Abstract:
A diode laser is improved in order to produce an output in a single longitudinal mode. The laser has a rectangular body with two regions of differing conductivity type material. Extending from one surface of the rectangular body and into one of the regions of differing conductivity material is a third region. Although the third region is composed of the same general conductivity type material as the region into which it extends, it is more highly doped with conductivity modifiers (more conductive). This third region extends along one surface between the ends of the body and is spaced from the sides of the body. An electrical contact stripe is positioned on the one surface so that a portion of its width overlaps a portion of the width of the third region.
Abstract:
In depositing on a substrate by liquid phase epitaxy an epitaxial layer of a semiconductor material having a volatile element, an initial epitaxial layer of the semiconductor material of the substrate is first grown by liquid phase epitaxy on the substrate to provide a smooth, undamaged surface which is not contaminated with the volatile element of the semiconductor material to be deposited. Immediately upon removal of the substrate from the solution from which the initial epitaxial layer is deposited, the substrate is placed in the solution from which the desired epitaxial layer is deposited. Thus, the desired epitaxial layer is deposited on a smooth, undamaged surface which is not contaminated with the volatile element of the semiconductor material.
Abstract:
Two layers of a semiconductor material composed of three or more elements are deposited in succession by liquid phase epitaxy on a substrate. The layers may be of different conductivity types to form a PN junction therebetween. The layers are deposited from separate solutions containing the semiconductor material and a suitable dopant. During the deposition of the first layer from one of the solutions, both of the solutions are treated in the same manner so that the composition of the second layer is the same as that of the first layer at the junction between the layers.
Abstract:
GALLIUM PHOSPHIDE LIGHT EMITTING DIODES WITH REPRODUCIBLE EXTERNAL QUANTUM EFFICIENCIES GREATER THAN 1% ARE MANLUFACTURED BY SUCCESSIVE LIQUID PHASE EPITAXIAL GROWTH OF N TYPE AND P TYPE LAYERS ON A GALLIUM PHOSHIDE SUBSTRATE WHICH MAY BE OF EITHER CONDUCTIVITY TYPE. THE N TYPE LAYER IS GROWTH FIRST FROM A MELT OF TELLURIUM AND GALLIUM PHOSPHIDE IN A GALLIUM SOLVENT. THE P TYPE LAYER IS SUBSEQUENTLY GROWN ON THE N TYPE LAYER FROM A MELT OF ZINC OXIDE, GALLIUM OXIDE AND GALLIUM PHOSPHIDE IN A GALLIUM SOLVENT.
Abstract:
PHASE-LOCKED LASER ARRAY WITH VARYING ELECTRICAL CURRENT DISTRIBUTION A phase locked laser array comprises a body of semiconductor material which includes structure for defining a plurality of substantially parallel lasing zones which are uniformly spaced an effective distance apart so that the propagating modes of the adjacent lasing zones are phaselocked to one another. One of the array electrodes comprises a plurality of electrical contacts extending between the end faces and having lateral unequal widths and center-to-center spacings. These contacts provide a laterally varying electrical current distribution across the plurality of lasing zones.
Abstract:
RIDGE GUIDE DISTRIBUTED FEEDBACK LASER AND METHOD OF MAKING SAME A distributed feedback laser which generates light of a specific wavelength comprises a body of semiconductor material having a cavity region positioned between first and second cladding layers of opposite conductivity. The cavity region is a ridge which extends in the longitudinal direction. The cavity region periodically varies in thickness in the longitudinal direction which is in the form of corrugations in a major surface thereof. The second cladding layer overlies the cavity region and the first cladding layer. This laser is fabricated by forming a first cladding layer overlying a substrate. A cavity layer is then formed, over the first cladding layer and corrugations are formed in a major surface of the cavity layer. Portions of the cavity layer are then removed to form the cavity region and the second cladding layer is then formed over the cavity region and the first cladding layer.
Abstract:
A substrate 14 is overlain by a buffer layer 26 of substantially the same lattice constant, with a barrier layer 24 interposed between the substrate 14 and buffer layer 26, having the same electrical conductivity type as the buffer layer but different lattice constant from both the substrate and buffer layers. Strain is produced in the barrier layer 24 and portions of the substrate 14 and buffer layers 26 to act as a trap for defects and so prolong the life of e.g. a light emitting device 28, 30, 32, fabricated on the buffer layer 26, while keeping the strained region remote from the active region 30 of the device.
Abstract:
A method of forming a variable width channel in a body comprises the steps of forming a surface grating having a photoresist layer thereon. The photoresist layer has a plurality of depressions and a planar photomask is then positioned over the photoresist layer. The photoresist layer is subsequently exposed and developed and due to the divergence of light into the depressions covered by the photomask, forms a variable width opening. A portion of the body exposed in the opening is removed to form a channel with a sidewall having a surface contour corresponding to an edge of the opening.
Abstract:
1378327 Epitaxial growth on substrate RCA CORPORATION 22 May 1972 [27 Aug 1971] 23909/72 Heading B1S [Also in Divisions Cl C4 and H1] A semiconductor structure comprises a monocrystalline insulating substrate 41, Fig. 3, having a semiconductor layer thereon, the layer consisting of a first, vapour phase deposited portion 42 of a III-V compound, and a second portion 43, also of a III-V compound and formed in continuity with portion 42, but derived from a liquid phase process. The portions may be of the same or different material, and of the same or opposite conductivity type. The portions may be of GaAs or GaAs, or GaAs x P 1-x or Ga x Al 1-x As on GaAs, GaP on GaP, or GaAs x P 1-x on GaP where o
Abstract:
SEMICONDUCTOR BODY AND LONG-LIVED LIGHT EMITTING DEVICE THEREON An improved semiconductor body upon which a light emitting device can be fabricated where the improvement is a barrier layer, which has a lattice constant different from that of the substrate and buffer layer, interposed between the substrate and the buffer layer. The strain associated with the lattice constant mismatch is believed to provide a trap for defects which migrate out of the substrate into the active region of the light emitting device. Accelerated life tests at 90.degree.C show a significant reduction in the rate of degradation of the spontaneous light output power of light emitting devices incorporating the invention.