公开(公告)号：EP1817542A1

公开(公告)日：2007-08-15

申请号：EP04794682.7

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： LEARY, Sean P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie L.

IPC: G01B9/02

CPC classification number: G01N21/211 ,  G01N21/8422

Abstract: An optical metrology system (50) is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films (310) such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse (325)focused onto a wafer surface, measuring a first set of x1, y1 and z1 coordinates (330) moving the wafer in the z direction, directing the light pulse (325) onto the wafer surface and measuring a second set of x2, y2 and z2 coordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5 % or below.

公开(公告)号：WO2008106199A9

公开(公告)日：2008-09-04

申请号：PCT/US2008/002649

申请日：2008-02-28

Applicant: RUDOLPH TECHNOLOGIES, INC. ,  TAS, Guray ,  LEARY, Sean, P. ,  ALLIATA, Dario ,  CLERICO, Jana ,  MUKUNDHAN, Priya ,  DAI, Zhongning

Inventor： TAS, Guray ,  LEARY, Sean, P. ,  ALLIATA, Dario ,  CLERICO, Jana ,  MUKUNDHAN, Priya ,  DAI, Zhongning

IPC: G01N21/17 ,  G01N29/24

Abstract: A method for evaluating a manufacturing process is described. The method includes generating an optical pump beam pulse and directing the optical pump beam pulse to a surface of a sample. A probe pulse is generated and directed the probe pulse to the surface of the sample. A probe pulse response signal is detected. A change in the probe pulse varying in response to the acoustic signal forms the probe pulse response signal. An evaluation of one or more manufacturing process steps used to create the sample is made based upon the probe pulse response signal. Additionally the method may be used for process control of a CMP process. Apparatus are also described.

公开(公告)号：WO2008008223A2

公开(公告)日：2008-01-17

申请号：PCT/US2007/015286

申请日：2007-07-09

Applicant: RUDOLPH TECHNOLOGIES, INC. ,  MEHENDALE, Manjusha ,  KOTELYANSKII, Michael, J. ,  HOU, Yanwen ,  ONDERKO, Jim ,  TAS, Guray

Inventor： MEHENDALE, Manjusha ,  KOTELYANSKII, Michael, J. ,  HOU, Yanwen ,  ONDERKO, Jim ,  TAS, Guray

IPC: G01J4/00

CPC classification number: G01N21/211 ,  G01N21/636 ,  G01N21/8422 ,  G01N21/9501 ,  G01N21/956

Abstract: A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.

Abstract translation: 一种方法包括选择执行椭偏仪或执行光学应力产生和检测之一。 该方法还包括响应于选择执行椭偏仪，将至少一个第一控制信号施加到至少修改光束的偏振的可控延迟器，以及使用修改的光束执行椭偏仪。 该方法还包括响应于选择执行光应力产生和检测，向可控延迟器施加至少一个第二控制信号，并且使用修改的光束进行光应力产生和检测。 还公开了装置和计算机可读介质。

公开(公告)号：EP1817542B9

公开(公告)日：2016-09-21

申请号：EP04794682.7

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： LEARY, Sean P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie L.

IPC: G01N21/84 ,  G01N21/21

CPC classification number: G01N21/211 ,  G01N21/8422

公开(公告)号：EP1817542B1

公开(公告)日：2016-04-13

申请号：EP04794682.7

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： LEARY, Sean P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie L.

IPC: G01N21/84 ,  G01N21/21

CPC classification number: G01N21/211 ,  G01N21/8422

公开(公告)号：WO2008106199A1

公开(公告)日：2008-09-04

申请号：PCT/US2008/002649

申请日：2008-02-28

Applicant: RUDOLPH TECHNOLOGIES, INC. ,  TAS, Guray ,  LEARY, Sean, P. ,  ALLIATA, Dario ,  CLERICO, Jana ,  MUKUNDHAN, Priya ,  DAI, Zhongning

Inventor： TAS, Guray ,  LEARY, Sean, P. ,  ALLIATA, Dario ,  CLERICO, Jana ,  MUKUNDHAN, Priya ,  DAI, Zhongning

IPC: G01N21/17 ,  G01N29/24

CPC classification number: G01N21/1717 ,  G01N21/95684 ,  G01N29/2418 ,  G01N2021/1725 ,  G01N2021/8416 ,  G01N2021/95638

Abstract: A method for evaluating a manufacturing process is described. The method includes generating an optical pump beam pulse and directing the optical pump beam pulse to a surface of a sample. A probe pulse is generated and directed the probe pulse to the surface of the sample. A probe pulse response signal is detected. A change in the probe pulse varying in response to the acoustic signal forms the probe pulse response signal. An evaluation of one or more manufacturing process steps used to create the sample is made based upon the probe pulse response signal. Additionally the method may be used for process control of a CMP process. Apparatus are also described.

Abstract translation: 对制造工序的评价方法进行说明。 该方法包括产生光泵浦波束脉冲并将光泵浦波束脉冲引导到样品的表面。 产生探针脉冲并将探针脉冲引导到样品的表面。 探测脉冲响应信号。 响应于声信号变化的探针脉冲的变化形成探针脉冲响应信号。 基于探针脉冲响应信号进行用于产生样品的一个或多个制造工艺步骤的评估。 另外，该方法可以用于CMP过程的过程控制。 还描述了装置。

公开(公告)号：WO2006041493A1

公开(公告)日：2006-04-20

申请号：PCT/US2004/033405

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC. ,  INTEL CORPORATION ,  LEARY, Sean, P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie, L.

Inventor： LEARY, Sean, P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie, L.

IPC: G01B9/02

CPC classification number: G01N21/211 ,  G01N21/8422

Abstract: An optical metrology system (50) is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films (310) such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse (325)focused onto a wafer surface, measuring a first set of x 1 , y 1 and z 1 coordinates (330) moving the wafer in the z direction, directing the light pulse (325) onto the wafer surface and measuring a second set of x 2 , y 2 and z 2 coordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5 % or below.

Abstract translation: 光学计量系统（50）具有数据分析方法，以确定诸如二氧化硅，金属或半导体衬底上的其它碳掺杂氧化物的光学透明介电膜（310）的弹性模量。 使用椭偏仪测量折射率，使用激光光谱仪测量激光束的波长。 通过将聚焦在晶片表面上的光脉冲（325）引导，测量第一组x