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公开(公告)号:JPH0485302A
公开(公告)日:1992-03-18
申请号:JP19634490
申请日:1990-07-26
Applicant: SHOWA DENKO KK
Inventor: TAKENOSHITA YOUICHIROU , ISHIHARA SHIGENOBU , OSUGA HIROSHI , TAKASHIMA KISHICHIRO
IPC: C08F2/18 , C08F22/36 , C08F212/00 , C08F212/06 , C08F212/10 , C08F212/14 , C08F222/40
Abstract: PURPOSE:To produce the title resin while safely feeding a toxic maleimide monomer and preventing foaming during its feeding by polymerizing an aromatic vinyl monomer with a vinyl cyanide monomer and a maleimide monomer in an aqueous suspension under specified conditions. CONSTITUTION:A process for polymerizing an aromatic vinyl monomer (e.g. styrene) with a vinyl cyanide monomer (e.g. acrylonitrile) and a maleimide monomer (e.g. N-phenylmaleimide) in an aqueous suspension, which comprises feeding water to the polymerizer, reducing the pressure in the polymerizer to -100 to -500mmHg to whereby such the maleimide monomer directly into the water in the polymerizer through a nozzle, increasing the pressure in the polymerizer to atmospheric pressure, and performing the polymerization in the presence of a suspension stabilizer (e.g. calcium tert. phosphate and sodium dodecylbenzenesulfonate) and the vinyl monomer.
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公开(公告)号:JPH024810A
公开(公告)日:1990-01-09
申请号:JP15586888
申请日:1988-06-23
Applicant: SHOWA DENKO KK
Inventor: MITSUNAGA YUTAKA , OSUGA HIROSHI , TAKASHIMA KISHICHIRO , TAKENOSHITA YOUICHIROU , ISHIHARA SHIGENOBU
IPC: C08F212/10 , C08F22/36 , C08F220/42 , C08F222/40 , C08F257/00 , C08F279/00 , C08F279/02
Abstract: PURPOSE:To obtain the subject resin with lower coloring excellent in impact resistance and processability by blending a copolymer prepared by a specified copolymerization of an aromatic vinylbased monomer, a maleimide-based monomer and a vinylcyanide based monomer with a graft copolymer. CONSTITUTION:A mixture composed of (A) 30-70wt.% aromatic vinyl-based monomer (preferably styrene, etc.), (B) 5-25wt.% vinylcyanide-based monomer (preferably acrylonitrile) and (C) 10.50 wt.% maleimide-based monomer (preferably N-phenylmaleimide, etc.) of the formula (R is H, 1-15C alkyl, etc.) is copolymerized in such a way that 1000-20000ppm component (A) remains unreacted. With 20-60 pts.wt. graft copolymer prepared by carrying out graft copolymerization of 70-30wt.% vinyl-based monomer mixture containing the components (A) and (B) as the essential components in the presence of 30-70wt.% rubbery polymer, 40-80 pts.wt. above-mentioned copolymer composed of the components (A)-(C) is then blended, thus obtaining the objective resin.
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公开(公告)号:JPS63238132A
公开(公告)日:1988-10-04
申请号:JP7047187
申请日:1987-03-26
Applicant: SHOWA DENKO KK
Inventor: TAKENOSHITA YOUICHIROU , YOSHIDA HARUO
IPC: C08F290/00 , C08F299/00 , C08G75/02 , C08G75/04
Abstract: PURPOSE:To obtain the titled compound of good storage stability, capable of giving cured products with uniformity and high oxidation stability, by addition reaction, in the presence of a base catalyst, between each specific polyene compound and polythiol compound in the total number ratio of the vinyl group to the SH group higher than a specified value. CONSTITUTION:The objective polymerizable vinyl compound can be obtained by addition reaction, in the presence of a base catalyst, between (A) a polyene compound of formula A-Xm [X is of formula I (R is H or CH3), etc.; m is integer >=2; A is polyvalent hydrocarbon group, of formula II (R is H, OH or aliphatic hydrocarbon residue; R is hydrocarbon residue which may contain halogen; q is integer >=1), etc.] or formula Yn-D-Xp (Y is group of formula III; n and p are each integer >=1; D is the same kind as A) and (B) a polythiol compound of formula R -(SH)r (R is polyvalent hydrocarbon; r is integer 2-4) under such a condition that the total number ratio of the vinyl group to the thiol group is >=2.
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公开(公告)号:JPS63191814A
公开(公告)日:1988-08-09
申请号:JP2366087
申请日:1987-02-05
Applicant: SHOWA DENKO KK
Inventor: TAKENOSHITA YOUICHIROU , YOSHIDA HARUO
IPC: G02B1/04 , C08F16/32 , C08F18/00 , C08F216/12 , C08F218/00
Abstract: PURPOSE:To make it possible to form a polymerizable monomer composition which has an excellent light resistance and a high refractive index and can give a lens resin having transparency and colorlessness desirable for optical lenses, by combining two monomers of specified structural formulas. CONSTITUTION:This polymerizable monomer composition is formed from 20-70wt.% polymerizable monomer of formula I (wherein R is H or CH3, m is 0-2 and n is an integer of 1-3) and 30-80wt.% polymerizable monomer of formula II (wherein R is H or CH3 and p is an integer of 1-2). By curing said monomer mixture by copolymerization, an optical material of excellent light resistance and a refractive index of 1.51-1.53 can be obtained.
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公开(公告)号:JPS61163907A
公开(公告)日:1986-07-24
申请号:JP413785
申请日:1985-01-16
Applicant: SHOWA DENKO KK
Inventor: TAKENOSHITA YOUICHIROU , TAKOSHI HIROTAKA , YOSHIDA HARUO
Abstract: PURPOSE:To obtain a nongelling liquid prepolymer which has a consistent viscos ity for a long time, by irradiating a mixture of aromatic ring-containing mono- and di-(meth)acrylate monomers with an actinic energy rays in the presence of a photopolymerization initiator. CONSTITUTION:A photopolymerization initiator (e.g., benzoin or its ether) is added to a monomer mixture comprising an aromatic ring-containing mono(meth) acrylate (e.g., formula I or II) and an aromatic ring-containing di(meth)acrylate monomer (e.g., formula III or IV). The resulting mixture is irradiated with actinic energy rays to obtain the purpose liquid (meth)acrylate prepolymer. As said actinic energy rays, gamma-rays, X-rays, UV rays, etc., can be used. A prefer able example of this process consists in irradiation with UV rays of a wave length of 365nm at an energy dose in the range of 1X10 -1J/cm .
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公开(公告)号:JPH05156101A
公开(公告)日:1993-06-22
申请号:JP31794691
申请日:1991-12-02
Applicant: SHOWA DENKO KK
Inventor: NAKAMURA TERUO , MAEDA HIROYUKI , OSUGA HIROSHI , YOSHIDA MASAHARU , TAKENOSHITA YOUICHIROU
Abstract: PURPOSE:To provide the subject composition which is excellent in antistatic effect and mechanical properties, especially impact resistance. CONSTITUTION:The objective composition comprises a styrenic resin, a chlorinated polyolefin and a surfactant, preferably in respective proportions of 40-95wt.%, 2-50wt.% and 0.1-5wt.%.
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公开(公告)号:JPH05155906A
公开(公告)日:1993-06-22
申请号:JP31927691
申请日:1991-12-03
Applicant: SHOWA DENKO KK
Inventor: TAKENOSHITA YOUICHIROU
IPC: C08F2/00 , C08F2/18 , C08F22/36 , C08F212/00 , C08F212/06 , C08F222/40
Abstract: PURPOSE:To obtain a resin which is excellent in moldability, impact resistance, and molding appearance by using a polymerization initiator and a suspension stabilizer in a specific manner to copolymerize an aromatic vinyl monomer with a vinyl cyanide monomer and a maleimide monomer. CONSTITUTION:A copolymer consisting of 30-70wt.% aromatic vinyl monomer, 1-25wt.% vinyl cyanide monomer, 5-65wt.% maleimide monomer represented by the formula, and 0-15wt.% other vinyl monomer copolymerizable therewith is produced by aqueous suspension polymerization. In conducting this polymerization, a polymerization initiator is dissolved beforehand in one or more of the monomers in the presence or absence of water and a suspension stabilizer is then supplied, thereby obtain the desired resin. The polymerization initiator is an organic peroxide or an azo compound or both. Examples of the suspension stabilizer include calcium tertiary phosphate, magnesium phosphate, and calcium carbonate.
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公开(公告)号:JPH05148310A
公开(公告)日:1993-06-15
申请号:JP31101891
申请日:1991-11-26
Applicant: SHOWA DENKO KK
Inventor: TAKENOSHITA YOUICHIROU , TAKASHIMA KISHICHIRO
IPC: C08F6/10 , C08F6/06 , C08F22/36 , C08F212/00 , C08F212/04 , C08F222/40
Abstract: PURPOSE:To obtain the subject resin which is excellent in heat resistance, impact resistance, and moldability by using specific conditions to copolymerize predetermined monomers by aqueous suspension polymerization. CONSTITUTION:30-70wt.% aromatic vinyl monomer (e.g. styrene) is copolymerized by aqueous suspension polymerization with 5-25wt.% vinyl cyanide monomer (e.g. acrylonitrile), 10-50wt.% maleimide monomer represented by the formula (wherein R is H a 1-15C alkyl, a cycloalkyl, or a (substituted)aryl), and 0-15wt.% other vinyl monomer copolymerizable therewith. This copolymerization is first conducted until the conversion reaches 90-99%, and is then further conducted at 100-160 deg.C for 5min 2hr in the presence of a base (e.g. NaOH) in an amount of 0.05-2wt.% based on the copolymer to thereby regulate the content of the residual vinyl cyanide monomer in the copolymer to 0.3wt.% or lower.
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公开(公告)号:JPS6250336A
公开(公告)日:1987-03-05
申请号:JP18976385
申请日:1985-08-30
Applicant: SHOWA DENKO KK
Inventor: TAKENOSHITA YOUICHIROU , TAKOSHI HIROTAKA , YOSHIDA HARUO , MARUYAMA SATOSHI , SAEDA SHIGERU
Abstract: PURPOSE:To eliminate dyeing unevenness in dyeing a plastic lens and improve its surface hardness, by irradiating a plastic lens obtained by casting a specified monomer with actinic energy rays predominantly consisting of ultraviolet rays. CONSTITUTION:A polymerizable monomer comprising at least one compound selected from a vinyl compound and a (meth)acryl compound and, optionally, a mercapto compound is cast. The obtained plastic lens is irradiated in air with actinic energy rays predominantly consisting of ultraviolet rays. A polymerizable monomer which can be particularly preferably used is a combination of styrene, methyl methacrylate, an acrylate ester or a diallylidenepentaerythritol with a polymercapto compound. Said actinic energy rays predominantly consist of ultraviolet rays are light of a wavelength
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公开(公告)号:JPS6198710A
公开(公告)日:1986-05-17
申请号:JP21862684
申请日:1984-10-19
Applicant: Showa Denko Kk
Inventor: TAKENOSHITA YOUICHIROU , TAKOSHI HIROTAKA , YOSHIDA HARUO
IPC: C08F20/00 , C08F20/10 , C08F20/26 , C08F220/00 , C08F220/20 , C08F220/26 , C08F220/30 , G11B7/24 , G11B7/253
Abstract: PURPOSE: A disk for optical reading that is composed of a plurality of specific α, β-unsaturated carboxylic acid derivative monomers in a specific proportion, thus showing high stability for a long period of time, without warpage and deflection, because of its good water absorption and deflection properties.
CONSTITUTION: The objective disk is composed of a copolymer from (A) 30W95 wt% of a monomer of formula I (R
1 is H, methyl; R
2 is -CH
2 CH
2 O-, formula II; X, Y are Cl, Br, methyl, methoxy, phenoxy; k, l are 1W5 as k+l; m is 1Wl3) or a mixture thereof, (B) 0W70 wt% of a polymerizable monomer of formula III (R
3 is H, methyl; R
4 is -CH
2 CH
2 O-, formula II, IV; Ar is residue of divalent phenol; n is 1W3; p is 0W4 where, when R
4 is -CH
2 CH
2 O-, or formula II, p is 0 or -when R
4 is formula IV, n is 1) or a mixture thereof, and (C) 5W30 mwt% of a polymerizable monomer of formula V (R
5 is H, methyl; R
6 is p-valent saturated aliphatic hydrocarbon which may include ether, ester or alcohol; q is 2W6).
COPYRIGHT: (C)1986,JPO&JapioAbstract translation: 目的:一种用于光学读数的盘,由特定比例的多种特定的α,β-不饱和羧酸衍生物单体组成,因此由于其良好的水分而长时间地显示高稳定性,没有翘曲和偏转 吸收和偏转性能。 构成:目标盘由(A)30-95重量%的式I单体(R 1为H,甲基; R 2为-CH 2 CH 2 O-,式II; X,Y 是Cl,Br,甲基,甲氧基,苯氧基; k,l为1-5,k + 1; m为1〜13)或其混合物,(B)0-70重量%的式III的可聚合单体 R 3是H,甲基; R 4是-CH 2 CH 2 O-,式II,IV; Ar是二价酚的残基; n是1-3; p是0-4,其中当R 4是 - CH 2 CH 2 O-或式II,p为0或 - 当R 4为式IV时,n为1)或其混合物,(C)5-30重量%的式V的可聚合单体(R 5 >是H,甲基; R 6是可以包括醚,酯或醇的p价饱和脂族烃; q是2-6)。
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