Thermal chemical vapor deposition split-functionalization process, product, and coating

    公开(公告)号:AU2016253571A1

    公开(公告)日:2017-05-25

    申请号:AU2016253571

    申请日:2016-11-02

    Applicant: SILCOTEK CORP

    Abstract: THERMAL CHEMICAL VAPOR DEPOSITION SPLIT FUNCTIONALIZATION PROCESS, PRODUCT, AND COATING Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time. -12-

    FLUID CONTACT PROCESS, COATED ARTICLE, AND COATING PROCESS

    公开(公告)号:SG11202105663XA

    公开(公告)日:2021-06-29

    申请号:SG11202105663X

    申请日:2019-11-27

    Applicant: SILCOTEK CORP

    Inventor: YUAN MIN

    Abstract: Fluid contact process, coated article, and coating processes are disclosed. The fluid contact process includes flowing a corrosive fluid to contact a coated article. The coated article includes an aluminum-containing substrate, a first region on the aluminum-containing substrate, the first region comprising carbon and silicon, a second region distal from the aluminum-containing substrate in comparison to the first region, the second region having oxygen at a greater concentration, by weight, than the first region, a third region distal from the first region in comparison to the second region, the third region comprising amorphous silicon. The coating process includes positioning the aluminum-containing substrate within an enclosed chamber, then, thermally decomposing dimethyl silane-and-silane-containing mixture within the enclosed chamber, then thermally oxidizing, and then, thermally decomposing silane.

Patent Agency Ranking