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    VAPORIZER
    1.
    发明申请
    VAPORIZER 审中-公开
    喷雾器

    公开(公告)号：WO2007146904A3

    公开(公告)日：2008-06-12

    申请号：PCT/US2007070941

    申请日：2007-06-12

    Applicant: SEMEQUIP INC ,  SACCO GEORGE ,  OVED DROR ,  ADAMS DOUGLAS R ,  HARNETT DAVID J ,  HORSKY THOMAS N

    Inventor： SACCO GEORGE ,  OVED DROR ,  ADAMS DOUGLAS R ,  HARNETT DAVID J ,  HORSKY THOMAS N

    IPC: H01J27/00

    CPC classification number: C23C14/48 ,  C23C14/228 ,  H01J37/02 ,  H01J37/32412 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/08 ,  H01J2237/31701

    Abstract: A vaporizer unit to heat solid feed material to a temperature that produces vapor to be ionized, has efficient construction and numerous effective safety features. The heater is located in a detachable top closure member, and serves to maintain a valve in the top closure member at temperature higher than the temperature to which the solid material is heated. The top section is a heat distributor to an interface with the bottom section, the side and bottom walls of the bottom distributing heat received from the interface to surfaces of the cavity exposed to the feed material. Borane, decarborane, carbon clusters and other large molecules are vaporized for ion implantation.

    Abstract translation: 将固体原料加热至产生要离子化的蒸汽的温度的蒸发器单元，具有有效的结构和许多有效的安全特征。 加热器位于可拆卸顶部封闭构件中，并且用于在高于固体材料被加热的温度的温度下将阀门保持在顶部封闭构件中。 顶部是与底部部分的界面的热分配器，底部的侧壁和底壁分配从暴露于进料的空腔的界面的表面接收的热量。 硼烷，癸二硼烷，碳簇等大分子被蒸发用于离子注入。

    VAPOR DELIVERY SYSTEM USEFUL WITH ION SOURCES AND VAPORIZERS FOR USE IN SUCH SYSTEM
    2.
    发明申请
    VAPOR DELIVERY SYSTEM USEFUL WITH ION SOURCES AND VAPORIZERS FOR USE IN SUCH SYSTEM 审中-公开
    使用离子源和蒸发器用于这种系统的蒸气输送系统

    公开(公告)号：WO2007146942A3

    公开(公告)日：2008-10-16

    申请号：PCT/US2007071010

    申请日：2007-06-12

    Applicant: SEMEQUIP INC ,  ADAMS DOUGLAS R ,  OVED DROR ,  HORSKY THOMAS N

    Inventor： ADAMS DOUGLAS R ,  OVED DROR ,  HORSKY THOMAS N

    IPC: F16D49/00

    CPC classification number: C23C14/48 ,  C23C14/228 ,  H01J37/02 ,  H01J37/32412 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/08 ,  H01J2237/31701

    Abstract: Vapor delivery systems and methods that control the heating and flow of vapors from solid feed material, especially material that comprises cluster molecules for semiconductor manufacture. The systems and methods safely and effectively conduct the vapor to a point of utilization, especially to an ion source for ion implantation. Ion beam implantation is shown employing ions from the cluster materials. The vapor delivery system includes reactive gas cleaning of the ion source, control systems and protocols, wide dynamic range flow-control systems and vaporizer selections that are efficient and safe. Borane, decarborane, carboranes, carbon clusters and other large molecules are vaporized for ion implantation. Such systems are shown cooperating with novel vaporizers, ion sources, and reactive cleaning systems.

    Abstract translation: 控制来自固体进料的蒸气的加热和流动的蒸气输送系统和方法，特别是包含用于半导体制造的聚簇分子的材料。 这些系统和方法安全有效地将蒸汽传导到一个利用点，特别是离子源的离子源。 示出了离子束注入使用来自簇材料的离子。 蒸汽输送系统包括离子源的反应气体清洁，控制系统和协议，宽动态范围流量控制系统和有效和安全的蒸发器选择。 硼烷，癸二硼烷，碳硼烷，碳簇和其他大分子蒸发用于离子注入。 示出了这样的系统与新型蒸发器，离子源和反应性清洁系统协作。

    VAPORIZER
    3.
    发明申请
    VAPORIZER 审中-公开
    喷雾器

    公开(公告)号：WO2007149738A3

    公开(公告)日：2008-06-19

    申请号：PCT/US2007071016

    申请日：2007-06-12

    Applicant: SEMEQUIP INC ,  SACCO GEORGE ,  ADAMS DOUGLAS R ,  OVED DROR ,  HORSKY THOMAS N ,  HARTNETT DAVID J

    Inventor： SACCO GEORGE ,  ADAMS DOUGLAS R ,  OVED DROR ,  HORSKY THOMAS N ,  HARTNETT DAVID J

    IPC: H01J27/00

    CPC classification number: C23C14/48 ,  C23C14/228 ,  H01J37/02 ,  H01J37/32412 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/08 ,  H01J2237/31701

    Abstract: A vaporizer unit, that heats solid feed material, especially material comprising cluster molecules for semiconductor manufacture, to a temperature that produces vapor to be ionized, has efficient construction and numerous effective safety features. The heater is located in a detachable top closure member, and serves to maintain a valve in the top closure member at temperature higher than the temperature to which the solid material is heated. The top section is a heat distributor to an interface with the bottom section, the side and bottom walls of the bottom distributing heat received from the interface to surfaces of the cavity exposed to the feed material. Locking, access-preventing and effective use of mechanical and electronic coding provide safety. Borane, decarborane, carbon clusters and other large molecules are vaporized for ion implantation. Such vaporizers cooperating with novel vapor delivery systems and with ion sources are shown.

    Abstract translation: 将固体原料（特别是包含用于半导体制造的聚簇分子的材料）加热到产生待离子化的蒸气的温度的蒸发器单元具有有效的结构和许多有效的安全特征。 加热器位于可拆卸顶部封闭构件中，并且用于在高于固体材料被加热的温度的温度下将阀门保持在顶部封闭构件中。 顶部是与底部部分的界面的热分配器，底部的侧壁和底壁分配从暴露于进料的空腔的界面的表面接收的热量。 锁定，访问防止和有效使用机械和电子编码提供安全。 硼烷，癸二硼烷，碳簇等大分子被蒸发用于离子注入。 示出了与新型蒸汽输送系统和离子源配合的这种蒸发器。

    VAPOR DELIVERY TO DEVICES UNDER VACUUM
    4.
    发明申请
    VAPOR DELIVERY TO DEVICES UNDER VACUUM 审中-公开
    蒸汽输送到真空设备

    公开(公告)号：WO2007146888A3

    公开(公告)日：2008-07-31

    申请号：PCT/US2007070900

    申请日：2007-06-11

    Applicant: SEMEQUIP INC ,  ADAMS DOUGLAS R ,  SINCLAIR FRANK ,  COPERTINO BRENT M

    Inventor： ADAMS DOUGLAS R ,  SINCLAIR FRANK ,  COPERTINO BRENT M

    IPC: B01D1/26

    CPC classification number: C23C14/48 ,  C23C14/228 ,  H01J37/02 ,  H01J37/32412 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/08 ,  H01J2237/31701

    Abstract: Providing vapor to a vapor-receiving device housed in a high vacuum chamber. An ion beam implanter, as an example, has a removable high voltage ion source within a high vacuum chamber and a vapor delivery system that delivers vapor to the ion source and does not interfere with removal of the ion source for maintenance. For delivering vapor to a vapor-receiving device, such as the high voltage ion source under vacuum, a flow interface device is in the form of a thermally conductive valve block. A delivery extension of the interface device automatically connects and disconnects within the high vacuum chamber with the removable vapor receiving device by respective installation and removal motions. In an ion implanter, the flow interface device or valve block and source of reactive cleaning gas are mounted in a non-interfering way on the electrically insulating bushing that insulates the ion source from the vacuum housing and the ion source may be removed without disturbing the flow interface device. Multiple vaporizers for solid material, provisions for reactive gas cleaning, and provisions for controlling flow are provided in the flow interface device.

    Abstract translation: 向容纳在高真空室中的蒸汽接收装置提供蒸气。 作为示例，离子束注入机在高真空室内具有可移除的高电压离子源，以及蒸气输送系统，其将蒸气输送到离子源并且不干扰离子源的去除以进行维护。 为了将蒸汽输送到诸如真空下的高压离子源的蒸汽接收装置，流动接口装置是导热阀块的形式。 接口装置的传送延伸部通过相应的安装和移除动作，利用可移除的蒸汽接收装置自动地连接和断开高真空室内的连接。 在离子注入机中，流动接口装置或阀块和反应性清洁气体源以非干扰的方式安装在电绝缘衬套上，该电绝缘衬套使离子源与真空壳体绝缘，并且离子源可以被去除而不会干扰 流接口设备。 在流体接口装置中提供了用于固体材料的多个蒸发器，用于反应性气体清洁的设备和用于控制流量的设备。

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