公开(公告)号：US20150093906A1

公开(公告)日：2015-04-02

申请号：US14490939

申请日：2014-09-19

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Nobuo KOBAYASHI ,  Koichi HAMADA ,  Yoshiaki KUROKAWA ,  Masaaki FURUYA ,  Hideki MORI ,  Yasushi WATANABE ,  Yoshinori HAYASHI

IPC: H01L21/311 ,  B05C3/02 ,  B05C11/11 ,  B05C5/02 ,  B05C11/08 ,  B05C11/10

CPC classification number: H01L21/31111 ,  H01L21/67017 ,  H01L21/6708

Abstract: A substrate treatment apparatus which can more efficiently regenerate phosphoric acid which is able to be returned to etching treatment along with such etching treatment as much as possible without using a large facility, that is a substrate treatment apparatus which treats a silicon substrate W on which a nitride film is formed by a liquid etchant which contains phosphoric acid, which comprises an etching treatment unit (the spin treatment unit 30) which gives a suitable quantity of liquid, etchant to each substrate which is fed one at a time so as to etch the substrate and remove the nitride film, a phosphoric acid regenerating unit (the spin treatment unit 30) which mixes liquid etchant used for treatment of one substrate and a suitable quantity of liquid hydrofluoric acid for the amount of the used liquid etchant under a predetermined temperature environment to regenerate the phosphoric acid, and a phosphoric acid recovery unit (the pump 38, phosphoric acid recovery tank 50, and pump 52) which returns the phosphoric acid which was obtained by the phosphoric acid regenerating unit to the liquid etchant to be used at the etching treatment unit.

Abstract translation: 一种能够更有效地再生磷酸的基板处理装置，其可以在不使用大的设备的情况下尽可能多地进行蚀刻处理而返回到蚀刻处理，也就是基板处理装置，其处理硅基板W， 氮化物膜由含有磷酸的液体蚀刻剂形成，该液体蚀刻剂包括蚀刻处理单元（旋转处理单元30），该蚀刻处理单元（旋转处理单元30）向每个衬底提供适当量的液体，蚀刻剂，每个衬底一次一个地蚀刻， 基板并去除氮化物膜，将磷酸再生单元（旋转处理单元30）在预定温度环境下将用于处理一个基板的液体蚀刻剂和适量的液体氢氟酸混合使用液体蚀刻剂的量 再生磷酸，磷酸回收装置（泵38，磷酸回收槽50，pu mp 52），其将由磷酸再生单元获得的磷酸返回到在蚀刻处理单元处使用的液体蚀刻剂。

公开(公告)号：US20130169793A1

公开(公告)日：2013-07-04

申请号：US13729441

申请日：2012-12-28

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Yoshinori HAYASHI ,  Osamu IZUTSU ,  Hiroshi WAKABA ,  Yoko ONO ,  Katsutoshi SEKI ,  Takanori GONDO ,  Akihiko TAKIZAWA

IPC: H04N7/18

CPC classification number: H04N7/18 ,  G01N21/896

Abstract: An inspection system captures an inspected object which is illuminated by an illumination system and processes an image of the inspected object which is expressed by the obtained image data to inspect it. The inspection system includes a processing information determining portion determining processing information which is used for the inspection processing which changes along with the change of the amount of illumination light from the illumination system from the initial amount of light to the target amount of light when the set amount of light of the illumination system is changed from the initial amount of light to the target amount of light, and which system performs the inspection processing by using processing information which is determined by the processing information determining means in accordance with the elapsed time from when the set amount of light of the illumination system is switched to the target amount of light.

Abstract translation: 检查系统捕获由照明系统照明的被检查物体，并处理由所获得的图像数据表示的检查对象的图像以进行检查。 检查系统包括处理信息确定部分确定用于检查处理的处理信息，该处理信息随着照射系统的照明光量从初始光量到目标光量的变化而变化，当该组 照明系统的光量从初始光量改变为目标光量，并且该系统通过使用由处理信息确定装置根据从当前时间起经过的时间确定的处理信息来执行检查处理 将照明系统的设定光量切换到目标光量。

公开(公告)号：US20130169795A1

公开(公告)日：2013-07-04

申请号：US13729434

申请日：2012-12-28

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Yoshinori HAYASHI ,  Osamu IZUTSU ,  Katsutoshi SEKI ,  Hiroshi WAKABA ,  Yoko ONO ,  Takanori GONDO ,  Akihiko TAKIZAWA

IPC: H05B37/02 ,  H04N7/18

CPC classification number: H05B37/02 ,  H05B41/3928 ,  Y02B20/202

Abstract: An illumination system includes a first illumination unit which uses an amount of illumination light in accordance with a set amount of light to illuminate an illuminated object, a second illumination unit which has a response to switching of the set amount of light better than said first illumination unit and which uses illumination light which is superposed on the illumination light from said first illumination unit to illuminate said illuminated object, and an illumination controller which controls the amount of illumination light of said second illumination unit by switching the set amount of light in accordance with the control information while maintaining the amount of illumination light of said first illumination unit at a predetermined amount.

Abstract translation: 照明系统包括：第一照明单元，其使用根据设定量的照明照明物体的照明光量;第二照明单元，其对所设定的光量的转换比所述第一照明更好地响应 并且其使用重叠在来自所述第一照明单元的照明光上以照亮所述被照明物体的照明光;照明控制器，其通过根据所述第一照明单元切换所述设定光量来控制所述第二照明单元的照明光量 控制信息，同时将所述第一照明单元的照明光量保持在预定量。