APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHY
    1.
    发明申请
    APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHY 审中-公开
    半导体纳米尺寸颗粒的应用于光刻机

    公开(公告)号:WO2005029180A2

    公开(公告)日:2005-03-31

    申请号:PCT/US2004/006443

    申请日:2004-03-04

    IPC: G03F

    Abstract: Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing mateirals as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described.

    Abstract translation: 半导体纳米尺寸颗粒具有独特的光学性质,使其成为UV光刻技术中各种应用的理想选择。 在该专利中,描述了包括使用半导体纳米尺寸颗粒或半导体纳米尺寸颗粒在浸没式光刻中作为高折射介质的半导体纳米尺寸颗粒,作为光学中的抗反射涂层,光刻中的防护薄膜和UV光致抗蚀剂中的敏化剂 。

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