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    Electron beam excited laser
    1.
    发明授权
    Electron beam excited laser 失效
    电子束激光激光

    公开(公告)号：US3657735A

    公开(公告)日：1972-04-18

    申请号：US3657735D

    申请日：1970-03-20

    Applicant: RCA CORP

    Inventor： NICOLL FREDERICK HERMES

    IPC: H01S3/0959 ,  H01S3/05 ,  H01S3/09 ,  H01S3/18

    CPC classification number: H01S3/0959

    Abstract: An electron beam excited laser element including a body of a material which is capable of generating light when excited by an electron beam and having a pair of opposed, substantially parallel, spaced surfaces. A partially reflective layer is provided on one surface of the body to allow emission of a portion of the light from the body. A metal layer is provided over the other surface of the body with at least a portion of the metal layer being spaced from the surface of the body. The metal layer is substantially fully light reflective but transmits the electrons of the electron beam with little loss. When an electron beam is directed at the spaced portion of the metal film, the material of the body is excited to generate light which is emitted through the partially reflective layer. The spacing of the metal layer from the surface of the body reduces the electron beam power necessary to cause lasing of the element.

    Abstract translation: 一种电子束激发的激光元件，包括材料体，当被电子束激发时能产生光，并且具有一对相对的基本上平行的间隔表面。 部分反射层设置在主体的一个表面上，以允许从身体发射一部分光。 金属层设置在主体的另一表面上，金属层的至少一部分与主体的表面间隔开。 金属层基本上完全是光反射的，但以很小的损失透射电子束的电子。 当电子束被引导到金属膜的间隔部分时，物体的材料被激发以产生通过部分反射层发射的光。 金属层与本体表面的间隔减小了引起元件发光所需的电子束功率。

    3.
    发明专利
    未知

    公开(公告)号：DE1273990B

    公开(公告)日：1968-07-25

    申请号：DER0034903

    申请日：1963-04-09

    Applicant: RCA CORP

    Inventor： NICOLL FREDERICK HERMES ,  OGAWA HERBERT FOX

    IPC: G03G5/022 ,  G03G5/06 ,  G03G5/07 ,  G03G5/147 ,  G03G16/00

    Abstract: 1,038,338. Electrophotographic processes; lantern slides. RADIO CORPORATION OF AMERICA. April 1, 1963 [April 30, 1962], No. 12880/63. Headings G2C and G2H. [Also in Division H1] A recording member comprises a resinous photoconductive insulating heat-deformable layer and adherent to this layer a film of up to 500 Š thick constituted by a material insoluble in the heat-deformable material. In operation an electrostatic charge image is placed on the material which is then heated to cause it to deform and break-up the film in the areas of high change density which then show a frosted-glass appearance. The image may be viewed by transmitted light or slanting illumination. The material may be uniformly corona-charged and provided with a charge image electrophotographically or it may be charged using a corona source and a stencil which prevents charge from being deposited in selected areas. It may also be charged by direct charge deposition from selectively energized pin electrodes, or by electron beam scanning. Heat deformable materials identified are polystyrene, chlorinated paraffins, polyvinyl chloride, copolymers of vinyl chloride, copolymers of styrene with butadiene, hydrocarbon resins, acrylate polymers and copolymers, epoxy resins, and thermoplastic hydrocarbon terpene resins. Combinations of these materials may be used and materials such as plasticizers may be added. Polystyrene is itself photoconductive but its sensitivity is enhanced and the photoconductivity of the other resins enhanced or assured by the inclusion of dye intermediates which to some extent react with the resin. Many intermediates are listed. They are all di- or tri-phenyl methanes or derivatives of Michler's ketone. The thin surface film may be of polyvinyl alcohol, gelatin, or of other water soluble resinous materials. Highly cross-linked polymers are also suitable, for example a layer of cross-linked polystyrene may be applied by a vacuum vapour deposition process using a glow discharge. Very thin metal or metal oxide films are also suitable, for example those of gold or of aluminium oxide having an average thickness of about 0.4 Š. The recording materials preferably have a supporting layer under the heat-deformable layer. Suitable supports are metal plates, conductive glass, glass slides coated with conductive tin, oxide, high melting films coated with copper or aluminium, and high-melting conductive plastics. A specific complete material consists of superimposed polystyrene and polyvinyl alcohol layers on a tin oxide coated lantern slide. After a charge image has been placed on the material it may be developed by heating for a few seconds at e.g. 140-215‹C. If an image is developed on such a material having a polystyrene layer of less than about 11Á an interference pattern is formed. With a layer about 1 Á thick the deformations produced by development scatter light predominantly blue in colour while slightly thicker layers result in scattering of green and red light. Viewing of the developed slides may be carried out using an ordinary slide projection or a schlieren projection system. Several other specific complete materials having similar supports are described. Another specific material has a heat-deformable layer of a mixture of polystyrene, a chlorinated paraffin, and a dye intermediate, the layer being carried by a slide first coated with conductive tin oxide and then with nickel or gold for use as a lantern slide. Silver paint electrodes are applied to the edges of the nickel or gold layer. The film is a very thin layer of gold or aluminium oxide. After providing a uniform corona charge and exposing with a tungsten source the image is developed with heat produced by passing current through the nickel film.

    6.
    发明专利
    未知

    公开(公告)号：DE1043536B

    公开(公告)日：1958-11-13

    申请号：DER0017490

    申请日：1955-09-26

    Applicant: RCA CORP

    Inventor： NICOLL FREDERICK HERMES ,  BUSANOVICH CHARLES JOHN ,  THOMSEN SOREN MILTON

    IPC: G03G5/087 ,  H01L21/00 ,  H01L21/34 ,  H01L21/479 ,  H01L29/227 ,  H01L31/08 ,  H01L31/18

    Abstract: A photo-conductive material for use in photoelectric cells (see Group XXXVI) is made by mixing cadmium sulphide, selenide or sulphoselenide with a flux, firing above the melting point of the flux and washing out the crystals from the resulting product, firing the washed crystals to sinter them into a mass, breaking up the mass into powder without grinding and finally firing the powder in a third firing below the sintering temperature at least part of which is carried out under atmospheric pressure in the presence of sulphur. In a specific example 100 grams of cadmium sulphide or selenide or a mixture of the two is mixed with 10 grams of cadmium chloride, 1 gram of ammonium chloride 0.7 ml. of 0.1 mol. copper chloride and 25 ml. water and the mixture dried at 150 DEG C. for 15 hours, broken up and fired at 600 DEG C. for 20 minutes. The fired mass, consisting of CdS crystals impregnated with Cu and Cl is soaked and washed in water to remove most of the CdCl2, then moistened with a solution containing equal parts of 0.1 mol. CdCl2 and 1 mol. NH4Cl and passed through a 325-mesh sieve. It is then fired at 600 DEG C. for 20 minutes and the sintered mass resulting is grated through a 50-mesh sieve, and is fired in the presence of sulphur vapour for 10 minutes at 500 DEG C. and for a further 10 minutes in vacuo. After cooling it is passed through a 325-mesh sieve. Ag or another monovalent iron may replace Cu. In a further embodiment cadmium sulphide is crystallized from a mass comprising 10 per cent by weight of a molten flux containing a halide and the flux leached out. Cu is added and diffused into the CdS in a second firing.

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