  H01M10/36 ,  A21B2/00 ,  H05B3/10 ,  B01J23/32 ,  A45D20/40

Abstract: Manganese oxide particles and lithium manganese oxide particles have been produced with an average diameter less than about 500 nm. The particles have a high degree of uniformity including a very narrow distribution of particles sizes. Methods are described for producing metal oxides by performing a reaction with an aerosol including a metal precursor. In particular, the particles can be formed by laser pyrolysis. The lithium manganese oxide particles can be formed by the heat treatment of nanoparticles of manganese oxide. Alternatively, lithium manganese oxide particles can be formed direct ly by laser pyrolysis. The lithium manganese oxide particles are useful as acti ve materials in the positive electrodes of lithium based batteries. Improved batteries result from the use of the uniform nanoscale lithium manganese oxi de particles.

公开(公告)号：CA2333259A1

公开(公告)日：1999-12-02

申请号：CA2333259

申请日：1999-05-20

Applicant: NANOGRAM CORP

Inventor： KAMBE NOBUYUKI ,  BI XIANGXIN ,  KUMAR SUJEET

IPC: C01B33/113 ,  C01B33/12 ,  C01B33/18 ,  C09G1/02 ,  C09K3/14 ,  C11D3/14 ,  C11D7/14 ,  H01B1/06 ,  B32B19/00 ,  C01B17/00 ,  C01B33/00 ,  C11D9/00 ,  D02G3/00 ,  C11D9/02 ,  C11D9/04 ,  C01B15/14 ,  B32B5/16

Abstract: A collection of silicon oxide nanoparticles have an average diameter from about 5 nm to about 100 nm. The collection of silicon oxide nanoparticles effectively include no particles with a diameter greater than about four times the average diameter. The particles generally have a spherical morphology. Methods for producing the nanoparticles involve laser pyrolysis. The silicon oxide nanoparticles are effective for the production of improved polishing compositions including compositions useful for chemical-mechanical polishing.

公开(公告)号：WO2006127746A3

公开(公告)日：2009-04-16

申请号：PCT/US2006019983

申请日：2006-05-23

Applicant: NANOGRAM CORP ,  CHIRUVOLU SHIVKUMAR ,  DU HUI ,  MCGOVERN WILLIAM E ,  HORNE CRAIG R ,  MOSSO RONALD J ,  KAMBE NOBUYUKI

Inventor： CHIRUVOLU SHIVKUMAR ,  DU HUI ,  MCGOVERN WILLIAM E ,  HORNE CRAIG R ,  MOSSO RONALD J ,  KAMBE NOBUYUKI

IPC: B32B5/16

CPC classification number: B01J19/121 ,  B01J4/002 ,  B01J19/085 ,  B01J19/088 ,  B01J19/123 ,  B01J19/125 ,  B01J19/126 ,  B01J19/127 ,  B01J19/128 ,  B01J19/26 ,  B01J2219/0849 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0877 ,  B01J2219/0892 ,  B82Y30/00 ,  C01P2004/04 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C08J3/12 ,  C08J3/128 ,  C08J2383/02 ,  C09C1/3684 ,  C09C3/10 ,  C09C3/12

Abstract: Collections of composite particles comprise inorganic particles and another composition, such as a polymer and/or a coating composition. In some embodiments, the composite particles have small average particle sizes, such as no more than about 10 microns or no more than about 2.5 microns. The composite particles can have selected particle architectures. The inorganic particles can have compositions selected for particular properties. The composite particles can be effective for printing applications, for the formation of optical coatings, and other desirable applications.

Abstract translation: 复合颗粒的收集包括无机颗粒和另一种组合物，例如聚合物和/或涂料组合物。 在一些实施方案中，复合颗粒具有小的平均粒度，例如不超过约10微米或不大于约2.5微米。 复合颗粒可以具有选定的颗粒结构。 无机颗粒可以具有特定性质的组合物。 复合颗粒可用于印刷应用，用于形成光学涂层和其它期望的应用。

公开(公告)号：WO02057812A2

公开(公告)日：2002-07-25

申请号：PCT/US0201702

申请日：2002-01-17

Applicant: NANOGRAM CORP ,  BRYAN MICHAEL A ,  KAMBE NOBUYUKI

Inventor： BRYAN MICHAEL A ,  KAMBE NOBUYUKI

IPC: G02B6/124 ,  G02B6/125 ,  G02B6/13 ,  G02B

CPC classification number: G02B6/13 ,  G02B6/124 ,  G02B6/125 ,  Y10T428/25

Abstract: Photosensitive optical materials are used for establishing more versatile approaches for optical device formation. In some embodiments, unpatterned light (404) is used to shift the index-of-refraction of planar optical structures (400) to shift the index-of-refraction of the photosensitive material (402) to a desired value. This approach can be effective to produce cladding material with a selected index-of-refraction. In additional embodiments gradients in index-of-refraction are formed using photosensitive materials. In additional embodiments gradient in index-of-refraction are formed using photosensitive materials. In further embodiments, the photosensitive materials are patterned within the planar optical structure. Irradiation of the photosensitive material can selectively shift the index-of-refraction of the patterned photosensitive material. By patterning the light used used to irradiate the patterned photosensitive material, different optical devices can be selectively activated within the optical structure.

Abstract translation: 光敏光学材料用于建立用于光学器件形成的更通用的方法。 在一些实施例中，未图案化的光（404）用于移动平面光学结构（400）的折射率以将感光材料（402）的折射率偏移到期望值。 这种方法可以有效地生产具有选定的折射率的包层材料。 在另外的实施例中，使用光敏材料形成折射率折射率。 在另外的实施例中，使用光敏材料形成折射率梯度。 在另外的实施例中，感光材料在平面光学结构内图案化。 感光材料的照射可以选择性地移动图案化感光材料的折射率。 通过图案化用于照射图案化感光材料的光，可以在光学结构内选择性地激活不同的光学器件。

公开(公告)号：WO2007109084A3

公开(公告)日：2008-01-24

申请号：PCT/US2007006497

申请日：2007-03-14

Applicant: NANOGRAM CORP ,  CHIRUVOLU SHIVKUMAR ,  LI WEIDONG ,  ALTMAN IGOR ,  DU HUI K ,  KAMBE NOBUYUKI ,  MOSSO RONALD J

Inventor： CHIRUVOLU SHIVKUMAR ,  LI WEIDONG ,  ALTMAN IGOR ,  DU HUI K ,  KAMBE NOBUYUKI ,  MOSSO RONALD J

IPC: C09K11/08

CPC classification number: C09K11/7774 ,  B82Y30/00 ,  C01F17/0025 ,  C01P2002/04 ,  C01P2002/52 ,  C01P2002/72 ,  C01P2004/03 ,  C01P2004/50 ,  C01P2004/64

Abstract: Collections of phosphor particles have achieved improved performance based on improved material properties, such as crystallinity. Display devices can be formed with these improved submicron phosphor particles. Improved processing methods contribute to the improved phosphor particles, which can have high crystallinity and a high degree of particle size uniformity. Dispersions and composites can be effectively formed from the powders of the submicron particle collections.

Abstract translation: 基于改善的材料性质如结晶度，荧光体颗粒的收集已经实现了改进的性能。 可以用这些改进的亚微米荧光体颗粒形成显示装置。 改进的处理方法有助于改进的磷光体颗粒，其可以具有高结晶度和高度的粒度均匀性。 分散体和复合材料可以从亚微米颗粒收集的粉末中有效地形成。

公开(公告)号：AU1289199A

公开(公告)日：1999-05-24

申请号：AU1289199

申请日：1998-10-29

Applicant: NANOGRAM CORP

Inventor： KAMBE NOBUYUKI ,  BI XIANGXIN

IPC: C01G23/04 ,  A61K8/19 ,  A61K8/27 ,  A61K8/29 ,  A61Q17/04 ,  H01J61/35 ,  H01J61/40 ,  H05K3/00

公开(公告)号：DE69942687D1

公开(公告)日：2010-09-30

申请号：DE69942687

申请日：1999-05-20

Applicant: NANOGRAM CORP

Inventor： KUMAR SUJEET ,  BI XIANGXIN ,  KAMBE NOBUYUKI

IPC: C01B33/113 ,  C11D9/02 ,  C01B15/14 ,  C01B17/00 ,  C01B33/00 ,  C01B33/12 ,  C01B33/18 ,  C09G1/02 ,  C09K3/14 ,  C11D3/14 ,  C11D7/14 ,  C11D9/04 ,  H01B1/06

公开(公告)号：DE60231511D1

公开(公告)日：2009-04-23

申请号：DE60231511

申请日：2002-08-01

Applicant: NANOGRAM CORP

Inventor： KAMBE NOBUYUKI ,  HONEKER CHRISTIAN C ,  BLUM YIGAL DO ,  MACQUEEN DAVID BRENT

IPC: B32B13/04 ,  G02B5/00 ,  B32B27/18 ,  B32B27/34 ,  B32B27/36 ,  B32B27/40 ,  C08K3/00 ,  C08K3/08 ,  C08K3/18 ,  C08L101/00 ,  G02B1/04 ,  G02B5/18 ,  G02B6/12 ,  G02B6/122 ,  G02F1/01

Abstract: Polymer-inorganic particle blends are incorporated into structures generally involving interfaces with additional materials that can be used advantageously for forming desirable devices. In some embodiments, the structures are optical structures, and the interfaces are optical interfaces. The different materials at the interface can have differences in index-of-refraction to yield desired optical properties at the interface. In some embodiments, structures are formed with periodic variations in index-of-refraction. In particular, photonic crystals can be formed. Suitable methods can be used to form the desired structures.