公开(公告)号：WO2004087563A2

公开(公告)日：2004-10-14

申请号：PCT/US2004/009231

申请日：2004-03-24

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev, R. ,  DOAN, Jonathan

Inventor： PATEL, Satyadev, R. ,  DOAN, Jonathan

IPC: B81C

CPC classification number: B81C1/00793 ,  B81B2201/042 ,  B81C2201/053

Abstract: A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.

Abstract translation: 本文公开了一种用于处理微机电装置的方法。 该方法通过在连续的牺牲层和结构层之间提供选定的阻挡层来防止牺牲层与微机电器件的结构层之间的扩散和相互作用。

公开(公告)号：WO2002075794A2

公开(公告)日：2002-09-26

申请号：PCT/US2002/007761

申请日：2002-03-15

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

Inventor： PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

IPC: H01L21/00

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method is disclosed for forming a micromechanical device. The method includes fully or partially forming one or more micromechanical structures multiple times on a first substrate. A second substrate is bonded onto the first substrate so as to cover the multiple areas each having one or more micromechanical structures, so as to form a substrate assembly. The substrate assembly is then separated into individual dies, each die having the one or more micromechanical structures held on a portion of the first substrate, with a portion of the second substrate bonded to the first substrate portion. Finally, the second substrate portion is removed from each die to expose the one or more micromechanical structures on the first substrate portion. The invention is also directed to a method for forming a micromechanical device, including: forming one or more micromechanical structures in one or more areas on a first substrate; bonding caps onto the first substrate so as to cover the one or more areas each having one or more micromechanical structures, so as to form a substrate assembly; after a period of time, removing the caps to expose the one or more micromechanical structures. During the period of time between bonding the caps and later removing the caps, the substrate assembly can be singulated, inspected, irradiated, annealed, die attached, shipped and/or stored.

Abstract translation: 公开了一种用于形成微机械装置的方法。 该方法包括在第一衬底（5a）上多次完全或部分地形成一个或多个微机械结构。 将第二基板接合到第一基板上以覆盖各自具有一个或多个微机械结构的多个区域，以便形成基板组件。 然后将基板组件分离成单独的模具，每个模具具有一个或多个微机械结构，其保持在第一基板的一部分（21）上，其中第二基板的一部分结合到第一基板部分。 最后，从每个管芯（3a-3d）移除第二衬底部分以露出第一衬底部分上的一个或多个微机械结构。 本发明还涉及一种用于形成微机械装置的方法，包括：在第一基板上的一个或多个区域中形成一个或多个微机械结构; 将盖接合到第一基板上以覆盖每个具有一个或多个微机械结构的一个或多个区域，以便形成基板（10）组件; 在一段时间之后，移除盖以露出一个或多个微机械结构。 在接合盖子和稍后移除盖子之间的时间段期间，可以对基板组件进行单切割，检查，照射，退火，模具附接，运输和/或存储。

公开(公告)号：EP1631851A2

公开(公告)日：2006-03-08

申请号：EP04752112.5

申请日：2004-05-13

Applicant: Reflectivity Inc.

Inventor： PATEL, Satyadev, R. ,  HUIBERS, Andrew, G. ,  SPINDT, Christopher ,  HEUREUX, Peter

IPC: G02B26/00

CPC classification number: B81B3/0051 ,  B81B2201/042 ,  B81B2203/058 ,  C10L1/026 ,  G02B26/0841

Abstract: A spatial light modulator is disclosed, along with methods for making such a modulator that comprises an array of mirror devices each having at least a preferably at least a first electrode and a second electrode. The first electrode is designated for driving the mirror plate of the micromirror device to an ON state, and the second electrode is designated for driving the mirror plate to an OFF state. The two electrodes can be disposed on the same side of the mirror plate but on opposite sides of the rotation axis of the mirror plate for driving the mirror plate to rotate in opposite directions. Alternatively, the two electrodes can be disposed on the opposite sides of the mirror plate, but on the same side of the rotation axis of the mirror plate for driving the mirror plate to rotate in opposite directions. The ON state and OFF state of the mirror plate can be defined by stops. The stops may be formed on substrate(s), hinge structures holding the mirror plates of the micromirror device and/or a desired location within the micromirror device. Alternatively, the electrodes for the ON state and the OFF state can be used as stops, either individually or in combination, or in combination with other component(s), such as substrate(s) of the micromirror device. The OFF state angle and the ON state angle are preferably different.

公开(公告)号：EP1592995A2

公开(公告)日：2005-11-09

申请号：EP04710297.5

申请日：2004-02-11

Applicant: Reflectivity Inc.

Inventor： PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

IPC: G02B26/00 ,  G02B26/08 ,  G02B7/182

CPC classification number: G03B21/28 ,  G02B26/0841

Abstract: A spatial light modulator (200) is disclosed, along with methods for making such a modulator, that comprises an array of micromirrors (201) each having a hinge (240) and a micromirror plate (210) held via the hinge on a substrate (202), the micromirror plate being disposed in a plane separate from the hinge and having a diagonal (211) extending across the micromirror plate, the micromirror plate being attached to the hinge such that the micromirror plate can rotate along a rotation axis (214) that is parallel to, but off-set from the diagonal of the micromirror plate. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

公开(公告)号：EP1642162A2

公开(公告)日：2006-04-05

申请号：EP04755159.3

申请日：2004-06-10

Applicant: Reflectivity Inc.

Inventor： PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A micromirror device (122) is disclosed, along with a method of making such a micromirror device (122) that comprises a mirror plate (230), a hinge (214) and an extension plate (212). The extension plate (212) is formed on the mirror plate (230) and between the mirror plate (230) and the electrode (126) associated with the mirror plate (230) for rotating the mirror plate. The.extension plate (212) can be metallic or dielectric. Also disclosed is a method of making such a micromirror device. In particular, the extension plate (212) is formed after the formation of the mirror plate (230). Moreover, also disclosed is a projection system (102) that comprises a spatial light modulator (110) having an array of such micromirrors, as well as a light source (102), condensing optics, wherein light from the light source (102) is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors (110) onto a target, and a controller for selectively actuating the micromirrors (122) in the array (110).

公开(公告)号：WO2005049481A2

公开(公告)日：2005-06-02

申请号：PCT/US2004/024206

申请日：2004-07-26

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

Inventor： PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

IPC: B81C

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors.In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种空间光调制器，以及用于制造包括微镜器件阵列的调制器的方法。 根据所使用的光源确定中心到中心的距离和相邻微镜器件之间的间隙，从而优化光学效率和性能质量。 微镜装置包括形成在基板上的铰链支撑件和由铰链支撑件保持的铰链。 镜板经由触点连接到铰链，并且镜板和铰链之间的距离根据镜板的期望最大旋转角度，相邻微镜之间的最佳间隙和间距来确定。在制造方法中， 这种空间光调制器，将一个牺牲层沉积在基板上，接着形成镜板，并且在镜板上沉积另一个牺牲层，随后形成铰链支撑件。 两个牺牲层通过相邻反射镜器件之间的小间隙用自发气相化学蚀刻剂去除。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微反射镜阵列上，投影光学器件用于投射从微反射镜阵列选择性反射的光 到目标上，以及一个控制器，用于选择性地启动阵列中的微镜。

公开(公告)号：WO2004072696A3

公开(公告)日：2004-08-26

申请号：PCT/US2004/004441

申请日：2004-02-11

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

Inventor： PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

IPC: G02B26/00

Abstract: A spatial light modulator (200) is disclosed, along with methods for making such a modulator, that comprises an array of micromirrors (201) each having a hinge (240) and a micromirror plate (210) held via the hinge on a substrate (202), the micromirror plate being disposed in a plane separate from the hinge and having a diagonal (211) extending across the micromirror plate, the micromirror plate being attached to the hinge such that the micromirror plate can rotate along a rotation axis (214) that is parallel to, but off-set from the diagonal of the micromirror plate. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

公开(公告)号：WO2002095800A2

公开(公告)日：2002-11-28

申请号：PCT/US2002/016224

申请日：2002-05-22

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev, R. ,  HUIBERS, Andrew, G. ,  SCHAADT, Gregory, P. ,  HEUREUX, Peter, J.

Inventor： PATEL, Satyadev, R. ,  HUIBERS, Andrew, G. ,  SCHAADT, Gregory, P. ,  HEUREUX, Peter, J.

IPC: H01L

CPC classification number: B81C1/00476 ,  B81C1/00547 ,  B81C2201/0109 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/112 ,  B82Y30/00

Abstract: An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

Abstract translation: 公开了一种诸如用于形成微机械装置的蚀刻方法。 该方法的一个实施例是用于释放微机械结构，其包括：在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上去除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。 该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂 物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

公开(公告)号：WO2005010566A2

公开(公告)日：2005-02-03

申请号：PCT/US2004/023139

申请日：2004-07-19

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

Inventor： PATEL, Satyadev, R. ,  HUIBERS, Andrew, G.

IPC: G02B

CPC classification number: G02B26/0841 ,  B82Y30/00

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种空间光调制器，以及用于制造这种调制器的方法，该调制器包括微镜器件阵列。 根据所使用的光源确定中心到中心距离和相邻微镜器件之间的间隙，以优化光学效率和性能质量。 微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。 镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。 在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。 两个牺牲层通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

公开(公告)号：WO2004087561A2

公开(公告)日：2004-10-14

申请号：PCT/US2004/009222

申请日：2004-03-24

Applicant: REFLECTIVITY, INC. ,  PATEL, Satyadev, R. ,  DOAN, Jonathan

Inventor： PATEL, Satyadev, R. ,  DOAN, Jonathan

IPC: B81B

CPC classification number: B81C1/00476 ,  B81B2201/042 ,  B81C2201/0107

Abstract: A sacrificial layer and a method for applying said sacrificial layer in fabricating microelectromechanical devices are disclosed herein. The sacrificial layer comprises an early transition metal. Specifically, the sacrificial layer comprises an early transition metal element, an early transition metal alloy or an early transition metal silicide.

Abstract translation: 本文公开了牺牲层和在制造微机电装置中施加所述牺牲层的方法。 牺牲层包括早期过渡金属。 具体地，牺牲层包括早期过渡金属元素，早期过渡金属合金或早期过渡金属硅化物。