PHOTO-SETTING COMPOSITION.
    6.
    发明公开
    PHOTO-SETTING COMPOSITION. 失效
    光交联组合物。

    公开(公告)号:EP0231375A4

    公开(公告)日:1987-11-12

    申请号:EP85903696

    申请日:1985-07-19

    Applicant: SHOWA DENKO KK

    CPC classification number: C08F2/48

    Abstract: A photo-setting composition prepared by compounding a polymerizable monomer and/or oligomer with (1) an UV absorber having extinction coefficients of 2,000/M.cm or more at 300 to 350 nm and 1,000/M.cm or less at 360 nm and (2) a photopolymerization initiator having an extinction coefficient of 10/M.cm or less at 390 nm. A colorless, transparent, thick setting product uniformly set to the core can be obtained by irradiating the composition with UV rays from a light source emitting light of 360 to 380 nm.

    ADHESIVE RESIN COMPOSITION
    9.
    发明专利

    公开(公告)号:JPH07304911A

    公开(公告)日:1995-11-21

    申请号:JP11223094

    申请日:1994-04-27

    Applicant: SHOWA DENKO KK

    Abstract: PURPOSE:To obtain an adhesive resin compsn. capable of exhibiting a strong adhesion between a polypropylene polymer and a polyethylene polymer even without a corona discharge treatment or a pretreatment with a coupling agent. CONSTITUTION:An adhesive resin compsn. comprises (A) EPR having melting peak temp. of 30 to 70 deg.C and a critical energy release rate (Gc) of at least 100 (J/m ) between the same and a reference polypropylene; and (B) a polystyrene-ethylene/butene-polyethylene triblock copolymer having melting peak temp. of 50 to 105 deg.C and a Gc of at least 100 (J/m ), or a polyethylene- ethylene/butene-polyethylene triblock copolymer having a melting peak temp. of 50 to 105 deg.C and a Gc of at least 100 (J/m ), and the amt. of the copolymer (B) is 5 to 95 pts.wt. per 100 pts.wt. in total of the component A and B.

    POLYAMIDE RESIN COMPOSITION
    10.
    发明专利

    公开(公告)号:JPH06145510A

    公开(公告)日:1994-05-24

    申请号:JP30123692

    申请日:1992-11-11

    Applicant: SHOWA DENKO KK

    Abstract: PURPOSE:To obtain the title composition excellent in mechanical strength and resistance to heat, water, and solvents by mixing a polyamide resin with a specific inorganic filler in a given proportion. CONSTITUTION:The composition comprises 20-98wt.% polyamide resin (e.g. nylon 66) and 80-2wt.% inorganic filler (e.g. glass fibers) surface-treated with a succinic acid (anhydride) derivative represented by formula I or II wherein R1 to R3 each is a 1-10C alkyl, R4 and R5 each is H or CH3, and n is 1-15.

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