公开(公告)号：HK1015188A1

公开(公告)日：1999-10-08

申请号：HK98116148

申请日：1998-12-28

Applicant: SILICON VIDEO CORP

Inventor： MACAULAY JOHN M ,  SPINDT CHRISTOPHER J ,  SEARSON PETER C ,  DUBOC ROBERT M

IPC: H01J1/30 ,  H01J1/304 ,  H01J3/02 ,  H01J9/02 ,  H01J29/04 ,  H01J31/12 ,  H01J

Abstract: A method comprising the steps of: causing charged particles to pass through a track layer to form a multiplicity of charged-particle tracks therethrough; creating corresponding open spaces through the track layer by a procedure that entails etching the track layer along the charged-particle tracks; forming electron-emissive elements accessible through the open spaces in the track layer; and subsequently providing a patterned electrically non-insulating gate layer over the electron-emissive elements such that gate openings extend through the gate layer to enable each gate opening to expose at least one of the electron-emissive elements.