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    X-RAY LENS SYSTEM
    3.
    发明申请
    X-RAY LENS SYSTEM 审中-公开
    X射线透镜系统

    公开(公告)号：WO0062306A2

    公开(公告)日：2000-10-19

    申请号：PCT/US0009170

    申请日：2000-04-07

    Applicant: OSMIC INC

    Inventor： VERMAN BORIS ,  JIANG LICAI ,  BONGLEA KIM ,  JOENSEN KARSTEN DAN

    IPC: G21K1/06 ,  G21K5/02 ,  G21K

    CPC classification number: G21K1/06 ,  A61N2005/1091 ,  A61N2005/1095

    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

    Abstract translation: 一种用于引导x射线的模块化X射线透镜系统，包括产生x射线的辐射源和引导x射线的透镜系统，其中x射线透镜系统可被配置为将x射线聚焦到 焦点并改变所述焦点的强度。

    X-RAY DIFFRACTOMETER WITH ADJUSTABLE IMAGE DISTANCE
    4.
    发明申请
    X-RAY DIFFRACTOMETER WITH ADJUSTABLE IMAGE DISTANCE 审中-公开
    具有可调节图像距离的X射线衍射仪

    公开(公告)号：WO9951972A2

    公开(公告)日：1999-10-14

    申请号：PCT/US9905876

    申请日：1999-03-17

    Applicant: OSMIC INC

    Inventor： VERMAN BORIS ,  JIANG LICAI

    IPC: G01N23/20 ,  G01N23/207

    CPC classification number: G01N23/207 ,  G01N23/20016 ,  G01N23/20025

    Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.

    Abstract translation: x射线衍射仪系统，其包括x射线光学器件，X射线光学器件将X射线，放置在所述定向x射线中的样品放置，其中所述样品衍射所述定向x射线，产生衍射图案，耦合到所述样品的平移台 用于在所述定向x射线内移动所述样品，由此可以调节所述衍射图案的分辨率，角度范围和强度，以及用于记录所述衍射图案的X射线检测器。

    5.
    发明专利
    未知

    公开(公告)号：DE602004003347T2

    公开(公告)日：2007-06-21

    申请号：DE602004003347

    申请日：2004-02-26

    Applicant: OSMIC INC

    Inventor： VERMAN BORIS ,  JIANG LICAI

    IPC: G21K1/06 ,  G21K1/04

    Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.

    6.
    发明专利
    未知

    公开(公告)号：DE69923182D1

    公开(公告)日：2005-02-17

    申请号：DE69923182

    申请日：1999-03-17

    Applicant: OSMIC INC

    Inventor： VERMAN BORIS ,  JIANG LICAI

    IPC: G01N23/20 ,  G01N23/207

    Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.

    7.
    发明专利
    未知

    公开(公告)号：AT241848T

    公开(公告)日：2003-06-15

    申请号：AT99934364

    申请日：1999-02-18

    Applicant: OSMIC INC

    Inventor： GUTMAN GEORGE ,  JIANG LICAI ,  VERMAN BORIS

    IPC: G21K1/06

    Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.

    10.
    发明专利
    未知

    公开(公告)号：DE60025341T2

    公开(公告)日：2006-08-17

    申请号：DE60025341

    申请日：2000-04-07

    Applicant: OSMIC INC

    Inventor： VERMAN BORIS ,  JIANG LICAI ,  BONGLEA KIM ,  JOENSEN DAN

    IPC: G21K1/06 ,  G21K5/02

    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

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