公开(公告)号：US3864572A

公开(公告)日：1975-02-04

申请号：US40284473

申请日：1973-10-02

Applicant: PHILIPS CORP

Inventor： VAN DER MAST KAREL DIEDERICK ,  BARTH JAMES EDMOND

IPC: H01J37/06 ,  H01J3/02 ,  H01J37/075 ,  H05H7/08 ,  H01J37/26

CPC classification number: H01J37/075 ,  H01J3/02 ,  H01J3/024 ,  H01J2237/06316

Abstract: The electron source of an electron beam apparatus comprises a cathode wire which is to be heated by a laser beam and which is to be displaced in the wire direction. This cathode wire has a thickness of from 10 to 30 microns. By applying a field strength of 105 to 106 KV/m to the heated wire tip and by controlling the laser intensity and the wire feed during operation by a signal derived from the emission of the wire tip, a tip is produced on the wire end having a curvature radius of approximately 1 micron. At a temperature just below the melting temperature of the wire a stable temperature field emission having a current density of up to better than 104 A/cm2 is thus realized.

Abstract translation: 电子束装置的电子源包括由激光束加热并在线方向移位的阴极线。 该阴极线的厚度为10至30微米。 通过向加热的线尖施加105至106KV / m的场强，并且通过由电极尖端的发射导出的信号控制操作期间的激光强度和送丝，在具有 大约1微米的曲率半径。 在刚好低于电线熔化温度的温度下，实现了电流密度高达104A / cm2的稳定的温度场发射。