公开(公告)号：DE1446224A1

公开(公告)日：1969-01-30

申请号：DE1446224

申请日：1961-08-25

Applicant: PHOTOCIRCUITS CORP

Inventor： JOHN ZEBLISKY RUDOLPH

IPC: C23C18/28 ,  C23C3/00

公开(公告)号：DE1665395B1

公开(公告)日：1971-03-04

申请号：DE1665395

申请日：1967-11-29

Applicant: PHOTOCIRCUITS CORP

Inventor： WILLIAM SCHNEBLE FREDERICK ,  F MCCORMACK JOHN ,  JOHN ZEBLISKY RUDOLPH ,  POLICHETTE JOSEPH ,  DUFF WILLIAMSON JOHN

IPC: C23C18/16 ,  C23C18/20 ,  H01B1/00 ,  H05K1/03 ,  H05K3/28 ,  H05K3/42

公开(公告)号：DE1521440A1

公开(公告)日：1970-01-08

申请号：DE1521440

申请日：1965-06-23

Applicant: PHOTOCIRCUITS CORP

Inventor： W SCHNEBLE FREDERICK ,  JOHN ZEBLISKY RUDOLPH ,  FRANCIS MCCORMACK JOHN

IPC: C23C18/31 ,  C23C18/36 ,  C23C18/40 ,  C23C18/52 ,  C23C3/02

Abstract: In the electroless deposition of e.g. Cu, Ni, Co, Cd, and Sn, a cyanide compound is added in an amount less than 500 milligrams/1. The substrate may be paper, glass, ceramic, synthetic resins or a metal, e.g. Ni, Co, Fe, steel, Pd, Pt, Au, Cu, brass, Mn, Cr, W, Ti, Sn, Ag or Mo. An oxidizing agent, e.g. borohydrides, amine boranes, hydrazines, hypophosphites, hydrosulphites, hydroxyl amines, and formaldehyde may be added. A sequestering agent e.g. ethylene diamine, diethylene triamine, triethylene tetramine, E.D.T.A., citric and tartaric acid, ammonia, Rochelle salts, nitrilo triacetic acid, gluconic acid and gluconates, and triethanolamine, and a surfactant e.g. organic phosphate esters or oxyethylated sodium salts may also be added. Noncatalytic surfaces may be sensitized with stannous chloride and a precious metal salt.