公开(公告)号：EP1817542A1

公开(公告)日：2007-08-15

申请号：EP04794682.7

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： LEARY, Sean P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie L.

IPC: G01B9/02

CPC classification number: G01N21/211 ,  G01N21/8422

Abstract: An optical metrology system (50) is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films (310) such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse (325)focused onto a wafer surface, measuring a first set of x1, y1 and z1 coordinates (330) moving the wafer in the z direction, directing the light pulse (325) onto the wafer surface and measuring a second set of x2, y2 and z2 coordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5 % or below.

公开(公告)号：WO2012103440A1

公开(公告)日：2012-08-02

申请号：PCT/US2012/022911

申请日：2012-01-27

Applicant: RUDOLPH TECHNOLOGIES, INC. ,  MEHENDALE, Manjusha ,  KOTELYANSKII, Michael ,  MUKUNDHAN, Priya ,  COLGAN, Michael ,  ZHOU, Wei

Inventor： MEHENDALE, Manjusha ,  KOTELYANSKII, Michael ,  MUKUNDHAN, Priya ,  COLGAN, Michael ,  ZHOU, Wei

IPC: G01J1/44

CPC classification number: G01J1/0448 ,  G01N21/1702 ,  G01N21/1717 ,  G01N21/47 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501

Abstract: An automatically adjustable method for use in opto-acoustic metrology or other types of metrology operations is described. The method includes modifying the operation of a metrology system that uses a PSD style sensor arrangement. The method may be used to quickly adjust the operation of a metrology system to ensure that the data obtained therefrom are of the desired quality. Further, the method is useful in searching for and optimizing data that is or can be correlated to substrate or sample features or characteristics that of interest. Apparatus and computer readable media are also described.

Abstract translation: 描述了一种用于光声测量或其他类型计量操作的自动调节方法。 该方法包括修改使用PSD风格传感器装置的计量系统的操作。 该方法可以用于快速调整计量系统的操作，以确保从其获得的数据具有期望的质量。 此外，该方法可用于搜索和优化与底物或样品特征或感兴趣的特征相关或可以相关的数据。 还描述了装置和计算机可读介质。

公开(公告)号：EP1817542B9

公开(公告)日：2016-09-21

申请号：EP04794682.7

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： LEARY, Sean P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie L.

IPC: G01N21/84 ,  G01N21/21

CPC classification number: G01N21/211 ,  G01N21/8422

公开(公告)号：EP1817542B1

公开(公告)日：2016-04-13

申请号：EP04794682.7

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： LEARY, Sean P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie L.

IPC: G01N21/84 ,  G01N21/21

CPC classification number: G01N21/211 ,  G01N21/8422

公开(公告)号：EP2668477A1

公开(公告)日：2013-12-04

申请号：EP12739797.4

申请日：2012-01-27

Applicant: Rudolph Technologies, Inc.

Inventor： MEHENDALE, Manjusha ,  KOTELYANSKII, Michael ,  MUKUNDHAN, Priya ,  COLGAN, Michael ,  ZHOU, Wei

IPC: G01J1/44

Abstract: An automatically adjustable method for use in opto-acoustic metrology or other types of metrology operations is described. The method includes modifying the operation of a metrology system that uses a PSD style sensor arrangement. The method may be used to quickly adjust the operation of a metrology system to ensure that the data obtained therefrom are of the desired quality. Further, the method is useful in searching for and optimizing data that is or can be correlated to substrate or sample features or characteristics that of interest. Apparatus and computer readable media are also described.

公开(公告)号：WO2006124475A3

公开(公告)日：2006-11-23

申请号：PCT/US2006/018148

申请日：2006-05-10

Applicant: RUDOLPH TECHNOLOGIES, INC. ,  KOTELYANSKII, Michael ,  VERTIKOV, Andrey P. ,  MORATH, Christopher J.

Inventor： KOTELYANSKII, Michael ,  VERTIKOV, Andrey P. ,  MORATH, Christopher J.

IPC: G01N23/20

Abstract: A system comprising a means for generating an optical pump beam pulse (15) and for directing the optical pump beam pulse (15) to a first area of a surface of a sample (27) having a plurality of film layers to generate an acoustic signal, a means for generating an x-ray probe pulse (17) and for directing the x-ray probe pulse (17) to a second area of the surface, a means for detecting (33) an intensity of a diffracted x-ray probe pulse (17') the intensity varying in response to the acoustic signal to form a probe pulse response signal, and a means for calculating (51) an expected transient response to a theoretical acoustic signal propagated through a model of the sample and fitting the probe pulse response to the transient response to derive at least one characteristic of the sample (27).

公开(公告)号：WO2014149213A1

公开(公告)日：2014-09-25

申请号：PCT/US2014/014890

申请日：2014-02-05

Applicant: RUDOLPH TECHNOLOGIES, INC. ,  THE REGENTS OF UNIVERSITY COLORADO ,  MURRAY, Todd ,  MEHENDALE, Manjusha ,  KOTELYANSKII, Michael ,  MAIR, Robin ,  MUKUNDHAN, Priya

Inventor： MURRAY, Todd ,  MEHENDALE, Manjusha ,  KOTELYANSKII, Michael ,  MAIR, Robin ,  MUKUNDHAN, Priya

IPC: H01L21/66

CPC classification number: H01L22/20 ,  G01N21/00 ,  G01N21/1702 ,  G01N21/41 ,  G01N21/9501 ,  G01N29/04 ,  G01N29/2418 ,  G01N2021/8461 ,  G01N2201/06113 ,  G01N2291/011 ,  G01N2291/028 ,  G01N2291/0423 ,  G01N2291/0426 ,  H01L21/0231 ,  H01L21/78 ,  H01L22/00 ,  H01L22/10 ,  H01L22/12

Abstract: A system and method for identifying one or more characteristics of a structure formed into a substrate is herein disclosed. Surface and bulk acoustic waves are induced in the substrate and travel past a structure of interest where the acoustic waves are sensed. Information concerning one or more characteristics of the structure is encoded in the wave. The encoded information is assessed to determine the characteristic of interest.

Abstract translation: 本文公开了一种用于识别形成衬底的结构的一个或多个特性的系统和方法。 表面和体声波在衬底中被感应并且经过感兴趣的结构并且传播到其中感测声波的结构。 关于结构的一个或多个特征的信息被编码在波中。 评估编码信息以确定感兴趣的特征。

公开(公告)号：WO2006041493A1

公开(公告)日：2006-04-20

申请号：PCT/US2004/033405

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC. ,  INTEL CORPORATION ,  LEARY, Sean, P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie, L.

Inventor： LEARY, Sean, P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie, L.

IPC: G01B9/02

CPC classification number: G01N21/211 ,  G01N21/8422

Abstract: An optical metrology system (50) is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films (310) such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse (325)focused onto a wafer surface, measuring a first set of x 1 , y 1 and z 1 coordinates (330) moving the wafer in the z direction, directing the light pulse (325) onto the wafer surface and measuring a second set of x 2 , y 2 and z 2 coordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5 % or below.

Abstract translation: 光学计量系统（50）具有数据分析方法，以确定诸如二氧化硅，金属或半导体衬底上的其它碳掺杂氧化物的光学透明介电膜（310）的弹性模量。 使用椭偏仪测量折射率，使用激光光谱仪测量激光束的波长。 通过将聚焦在晶片表面上的光脉冲（325）引导，测量第一组x