Abstract:
PROBLEM TO BE SOLVED: To reduce or compensate thermal stresses in a semiconductor element, which arise as a result of temperature changes during processing and during operation and on account of different expansion coefficients of a semiconductor and a carrier substrate. SOLUTION: In a method of producing the semiconductor element having a light-emitting semiconductor layer or a light-emitting semiconductor element, two contact locations, and a vertically or horizontally patterned carrier substrate, the carrier substrate is patterned in such a way that the thermal stresses are reduced or compensated sufficiently to ensure that the element does not fail. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To avoid that a parasitic current circuit is generated between solder and a base in flip-chip mounting. SOLUTION: In a luminescent diode chip for flip-chip mounting on a carrier, an insulating means (40, 42, 44, 46, 48) is provided on the chip, for electrically insulating exposed surfaces of the semiconductor body (14) and the substrate (12) from the carrier (30) in the luminescent diode chip having the conductive substrate (12), the semiconductor body (14), and a contact (18), whereby either a carrier is covered with solder or a layer of solder is applied to the contact. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a light emitting semiconductor element which is enhanced in radiation efficiency, and a method of manufacturing the light emitting semiconductor element.SOLUTION: The light emitting semiconductor element has a first main surface and a second main surface, and a semiconductor base of the semiconductor element is formed by a stack of various group III-V nitride semiconductor layers. At least part of produced radiation is passed through the first main surface to be output and coupled, and a reflector is bonded to the second main surface. A group III-V nitride layer is bonded to a junction substrate having a substrate base and an intermediate layer, and the substrate base has a larger coefficient of thermal expansion than the group III-V nitride layer, which is deposited on the intermediate layer.
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-emitting semiconductor component which can be produced from a wafer with a better area yield and is suitable to high optical output, and a method for the production thereof. SOLUTION: The radiation-emitting semiconductor component has a radiation-transmissive substrate, on the underside of which a radiation-generating layer is arranged, in which the substrate has inclined side surfaces, in which the refractive index of the substrate is greater than the refractive index of the radiation-generating layer, in which the difference in refractive index results in an unilluminated substrate region, into which no photons are coupled directly from the radiation-generating layer, and in which the substrate has essentially perpendicular side surfaces in the unilluminated region. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor chip suitable for high radiation output so that output efficiency of radiation generated in the semiconductor chip is improved. SOLUTION: At least one vertical surface of a semiconductor chip, which is used as an output surface, is longer than a lateral surface in an extending direction of an active zone. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical semiconductor device capable of improving quantum efficiency. SOLUTION: An indium content of at least one well layer is increased in a step of growing the well layer. In the optical semiconductor device, the well layer has a first composition based on a nitride semiconductor material with first electron energy, and a barrier layer has a second composition based on the nitride semiconductor material with second electron energy higher than the first electron energy. A beam activated quantum well layer is grown on the barrier layer. Non-radiative well layers and the barrier layers form a superlattice for the beam activated quantum well layer. The layer thickness of the beam activated quantum well layer is larger than the layer thickness of the well layer of the superlattice. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a technically simple and an inexpensive method for manufacturing a GaN-based semiconductor device, and to provide a method for manufacturing the semiconductor device which has enhanced luminous efficiency. SOLUTION: A plurality of GaN-based layers (4) are applied onto a laminated substrate which has a substrate body (1) and an interlayer (2). In this case, the thermal expansion coefficient of the substrate body (1) is similar to or greater than that of the GaN-based layers (4), and the GaN-based layers (4) are deposited on the interlayer (2). Preferably, the interlayer and the substrate body are bonded by a wafer bonding process. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To improve the efficiency for extracting the light, without incuring so much costs, from a semiconductor chip which includes a semiconductor layer stack 1 having an n-type conductive semiconductor layer 11, a p-type conductive semiconductor layer 13, and an electromagnetic beam producing region 12 between them and manufactured epitaxially; a supporting plate 50; and a mirror layer 40 located between them and to reflect the electromagnetic beam emitted from the semiconductor layer stack in the direction to the supporting plate. SOLUTION: The mirror layer has a plurality of flat reflecting partial surfaces 14 which are positioned to the main elongated surface of the beam producing region diagonally and at angles between 10° and 50° to the main elongated surface respectively. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an effective layer (2) containing at least a semiconductor layer by separating the effective layer (2) from a carrier (1). SOLUTION: An effective layer (2) is formed on a carrier (1), a subsidiary carrier (3) is formed on the opposite side of the effective layer (2) to the carrier (1) with a bond layer (4), advantageously a bond layer (4) having a metal material at a bonding temperature, and the carrier (1) is mechanically peeled off at a temperature higher or equal to the bonding temperature of the bond layer but lower than the melting temperature whereby at least a part of the effective layer is peeled off, together with the subsidiary carrier layer (3). COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To prevent generation of a parasitic current circuit between a solder and a base body at conducting the flip - chip - mounting of a light-emitting diode chip. SOLUTION: This light-emitting diode chip is provided with a conductive base body (12), a semiconductor body (14), and a contact (18), wherein a support body is covered with solder or a solder layer is formed on contact. At performing of the flip - chip - mounting of the light-emitting diode chip, the exposed faces of the semiconductor body (14) and the base body (12) are electrically insulated from the support body (30) by providing insulating materials (40, 42, 44, 46, and 48) on the chip to perform the flip - chip - mounting of the light-emitting diode chip on the support body. COPYRIGHT: (C)2004,JPO