公开(公告)号：EP1816463A1

公开(公告)日：2007-08-08

申请号：EP07250204.0

申请日：2007-01-18

Applicant: Northrop Grumman Corporation

Inventor： Chou, Mau-Song ,  Arenberg, Jonathan W. ,  Menard, Mark A. ,  Chung, Thomas T.

IPC: G01N21/35 ,  G01N21/88 ,  G01N25/72 ,  G02B21/00 ,  H01L21/66

CPC classification number: G01N21/8806 ,  G01N21/3563 ,  G01N21/9501 ,  G01N25/72 ,  G01N2201/06133

Abstract: A technique for providing high-contrast images of defects in semiconductor devices (10) and arrays of such devices (10), by illuminating each semiconductor device (10) under inspection with broadband infrared radiation, and then forming an image of radiation that is specularly reflected from the semiconductor device. Many semiconductor devices and arrays of such devices have a metal backing layer (16) that specularly reflects the illumination back into an appropriately positioned and aligned camera (14), selected to be sensitive to infrared wavelengths at which the semiconductor device (10) materials are relatively transparent.

Abstract translation: 一种用于通过用宽带红外辐射照射被检查的每个半导体器件（10）来提供半导体器件（10）中的缺陷的高对比度图像和这种器件（10）的阵列的技术，然后形成镜面的辐射图像 从半导体器件反射。 许多这样的器件的半导体器件和阵列具有金属背衬层（16），其将照明反射回适当定位和对准的相机（14），其选择为对半导体器件（10）材料的红外波长敏感 比较透明

公开(公告)号：EP1475807A2

公开(公告)日：2004-11-10

申请号：EP03026822.1

申请日：2003-11-20

Applicant: NORTHROP GRUMMAN CORPORATION

Inventor： Arenberg, Jonathan W.

IPC: G21K1/06 ,  G03F7/20 ,  H05G2/00 ,  G02B5/09 ,  F21V7/04

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175

Abstract: Collector optics (70) for an EUV radiation source (10) for collecting EUV radiation (78). The collector optics (70) includes an elliptical dish reflector (72) where light generated at a focal point (76) of the reflector (72) is collected by the reflector (72) and is directed to a collection location (82). A frustal annular reflector (90) is positioned around an outer edge (84) of the dish reflector (72) to collect more of the EUV radiation (78) that may otherwise be lost. The radiation (78) reflected by the annular reflector (90) is directed to a center axicon reflector (94) positioned between the focal point (76) of the dish reflector (72) and the collection location (82) to redirect the radiation (78) reflected by the annular reflector (90) to be within a predetermined collection angle.

Abstract translation: 用于收集EUV辐射的EUV辐射源（10）的收集器光学器件（70）（78）。 收集器光学器件（70）包括椭圆形的餐具反射器（72），其中在反射器（72）的焦点（76）处产生的光由反射器（72）收集并被引导到收集位置（82）。 锥形环形反射器（90）围绕盘反射器（72）的外边缘（84）定位，以收集更多的否则可能丢失的EUV辐射（78）。 由环形反射器（90）反射的辐射（78）被引导到位于盘反射器（72）的焦点（76）和收集位置（82）之间的中心旋转三棱镜反射器（94），以重定向辐射 78）由环形反射器（90）反射到预定的收集角度内。