公开(公告)号：BRPI0612997A2

公开(公告)日：2010-12-14

申请号：BRPI0612997

申请日：2006-07-20

Applicant: QUALCOMM INC

Inventor： CHUI CLARENCE ,  CHUNG WONSUK ,  GANTI SURYA PRAKASH ,  KOTHARI MANISH ,  MILES MARK W ,  SASAGAWA TERUO ,  SAMPSELL JEFFREY B

IPC: B81B3/00 ,  G02B26/00

Abstract: Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, both rivets and posts may be used. In certain embodiments, these support structures are formed from rigid inorganic materials, such as metals or oxides. In certain embodiments, etch barriers may also be deposited to facilitate the use of materials in the formation of support structures which are not selectively etchable with respect to other components within the MEMS device.

公开(公告)号：CA2616268A1

公开(公告)日：2007-02-01

申请号：CA2616268

申请日：2006-07-20

Applicant: QUALCOMM INC

Inventor： CHUI CLARENCE ,  CHUNG WONSUK ,  GANTI SURYA PRAKASH ,  KOTHARI MANISH ,  MILES MARK W ,  SAMPSELL JEFFREY B ,  SASAGAWA TERUO

IPC: B81B3/00 ,  G02B26/00

Abstract: Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer , or by posts underlying depressions in the conductive movable layer. In certa in embodiments, portions of the rivet structures extend through the movable lay er and contact underlying layers. In other embodiments, the material used to fo rm the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.

公开(公告)号：AU2006246423A1

公开(公告)日：2006-11-16

申请号：AU2006246423

申请日：2006-04-25

Applicant: QUALCOMM INC

Inventor： KOTHARI MANISH ,  CUMMINGS WILLIAM J

IPC: G09G3/34

Abstract: Methods of writing display data to MEMS display elements are configured to minimize charge buildup and differential aging. Prior to writing rows of image data, a pre-write operation is performed. The pre-write operation with either actuate or release substantially all pixels in a row prior to writing the image data. In some embodiments, the selection between actuating or releasing is performed in a random or pseudo-random manner.

公开(公告)号：WO2007081547A2

公开(公告)日：2007-07-19

申请号：PCT/US2006049148

申请日：2006-12-22

Applicant: QUALCOMM INC ,  KOTHARI MANISH ,  KOGUT LIOR ,  CHUI CLARENCE

Inventor： KOTHARI MANISH ,  KOGUT LIOR ,  CHUI CLARENCE

CPC classification number: G01L5/0047 ,  G02B26/001

Abstract: The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.

Abstract translation: 本发明包括确定残余应力的系统和方法，例如在干涉式调制器中发现的。 在一个示例中，测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜，其中膜被构造为平行四边形，其中每侧的至少一部分附着到基底，以及形成在膜的一部分和基底的一部分之间的干涉腔， 并且其中膜被配置为基于膜中的残余应力而变形并且调制指示膜变形量的光。